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Auto focus system for reticle inspection
US8928895B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8928895-B2 |
| Application number | US-89614910-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 1, 2010 |
| Priority date | Mar 5, 2007 |
| Publication date | Jan 6, 2015 |
| Grant date | Jan 6, 2015 |
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Abstract
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Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.
First claim
Opening claim text (preview).
The invention claimed is: 1. An apparatus comprising: an image capture device to capture one or more images of a reticle; and a logic to focus a lens of the image capture device, wherein the logic is to focus the lens based on a topographical map comprising previously-stored height measurements Z of an upper surface of the reticle associated with X and Y coordinates of the reticle. 2. The apparatus of claim 1 , further comprising logic to generate the topo…
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- G01B11/0608Primary
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US8928895B2 cover?
- Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, an inspection tool may be automatically focused on a reticle utilizing various topographic mapping techniques. Other embodiments are also described.
- Who is the assignee on this patent?
- Wright Michael J, Walsh Robert W, Belin Daniel L, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification G01B11/0608. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jan 06 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).