Top notch slit profile for mems device
US-2024381034-A1 · Nov 14, 2024 · US
Trim method for CMOS-MEMS microphones
US8942389B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8942389-B2 |
| Application number | US-201113207130-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 10, 2011 |
| Priority date | Aug 10, 2011 |
| Publication date | Jan 27, 2015 |
| Grant date | Jan 27, 2015 |
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Abstract
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Systems and methods for adjusting a bias voltage and gain of the microphone to account for variations in a thickness of a gap between a movable membrane and a stationary backplate in a MEMS microphone due to the manufacturing process. The microphone is exposed to acoustic pressures of a first magnitude and a sensitivity of the microphone is evaluated according to a predetermined sensitivity protocol. The bias voltage of the microphone is adjusted when the microphone does not meet the sensitivity protocol. The microphone is then exposed to acoustic waves of a second magnitude that is greater than the first magnitude and a stability of the microphone is evaluated according to a predetermined stability protocol. The bias voltage and the gain of the microphone are adjusted when the microphone does not meet the stability protocol.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of adjusting a MEMS microphone to account for variations in manufacturing processes, the MEMS microphone including a gap of an undetermined thickness between a movable membrane and a stationary backplate, the method comprising: applying a first voltage to a power supply voltage pad to enter a normal operation mode; applying a first serial binary input to a second pad while in the normal operation mode, wherein a logic layer of the MEMS microphone…
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Electricity · mapped topic
- H04R19/005Primary
Electricity · mapped topic
Electricity · mapped topic
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- What does patent US8942389B2 cover?
- Systems and methods for adjusting a bias voltage and gain of the microphone to account for variations in a thickness of a gap between a movable membrane and a stationary backplate in a MEMS microphone due to the manufacturing process. The microphone is exposed to acoustic pressures of a first magnitude and a sensitivity of the microphone is evaluated according to a predetermined sensitivity pro…
- Who is the assignee on this patent?
- Sridharan Sucheendran, Muza John Matthew, Stetson Philip Sean, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification H04R19/005. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jan 27 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).