Microlithographic projection exposure apparatus illumination optics
US-9223226-B2 · Dec 29, 2015 · US
US8934086B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8934086-B2 |
| Application number | US-201113161877-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 16, 2011 |
| Priority date | Jun 19, 2010 |
| Publication date | Jan 13, 2015 |
| Grant date | Jan 13, 2015 |
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According to an embodiment, the illumination optical system for illuminating an illumination target surface with light from a light source is provided with a polarization converting member which converts a polarization state of incident light so as to form a pupil intensity distribution in a predetermined polarization state on an illumination pupil of the illumination optical system; and a phase modulating member which is arranged in the optical path on the illumination target surface side with respect to the polarization converting member and which transmits light from the pupil intensity distribution so as to convert linearly polarized light thereof polarized in a first direction, into required elliptically polarized light and maintain a polarization state of linearly polarized light polarized in a second direction (X-direction or Y-direction) obliquely intersecting with the first direction, in order to reduce influence of retardation caused by a subsequent optical system between the polarization converting member and the illumination target surface.
Opening claim text (preview).
The invention claimed is: 1. An illumination optical system for distributing light from a light source on an illumination pupil and illuminating an illumination target surface with light having passed through the illumination pupil, comprising: a reflecting surface which reflects the light from the light source, the reflecting surface causing a phase difference between p-polarized light and s-polarized light, polarization directions of the p-polarized light and s-polarized light b…
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