Method of fabricating substrate where patterns are formed

US8936828B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8936828-B2
Application numberUS-200913265366-A
CountryUS
Kind codeB2
Filing dateApr 29, 2009
Priority dateApr 29, 2009
Publication dateJan 20, 2015
Grant dateJan 20, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided is a method of fabricating a substrate where patterns are formed, the method including: preparing a solution in which a plurality of oxide beads are dispersed; forming patterns on a substrate; installing a provisional structure in an upper portion of the substrate so that a micro-channel is formed on the substrate; injecting the solution in which the oxide beads are dispersed, into the micro-channel and fixing the oxide beads at the substrate; and thermally processing the substrate. A plurality of low-priced oxide beads can be patterned on a substrate to have a desired shape so that damages can be prevented from occurring in the substrate during dry etching, and an etching process is not performed so that a yield of a device is not reduced and mass production of the device increases.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of fabricating a substrate where patterns are formed, the method comprising: preparing a solution in which a plurality of oxide beads are dispersed; forming patterns on a substrate; installing a provisional structure in an upper portion of the substrate so that a micro-channel is formed on the substrate; injecting the solution in which the oxide beads are dispersed, into the micro-channel and fixing the oxide beads at the substrate; and…

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What does patent US8936828B2 cover?
Provided is a method of fabricating a substrate where patterns are formed, the method including: preparing a solution in which a plurality of oxide beads are dispersed; forming patterns on a substrate; installing a provisional structure in an upper portion of the substrate so that a micro-channel is formed on the substrate; injecting the solution in which the oxide beads are dispersed, into the…
Who is the assignee on this patent?
Yoon Euijoon, Kwon Sung-Hoon, Snu R&Db Foundation
What technology area does this patent fall under?
Primary CPC classification H10H20/82. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).