Sulfonium salt, chemically amplified resist composition, and pattern forming process
US-9221742-B2 · Dec 29, 2015 · US
US8932797B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8932797-B2 |
| Application number | US-201113307198-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 30, 2011 |
| Priority date | Nov 30, 2010 |
| Publication date | Jan 13, 2015 |
| Grant date | Jan 13, 2015 |
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A photoacid generator compound has formula (I): G + Z − (I) wherein G has formula (II): In formula (II), X is S or I, each R 0 is commonly attached to X and is independently C 1-30 alkyl; polycyclic or monocyclic C 3-30 cycloalkyl; polycyclic or monocyclic C 6-30 aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more R 0 groups are further attached to an adjacent R 0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.
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The invention claimed is: 1. A compound having the formula (I): G + Z − (I) wherein G + has the formula (II): wherein in formula (II), X is S or I, each R 0 is commonly attached to X and is independently a C 1-30 alkyl group, a polycyclic or monocyclic C 3-30 cycloalkyl group, a polycyclic or monocyclic C 6-30 aryl group or a combination comprising at least one o…
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