Controlling lateral two-dimensional electron hole gas HEMT in type III nitride devices using ion implantation through gray scale mask

US8933487B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8933487-B2
Application numberUS-201314063207-A
CountryUS
Kind codeB2
Filing dateOct 25, 2013
Priority dateMay 23, 2012
Publication dateJan 13, 2015
Grant dateJan 13, 2015

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A high electron mobility field effect transistor (HEMT) includes a two dimensional electron gas (2DEG) in the drift region between the gate and the drain that has a non-uniform lateral 2DEG distribution that increases in a direction in the drift region from the gate to the drain.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of fabricating a high electron mobility field effect transistor (HEMT), the method comprising: forming a mask layer on a carrier supply layer, the mask layer configured to be aligned with a drift region from a gate to a drain, and configured to have a lateral variation that increases in a direction from the gate to the drain; and implanting ions through the mask layer into the carrier supply layer. 2. The method claim 1 fur…

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Next steps

Free tools are coming soon. Tell us what you want to track and we'll notify you.

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US8933487B2 cover?
A high electron mobility field effect transistor (HEMT) includes a two dimensional electron gas (2DEG) in the drift region between the gate and the drain that has a non-uniform lateral 2DEG distribution that increases in a direction in the drift region from the gate to the drain.
Who is the assignee on this patent?
Hrl Lab Llc, Hrl Lab Llc
What technology area does this patent fall under?
Primary CPC classification H10D62/57. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 13 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).