Semiconductor device and method for forming the same
US-2024395669-A1 · Nov 28, 2024 · US
US2026026412A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2026026412-A1 |
| Application number | US-202519345880-A |
| Country | US |
| Kind code | A1 |
| Filing date | Sep 30, 2025 |
| Priority date | Dec 29, 2023 |
| Publication date | Jan 22, 2026 |
| Grant date | — |
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A method includes: providing an active photonic component of a photonic integrated circuit (PIC); attaching two electrodes to the active photonic component of the PIC; providing a first landing pad on a front surface of the PIC, wherein, when viewed from a direction perpendicular to the front surface of the PIC, a center of the active photonic component of the PIC is offset from a nearest edge of the first landing pad by about a distance less than 10 μm; and electrically connecting the first landing pad to one of the two electrodes.
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What is claimed is: 1 . A method comprising: receiving a photonic integrated circuit (PIC) that comprises an active photonic component operable under an electrical signal, and two electrodes coupled to the active photonic component; installing a first landing pad on a front surface of the PIC, wherein, when viewed from a direction perpendicular to the front surface of the PIC, a center of the active photonic component of the PIC is offset from a nearest edge of the first landing pad by about a distance less than 10 μm; electrically connecting the first landing pad to one of the two electrodes coupled to the active photonic component; receiving an electric integrated circuit (EIC) having an electrical component configured to provide the electrical signal, and a second landing pad electrically connected to the electrical component; and flip-chip bonding the EIC to the front surface of the PIC, wherein the electrical component of the EIC and the active photonic component are spaced apart by 2 mm or less. 2 . The method of claim 1 , further comprising: plating a hole in the first landing pad using at least one of: a nickel material, or a gold material. 3 . The method of claim 2 , wherein the first landing pad is shaped as a polygon, an oval, or a circle. 4 . The method of claim 3 , wherein the plated hole in the first landing pad is at a center of the polygon, the oval, or the circle. 5 . The method of claim 3 , wherein the plated hole in the first landing pad is away from a center of the polygon or the circle. 6 . The method of claim 1 , wherein the first landing pad has a lateral dimension of less than 50 μm. 7 . The method of claim 2 , further comprising: mating a flip-chip bump embedded in the second landing pad of the EIC with the plated hole in the first landing pad of the PIC when flip-chip bonding the EIC to the PIC. 8 . The method of claim 7 , wherein the flip-chip bump has a lateral dimension of 30 μm or less. 9 . The method of claim 1 , further comprising: routing bias traces to a back surface of the PIC to form an interdigital filter, wherein the back surface is opposite to the front surface. 10 . The method of claim 9 , further comprising: coupling the other one of the two electrodes to the interdigital filter. 11 . The method of claim 9 , wherein the interdigital filter comprises at least one of: a metal-oxide-metal capacitor (MOMCAP), a metal-insulator-metal capacitor (MIMCAP). 12 . The method of claim 9 , wherein the active photonic component is: an electro-absorption modulator (EAM), a ring modulator, an interference-based modulator, or a photodiode. 13 . The method of claim 12 , further comprising: electrically connecting the first landing pad to a cathode of the EAM. 14 . The method of claim 12 , further comprising: electrically connecting an anode of the EAM to the interdigital filter. 15 . The method of claim 1 , wherein the distance is in a range from 5 μm to 8 μm. 16 . A method comprising: receiving a photonic integrated circuit (PIC) having an active photonic component and two electrodes coupled thereto, one of the two electrodes being electrically connected to a first landing pad of the PIC; receiving an electric integrated circuit (EIC) having a second landing pad where a flip-chip bump is embedded; and mating a plated hole in the first landing pad with the flip-chip bump embedded in the second landing pad when flip-chip bonding the EIC to a surface of the PIC, wherein, when viewed from a direction perpendicular to the surface of the PIC, a center of the active photonic component of the PIC is offset from a nearest edge of the first landing pad by about a distance less than 10 μm. 17 . The method of claim 16 , wherein the active photonic component is: an electro-absorption modulator (EAM), a ring modulator, an interference-based modulator, or a photodiode. 18 . The method of claim 16 , wherein the distance is in a range from 5 μm and 8 μm. 19 . A method comprising: receiving a photonic integrated circuit (PIC) having an active photonic component attached to two electrodes, one of the two electrodes being electrically connected to a first landing pad where a flip-chip bump is embedded; receiving an electric integrated circuit (EIC) having a second landing pad with a plated hole; and mating the plated hole in the second landing pad with the flip-chip bump embedded in the first landing pad when flip-chip bonding the EIC to a surface of the PIC, wherein, when viewed from a direction perpendicular to the surface of the PIC, a center of the active photonic component of the PIC is offset from a nearest edge of the first landing pad by about a distance less than 10 μm. 20 . The method of claim 19 , wherein the active photonic component is: an electro-absorption modulator (EAM), a ring modulator, an interference-based modulator, or a photodiode. 21 . The method of claim 19 , wherein the distance is in a range from 5 μm to 8 μm.
between stacked chips · CPC title
between stacked chips · CPC title
characterised by the relative positions of pads or connectors relative to package parts · CPC title
on active surfaces of flip-chip devices, e.g. underfills · CPC title
comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu · CPC title
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