Reflective optical element for EUV lithography

Patent metadata

Field	Value
Publication number	US-8937709-B2
Application number	US-201113188678-A
Country	US
Kind code	B2
Filing date	Jul 22, 2011
Priority date	Dec 15, 2009
Publication date	Jan 20, 2015
Grant date	Jan 20, 2015

Abstract

A stress-reduced reflective optical element for a working wavelength in the soft X-ray and extreme ultraviolet wavelength range includes a first multilayer system ( 4 ) of at least two alternating materials ( 41, 42 ) having different real parts of the refractive index at the working wavelength on a substrate ( 2 ), which exerts a layer stress on the substrate ( 2 ), and comprising a second multilayer system ( 6 ) of at least two alternating materials ( 61, 62 ) on a substrate ( 2 ), which exerts an opposed layer stress on the substrate ( 2 ) and is arranged between the first multilayer system ( 4 ) and the substrate ( 2 ), wherein a first ( 61 ) of the at least two materials of the second multilayer system ( 6 ) is interrupted by layers ( 62 ) having a thickness of up to 1 nm of the at least one further material of the second multilayer system ( 6 ) at such distances that the first material is present in an amorphous state.

First claim

The invention claimed is:

1. A reflective optical element operative at a working wavelength in at least one of the soft X-ray and extreme ultraviolet wavelength ranges, comprising:
a first multilayer system comprising at least two alternating materials on a substrate, wherein real parts of refractive indices of the at least two alternating materials differ at the working wavelength, wherein the first multilayer system exerts a layer stress on the substrate, and
a second multilayer system comprising at least a first material alternating with a further material on the substrate, wherein the second multilayer system exerts an opposed layer stress on the substrate and is arranged between the first multilayer system and the substrate,
wherein the first material of the at least two materials of the second multilayer system is selected from the group consisting of nickel and nickel alloy and is interrupted by a layer of a thickness of up to 1 nm of the further material of the second multilayer system at such distances that the first material is present in the second multilayer system in an amorphous state.

2. The reflective optical element according to claim 1 , wherein the at least two materials of the second multilayer system are arranged in a periodically alternating manner,
wherein within a period of the second multilayer system, a ratio of the overall thickness of layers of the first material of the at least two materials to the overall thickness of the period of the second multilayer system is greater than 0.80.

3. The reflective optical element according to claim 1 , wherein the material or materials of the at least one layer of the further material is selected from the group consisting of boron carbide, carbon, silicon carbide, silicon nitride, silicon and combinations thereof.

4. The reflective optical element according claim 1 , wherein the thickness of the at least one layer of the further material is less than 0.8 nm.

5. A projection system, in particular for an EUV lithography apparatus, comprising at least one reflective optical element, according to claim 1 .

6. An illumination system comprising at least one reflective optical element according to claim 1 .

7. An EUV lithography apparatus, comprising at least one reflective optical element according to claim 1 .

8. A reflective optical element operative at a working wavelength in at least one of the soft X-ray and extreme ultraviolet wavelength ranges, comprising:
a first multilayer system comprising at least silicon layers alternating with molybdenum layers on a substrate, wherein real parts of refractive indices of the at least two alternating materials differ at the working wavelength, and wherein the first multilayer system exerts a layer stress on the substrate, and
a second multilayer system of at least two periodically alternating materials on the substrate, wherein the second multilayer system exerts an opposed layer stress on the substrate and is arranged between the first multilayer system and the substrate, wherein one of the periodically alternating materials of the second multilayer system is nickel or a nickel alloy,
wherein within a period of the second multilayer system, the ratio of the overall thickness of nickel or nickel alloy layers to the overall thickness of the period of the second multilayer system is at least 0.25.

9. The reflective optical element according to claim 8 , wherein the second multilayer system comprises periods of layers of nickel or a nickel alloy and at least two layers of the materials having real parts of the refractive indices differ at the working wavelength of the first multilayer system.

10. The reflective optical element according to claim 8 , wherein the second multilayer system is comprised of periods of two materials arranged in alternating layers, and a layer of a third material,
wherein one of the two materials arranged in alternating layers comprises nickel or a nickel alloy.

11. The reflective optical element according to claim 8 , wherein the second multilayer system comprises periods of first layers of nickel or nickel alloy and second layers of a further metal.

12. The reflective optical element according to claim 11 , wherein at least one further material of the second multilayer system is selected from the group consisting of molybdenum, silicon, carbon, silicon nitride and combinations thereof.

13. An illumination system comprising at least one reflective optical element according to claim 8 .

14. An EUV lithography apparatus, comprising at least one reflective optical element according to claim 8 .

15. A projection system for an EUV lithography apparatus, comprising at least one reflective optical element according to claim 8 .

16. A reflective optical element operative at a working wavelength in at least one of the soft X-ray and extreme ultraviolet wavelength range, comprising:
a first multilayer system comprising at least two alternating layers on a substrate, wherein real parts of refractive indices of the at least two alternating layers differ at the working wavelength, wherein the first multilayer system exerts a layer stress on the substrate, and
a second multilayer system, comprising at least a first layer alternating with a further layer on the substrate, wherein the second multilayer system exerts an opposed layer stress on the substrate and is arranged between the first multilayer system and the substrate,
wherein the opposed layer stress is opposed to the layer stress exerted by the first multilayer system, and
wherein the first layer of the at least two layers of the second multilayer system is selected from the group consisting of nickel and nickel alloy and is interrupted by the further layer, which has a thickness of up to 1 nm at such distances that a material of the first layer of the second multilayer system is present in an amorphous state.

Assignees

• Weber Joern
• Zeiss Carl Smt Gmbh

Inventors

• Weber Joern

Classifications

• G02B1/14

  Protective coatings, e.g. hard coatings · CPC title

• G03F7/70233

  Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems · CPC title

• G02B1/10

  Optical coatings produced by application to, or surface treatment of, optical elements (G02B1/08 takes precedence) · CPC title

• G02B5/0816

  Multilayer mirrors, i.e. having two or more reflecting layers (G02B5/0883, G02B5/0891 take precedence) · CPC title

• G02B5/0891 Primary

  Ultraviolet [UV] mirrors (apparatus for microlithography exposure G03F7/70; X-ray multilayer structures G21K1/06) · CPC title