Lithographic apparatus and device manufacturing method
US-9195153-B2 · Nov 24, 2015 · US
Method and apparatus for performing alignment using reference board
US8934081B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8934081-B2 |
| Application number | US-92997711-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 28, 2011 |
| Priority date | Feb 26, 2010 |
| Publication date | Jan 13, 2015 |
| Grant date | Jan 13, 2015 |
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Abstract
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An alignment method for the of patterning a work piece in a direct write machine, wherein a reference board provided with board reference features is used to coordinate calibration of a measurement station and a writing station against a common reference. An adjusted pattern is for writing on the work piece is calculated relative to the position of the reference board.
First claim
Opening claim text (preview).
The invention claimed is: 1. A method of patterning a layer of a workpiece in a write machine, the write machine including, a pattern writing station having a write machine coordinate system, and a measurement station having a measurement coordinate system, the measurement station being configured to measure objects on the workpiece associated with reference features of the workpiece, the workpiece being placed on a carrier stage, and the write machine being configured to move t…
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Electricity · mapped topic
Electricity · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US8934081B2 cover?
- An alignment method for the of patterning a work piece in a direct write machine, wherein a reference board provided with board reference features is used to coordinate calibration of a measurement station and a writing station against a common reference. An adjusted pattern is for writing on the work piece is calculated relative to the position of the reference board.
- Who is the assignee on this patent?
- Wahlsten Mikael, Zerne Raoul, Mycronic AB
- What technology area does this patent fall under?
- Primary CPC classification G03F9/7003. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jan 13 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).