Positive-working lithographic printing plate precursors and use

US8936899B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8936899-B2
Application numberUS-201213602367-A
CountryUS
Kind codeB2
Filing dateSep 4, 2012
Priority dateSep 4, 2012
Publication dateJan 20, 2015
Grant dateJan 20, 2015

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Abstract

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A thermally-sensitive, positive-working lithographic printing plate precursor can be used to prepare lithographic printing plates using high pH, silicate-free processing solutions. The precursor has a grained an anodized aluminum-containing substrate including a poly(vinyl phosphonic acid) interlayer. A first ink receptive layer, and optionally a second ink receptive layer, is disposed directly on the poly(vinyl phosphonic acid) interlayer. This first ink receptive layer comprises an aromatic acid dye that comprises at least two aromatic groups in an amount of least 0.5 weight %. In addition, the precursor comprises an infrared radiation absorber in one of the layers.

First claim

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The invention claimed is: 1. A positive-working, infrared radiation-sensitive lithographic printing plate precursor that comprises: a grained and anodized aluminum-containing substrate, a poly(vinyl phosphonic acid) interlayer disposed directly on the grained and anodized aluminum substrate, a first ink receptive layer that is disposed directly on the poly(vinyl phosphonic acid) interlayer, the first ink receptive layer comprising at least one water-insoluble, alkali solution-…

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What does patent US8936899B2 cover?
A thermally-sensitive, positive-working lithographic printing plate precursor can be used to prepare lithographic printing plates using high pH, silicate-free processing solutions. The precursor has a grained an anodized aluminum-containing substrate including a poly(vinyl phosphonic acid) interlayer. A first ink receptive layer, and optionally a second ink receptive layer, is disposed directly…
Who is the assignee on this patent?
Hauck Gerhard, Frank Dietmar, Savariar-Hauck Celin, and 1 more
What technology area does this patent fall under?
Primary CPC classification G03F7/09. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).