Top notch slit profile for mems device
US-2024381034-A1 · Nov 14, 2024 · US
US8940639B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8940639-B2 |
| Application number | US-201213718859-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 18, 2012 |
| Priority date | Dec 18, 2012 |
| Publication date | Jan 27, 2015 |
| Grant date | Jan 27, 2015 |
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Official abstract text for this publication.
A MEMS device with movable MEMS structure and electrodes is produced by fabricating electrodes and shielding the electrodes with diamond buttons during subsequent fabrication steps, such as the etching of sacrificial oxide using vapor HF. In some embodiments, the diamond buttons are removed after the movable MEMS structure is released.
Opening claim text (preview).
What is claimed is: 1. A method of forming a micro-electromechanical systems (MEMS) device, comprising: providing a substrate having a first side and a second side; forming an electrode on or above the first side of the substrate; providing a diamond layer on the electrode; forming a sacrificial layer on or above the first side of the substrate; forming a MEMS structure on the sacrificial layer such that the sacrificial layer is between the MEMS structure and the substrate…
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