Positive electrode active material and preparation method thereof, positive electrode plate, secondary battery, battery module, battery pack, and electric apparatus
US-2024429384-A1 · Dec 26, 2024 · US
US2026045498A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2026045498-A1 |
| Application number | US-202519361435-A |
| Country | US |
| Kind code | A1 |
| Filing date | Oct 17, 2025 |
| Priority date | Oct 31, 2023 |
| Publication date | Feb 12, 2026 |
| Grant date | — |
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An anode material including a silicon-based core and a carbon layer disposed on at least part of a surface of the silicon-based core are described. The silicon-based core includes nano-silicon and a silicate containing a metal M element. The anode material is subjected to section and energy spectrum analysis, k1≤10, k2≤5, and 0.1<k2/k1≤1 are satisfied. The method for preparing the anode material includes: heating and evaporating the pre-disproportionated silicon oxide material and M metal source material to obtain silicon oxide gas and metal source gas; mixing and condensing these two gases to obtain the core material; and performing carbon coating treatment to obtain the anode material. The metal silicate in the prepared anode material effectively separates a nano-silicon domain and a silicon oxide domain, is relatively uniform in distribution, and has high initial Coulombic efficiency and good cycle performance.
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What is claimed is: 1 . An anode material, comprising a silicon-based core and a carbon layer disposed on at least a part of a surface of the silicon-based core, wherein the silicon-based core comprises nano-silicon and a silicate containing a metal M element; wherein when section and energy spectrum analysis are performed on the anode material, sections of n1 particles are randomly selected for surface scanning analysis to obtain n1 content values of the M element, a standard deviation k1 of the n1 content values of the M element is calculated, k1≤10; n2 points in the section of any particle are selected for point scanning analysis to obtain n2 content values of the M element, a standard deviation k2 of the n2 content values of the M element are calculated, where k2≤5, 0.1<k2/k1≤1, n1 is a natural number greater than or equal to 5, and n2 is a natural number greater than or equal to 5. 2 . The anode material according to claim 1 , wherein the silicon-based core further comprises silicon oxide. 3 . The anode material according to claim 1 , wherein the silicon-based core has a D 50 in a range of 5.0 to 5.5 μm. 4 . The anode material according to claim 1 , wherein a size of silicon crystal grains of the nano-silicon is <10 nm. 5 . The anode material according to claim 1 , wherein the anode material has a pH satisfying 7<pH≤10.5. 6 . The anode material according to claim 1 , wherein the M element comprises at least one metal element in groups IA, IIA and IIIA. 7 . The anode material according to claim 1 , wherein the M element comprises at least one of lithium, sodium, potassium, magnesium, calcium, and aluminum. 8 . The anode material according to claim 1 , wherein the anode material has a true density in a range of 2.0 g/cm 3 to 2.6 g/cm 3 . 9 . The anode material according to claim 1 , wherein the anode material has a specific surface area in a range of 2 m 2 /g to 10 m 2 /g. 10 . The anode material according to claim 1 , wherein in the anode material, a mass ratio of the M element is 3% to 20%, and a mass ratio of the carbon layer is 1% to 20%. 11 . The anode material according to claim 1 , wherein at least one of the following conditions is satisfied: (1) when the silicate containing the metal M element comprises MgSiO 3 , in the XRD spectrum of the anode material, a diffraction peak of MgSiO 3 (610) is between 30° and 31°; the diffraction peak of Si (220) is between 45° and 50°; and a ratio α of intensities of two diffraction peaks satisfies α=I Si (220)/I MgSiO3 (610), where 0<α<2; and (2) when the metal M element containing silicate comprises MgSiO 3 , an average size D of the MgSiO 3 crystal grains in a direction perpendicular to a (610) crystal plane is calculated to be ≤30 nm according to the XRD spectrum of the anode material and the Scherer formula D=0.9λ/β cos θ. 12 . The anode material according to claim 2 , further satisfying at least one of the following conditions: (1) the nano-silicon is dispersed in the silicon oxide; and (2) the silicate containing metal M element is disposed on the nano-silicon or the silicon oxide. 13 . The anode material according to claim 1 , wherein the carbon layer has a thickness in a range of 50 nm to 500 nm. 14 . A method for preparing an anode material according to claim 1 , comprising: placing a metal source material and a pre-disproportionated silicon oxide material at different positions of a same vacuum heating system for heating evaporation respectively to obtain a metal source gas and a silicon oxide gas; mixing and condensing the silicon oxide gas and the metal source gas to obtain a core material; and performing carbon coating treatment on the core material to obtain the anode material. 15 . The method according to claim 14 , wherein at least one of the following conditions is satisfied: (1) the method for preparing the pre-disproportionated silicon oxide material comprises: performing pre-disproportionation treatment on the amorphous SiO block to obtain silicon oxide containing disproportionated silicon crystal grains<20 nm, and performing powdering or crushing treatment to obtain pre-disproportionated silicon oxide powder or particles; (2) the metal source material comprises at least one of a magnesium source material, a lithium source material, a sodium source material, a potassium source material, a calcium source material, and an aluminum source material; and (3) the heating and evaporating of the pre-disproportionated silicon oxide material are performed at a temperature in a range of 1000° C. to 1500° C. 16 . The method according to claim 14 , wherein at least one of the following conditions is satisfied: (1) the heating and evaporating of the metal source material are performed at a temperature in a range of 600° C. to 1350° C.; (2) after the condensation, further comprising: collecting the condensed precursor material, and crushing and grading the precursor material to obtain the core material, the core material has a volume distribution D 50 in a range of 5.0 to 5.5 μm; and (3) the carbon coating treatment comprises gaseous phase coating, liquid phase coating or solid phase coating. 17 . The method according to claim 16 , wherein at least one of the following conditions is satisfied: (1) a temperature of the pre-disproportionation treatment is in a range of 1000° C. to 1200° C.; (2) a heat preservation time of the pre-disproportionation treatment is in a range of 3 h to 10 h; and (3) a gas used for the gaseous phase coating comprises a carbon source gas and a carrier gas. 18 . The method according to claim 17 , wherein at least one of the following conditions is satisfied: (1) a temperature of the gaseous phase coating is in a range of 700° C. to 1000° C.; (2) the carbon source gas comprises at least one of methane, ethane, propane, butane, ethylene, propylene and acetylene; and (3) the gas used for the gaseous phase coating further comprises hydrogen, and an atmosphere ratio of the carbon source gas, the hydrogen, and the carrier gas is (2-15):1:3.5. 19 . The method according to claim 14 , wherein the silicon oxide gas and the metal source gas are mixed under a vacuum condition with a vacuum degree of 0 to 100 Pa. 20 . A secondary battery, comprising an anode material according to claim 1 .
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