Projection objective for microlithography
US-9217932-B2 · Dec 22, 2015 · US
Illumination optics for microlithography
US8937708B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8937708-B2 |
| Application number | US-78977210-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 28, 2010 |
| Priority date | Dec 11, 2007 |
| Publication date | Jan 20, 2015 |
| Grant date | Jan 20, 2015 |
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Abstract
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An illumination optics for microlithography includes an optical assembly for guiding illumination light to an object field to be illuminated in an object plane. The illumination optics can divide an illumination light radiation bundle into a plurality of radiation sub-bundles which are assigned to different illumination angles of the object field illumination. The illumination optics is configured so that at least some of the radiation sub-bundles are superimposed in a superposition plane which is spaced from the object plane and which is not imaged into the object plane in which superposition takes place. This superposition is such that edges of the superimposed radiation sub-bundles coincide at least partially. In some embodiments, a field intensity setting device includes a plurality of adjacent individual diaphragms which at least attenuate illumination light when exposed thereon. These individual diaphragms are insertable into an illumination light radiation bundle in a direction parallel to an object displacement direction. All individual diaphragms of the field intensity setting device are insertable into the illumination light radiation bundle from one and the same side.
First claim
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What is claimed is: 1. An illumination optics, comprising: an optical assembly configured to guide illumination light to an object field in an object plane, wherein: the illumination optics is configured to divide an illumination light radiation bundle into a plurality of radiation sub-bundles which are assigned to different illumination angles of the object field; the illumination optics is configured so that at least some of the radiation sub-bundles are superimposed in a s…
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Physics · mapped topic
Physics · mapped topic
- G03F7/702Primary
Physics · mapped topic
Physics · mapped topic
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- What does patent US8937708B2 cover?
- An illumination optics for microlithography includes an optical assembly for guiding illumination light to an object field to be illuminated in an object plane. The illumination optics can divide an illumination light radiation bundle into a plurality of radiation sub-bundles which are assigned to different illumination angles of the object field illumination. The illumination optics is configu…
- Who is the assignee on this patent?
- Endres Martin, Stuetzle Ralf, Ossmann Jens, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/702. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jan 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).