Method for fabricating two substrates connected by at least one mechanical and electrically conductive connection and structure obtained

US8928141B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8928141-B2
Application numberUS-201213983201-A
CountryUS
Kind codeB2
Filing dateJan 31, 2012
Priority dateFeb 2, 2011
Publication dateJan 6, 2015
Grant dateJan 6, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A first substrate provided with a receiving area made from a first metallic material is supplied. A second substrate provided with an insertion area comprising a base surface and at least two bumps made from a second metallic material is arranged facing the first substrate. The bumps are salient from the base surface. A pressure is applied between the first substrate and the second substrate so as to make the bumps penetrate into the receiving area. The first metallic material reacts with the second metallic material so as to form a continuous layer of an intermetallic compound having a base formed by the first and second metallic materials along the interface between the bumps and the receiving area.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for securing two substrates comprising the following steps: providing a first substrate provided with a monoblock receiving area made from a first metallic material and a second substrate provided with an insertion area including a base surface and at least two bumps made from a second metallic material, the at least two bumps being salient from the base surface, applying a pressure between the first substrate and the second substrate so as…

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What does patent US8928141B2 cover?
A first substrate provided with a receiving area made from a first metallic material is supplied. A second substrate provided with an insertion area comprising a base surface and at least two bumps made from a second metallic material is arranged facing the first substrate. The bumps are salient from the base surface. A pressure is applied between the first substrate and the second substrate so…
Who is the assignee on this patent?
Souriau Jean-Charles, Commissariat Energie Atomique
What technology area does this patent fall under?
Primary CPC classification H10W90/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 06 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).