Liquid ejecting head and liquid ejecting apparatus

US8936355B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8936355-B2
Application numberUS-201314141159-A
CountryUS
Kind codeB2
Filing dateDec 26, 2013
Priority dateDec 27, 2012
Publication dateJan 20, 2015
Grant dateJan 20, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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A liquid ejecting head suppresses erosion of silicon substrates by liquid, and whereby suppresses leakage of liquid, discharging failure of liquid droplets, and peeling-off of laminated substrates. The liquid ejecting head includes at least a nozzle plate on which nozzle openings for discharging liquid are provided, and a flow path formation substrate on which a pressure generation chamber communicating with the nozzle openings is provided. The nozzle plate is formed with a silicon substrate. At least the flow path formation substrate and the nozzle plate are bonded to each other after providing a tantalum oxide film formed by atomic layer deposition on the entire surfaces including a bonded surface.

First claim

Opening claim text (preview).

What is claimed is: 1. A liquid ejecting head at least comprising: a nozzle plate on which nozzle openings for discharging liquid are provided; and a flow path formation substrate on which a pressure generation chamber communicating with the nozzle openings is provided, wherein the nozzle plate is formed with a silicon substrate, and at least the flow path formation substrate and the nozzle plate are bonded to each other after providing a tantalum oxide film formed by atomic…

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What does patent US8936355B2 cover?
A liquid ejecting head suppresses erosion of silicon substrates by liquid, and whereby suppresses leakage of liquid, discharging failure of liquid droplets, and peeling-off of laminated substrates. The liquid ejecting head includes at least a nozzle plate on which nozzle openings for discharging liquid are provided, and a flow path formation substrate on which a pressure generation chamber comm…
Who is the assignee on this patent?
Seiko Epson Corp
What technology area does this patent fall under?
Primary CPC classification B41J2/14233. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jan 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).