Semiconductor device and power conversion device
US-2024355888-A1 · Oct 24, 2024 · US
US8928075B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8928075-B2 |
| Application number | US-201213563923-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 1, 2012 |
| Priority date | Aug 4, 2011 |
| Publication date | Jan 6, 2015 |
| Grant date | Jan 6, 2015 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A semiconductor device containing a high voltage MOS transistor with a drain drift region over a lower drain layer and channel regions laterally disposed at the top surface of the substrate. RESURF trenches cut through the drain drift region and body region parallel to channel current flow. The RESURF trenches have dielectric liners and electrically conductive RESURF elements on the liners. Source contact metal is disposed over the body region and source regions. A semiconductor device containing a high voltage MOS transistor with a drain drift region over a lower drain layer, and channel regions laterally disposed at the top surface of the substrate. RESURF trenches cut through the drain drift region and body region perpendicular to channel current flow. Source contact metal is disposed in a source contact trench and extended over the drain drift region to provide a field plate.
Opening claim text (preview).
What is claimed is: 1. A semiconductor device, comprising: a semiconductor substrate; a high voltage metal oxide semiconductor (MOS) transistor, including: a heavily doped lower drain layer in said substrate, said lower drain layer having a first conductivity type with an average doping density greater than 1×10 19 cm −3 ; a drain drift region disposed over said lower drain layer, said drain drift region having said first conductivity type with an average doping density betw…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Related publications grouped by family.
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Answers are generated from the same data shown on this page.