Wafer processing apparatus and wafer processing method
US-2024395512-A1 · Nov 28, 2024 · US
High throughput physical vapor deposition system for material combinatorial studies
US8944002B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8944002-B2 |
| Application number | US-75730204-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 14, 2004 |
| Priority date | Jan 14, 2004 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
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An infinitely variable physical vapor deposition matrix system that allows the synthesis of multiple combinatorial catalyst samples at essentially the same time, by the co-deposition of multiple materials, or the sequential layer by layer deposition of multiple catalyst constituents, or both, such that the optimum mix of materials for a pre-determined application can be experimentally determined in subsequent testing. The discovery of optimal catalyst combinations for utilization in specified reactions and devices is facilitated. The high throughput system reduces the time and complexity of processing typically required to formulate and test combinatorial catalyst materials.
First claim
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What is claimed is: 1. A physical vapor deposition system for depositing combinatorial catalyst samples on a plurality of substrate target areas comprising: (a) a deposition chamber that when open, receives one or more substrates and is sealable after the one or more substrates are loaded therein, the chamber being openable after the one or more substrates have been is processed so that the one or more substrates with can be removed therefrom; (b) a plurality of plasma sources r…
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- C23C14/50Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US8944002B2 cover?
- An infinitely variable physical vapor deposition matrix system that allows the synthesis of multiple combinatorial catalyst samples at essentially the same time, by the co-deposition of multiple materials, or the sequential layer by layer deposition of multiple catalyst constituents, or both, such that the optimum mix of materials for a pre-determined application can be experimentally determine…
- Who is the assignee on this patent?
- He Ting, Kreidler Eric R, Nomura Tadashi, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification C23C14/50. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).