Apparatus for cleaning substrate

US8940101B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8940101-B2
Application numberUS-201113243954-A
CountryUS
Kind codeB2
Filing dateSep 23, 2011
Priority dateJun 14, 2011
Publication dateJan 27, 2015
Grant dateJan 27, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

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An apparatus for cleaning a substrate is disclosed. The apparatus includes a first chamber through which a substrate is conveyed, a second chamber where an oxide film formed on the substrate conveyed from the first chamber is removed; and a third chamber that discharges the substrate conveyed from the second chamber to the outside after rinsing the substrate, wherein the first chamber and the third chamber are disposed on top and on bottom.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a flat panel display, the method comprising: receiving, at a first chamber, a substrate to be cleaned, wherein an oxide film is formed on the substrate; first transferring the substrate from the first chamber to a second chamber; removing, at the second chamber, the oxide film from the substrate; rinsing the substrate; second transferring the rinsed substrate to a third chamber; and discharging the substrate from the third…

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What does patent US8940101B2 cover?
An apparatus for cleaning a substrate is disclosed. The apparatus includes a first chamber through which a substrate is conveyed, a second chamber where an oxide film formed on the substrate conveyed from the first chamber is removed; and a third chamber that discharges the substrate conveyed from the second chamber to the outside after rinsing the substrate, wherein the first chamber and the t…
Who is the assignee on this patent?
Jeong Beung-Hwa, Kim Kwang-Nam, Jo Gyoo-Chul, and 1 more
What technology area does this patent fall under?
Primary CPC classification H10P50/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 27 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).