Electrochemical deposition apparatus

US8936705B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8936705-B2
Application numberUS-201213684902-A
CountryUS
Kind codeB2
Filing dateNov 26, 2012
Priority dateJun 21, 2002
Publication dateJan 20, 2015
Grant dateJan 20, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention is to provide a substrate holder which can effect a more complete sealing with a sealing member and makes it possible to take a substrate out of the substrate holder easily and securely, and also a plating apparatus provided with the substrate holder. The substrate holder includes: a fixed holding member and a movable holding member for holding a substrate therebetween; a sealing member mounted to the fixed holding member or the movable holding member; and a suction pad for attracting a back surface of the substrate held between the fixed holding member and the movable holding member.

First claim

Opening claim text (preview).

The invention claimed is: 1. An apparatus for forming a metal film onto a substrate, comprising: a substrate holder configured to hold the substrate such that the metal film is formed on a front surface of the substrate; and electrical contacts each having a contact end for elastically contacting a circumferential surface of the substrate while the contact end of each of the electrical contacts is pressing the circumferential surface of the substrate inwardly to supply electric…

Assignees

Inventors

Classifications

  • Chemistry & Metallurgy · mapped topic

  • C25D17/06Primary

    Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

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Frequently asked questions

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What does patent US8936705B2 cover?
The present invention is to provide a substrate holder which can effect a more complete sealing with a sealing member and makes it possible to take a substrate out of the substrate holder easily and securely, and also a plating apparatus provided with the substrate holder. The substrate holder includes: a fixed holding member and a movable holding member for holding a substrate therebetween; a …
Who is the assignee on this patent?
Ebara Corp
What technology area does this patent fall under?
Primary CPC classification C25D17/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).