Optical waveguide and method for manufacturing the same, and augmented reality display apparatus

Patent metadata

Field	Value
Publication number	US-2026023214-A1
Application number	US-202419112117-A
Country	US
Kind code	A1
Filing date	Apr 22, 2024
Priority date	Apr 23, 2023
Publication date	Jan 22, 2026
Grant date	—

Abstract

An optical waveguide, a method for manufacturing the same, and an augmented reality display device. The optical waveguide includes: a substrate; a grating being arranged on a surface of the substrate and being located in a first region; a support layer being arranged on the surface of the substrate and being located in at least portion of a second region, and the surface of the support layer away from the substrate not being lower than the surface of the grating away from the substrate; an adhesive layer being located in a third region; and a protective layer being connected to the substrate through the adhesive layer, the grating, the support layer and the bonding layer are all located between the substrate and the protective layer.

First claim

1 . An optical waveguide, comprising:
a substrate; a grating, wherein the grating is disposed on a surface of the substrate and located in a first region; a support layer, wherein the support layer is disposed on the surface of the substrate and located in at least a portion of a second region, and a surface of the support layer away from the substrate is not lower than a surface of the grating away from the substrate; an adhesive layer, wherein the adhesive layer is disposed on the surface of the substrate and located in a third region; and a protective layer, wherein the protective layer is directly opposite to the substrate, the protective layer is connected to the substrate through the adhesive layer, and the grating, the support layer, and the adhesive layer are all located between the substrate and the protective layer, the second region is disposed at a periphery of the first region, and the third region is disposed at a periphery of the second region.

2 . The optical waveguide according to claim 1 , wherein a thickness of the support layer is less than or equal to a thickness of the adhesive layer.

3 . The optical waveguide according to claim 2 , wherein a thickness of the grating is the same as the thickness of the adhesive layer, and two ends of the support layer in an extending direction are respectively connected to the grating and the adhesive layer, the extending direction intersects with a thickness direction of the support layer.

4 . The optical waveguide according to claim 3 , wherein the adhesive layer is continuous without interruption in the third region.

5 . The optical waveguide according to claim 1 , wherein a transmittance of the support layer to visible light is not less than 80%; and
a material for forming the support layer is an inorganic material, the inorganic material comprises at least one of the group consisting of SiNx, ITO, and SiO 2 .

6 . The optical waveguide according to claim 5 , wherein a thickness of the support layer is in a range from 1 to 500 μm.

7 . A method for manufacturing an optical waveguide, wherein the optical waveguide comprises:
a substrate; a grating, wherein the grating is disposed on a surface of the substrate and located in a first region; a support layer, wherein the support layer is disposed on the surface of the substrate and located in at least a portion of a second region, and a surface of the support layer away from the substrate is not lower than a surface of the grating away from the substrate; an adhesive layer, wherein the adhesive layer is disposed on the surface of the substrate and located in a third region; and a protective layer, wherein the protective layer is directly opposite to the substrate, the protective layer is connected to the substrate through the adhesive layer, and the grating, the support layer, and the adhesive layer are all located between the substrate and the protective layer, the second region is disposed at a periphery of the first region, and the third region is disposed at a periphery of the second region, wherein the method for manufacturing the optical waveguide comprises: providing the substrate; forming the grating in the first region of the surface of the substrate; providing the protective layer, and forming the support layer in the second region of the surface of the protective layer, a thickness of the support layer being not less than a thickness of the grating; and bonding the substrate and the protective layer together by the adhesive layer using a bonding process, the grating and the support layer being both located between the substrate and the protective layer, and the first region and the second region having no overlapping portion.

8 . The method according to claim 7 , wherein forming the support layer comprises:
forming a thin-film material on the surface of the protective layer, the thin-film material completely covering the substrate; and patterning the thin-film material to form the support layer.

9 . The method according to claim 7 , wherein forming the grating comprises:
forming an imprinting adhesive material on the surface of the substrate; and performing imprinting treatment on the imprinting adhesive material to form the grating.

10 . The method according to claim 7 , wherein the adhesive layer is formed in the third region, the second region is disposed at the periphery of the first region, and the third region is disposed at the periphery of the second region.

11 . An augmented reality display apparatus, comprising an optical waveguide,
wherein the optical waveguide comprises: a substrate; a grating, wherein the grating is disposed on a surface of the substrate and located in a first region; a support layer, wherein the support layer is disposed on the surface of the substrate and located in at least a portion of a second region, and a surface of the support layer away from the substrate is not lower than a surface of the grating away from the substrate; an adhesive layer, wherein the adhesive layer is disposed on the surface of the substrate and located in a third region; and a protective layer, wherein the protective layer is directly opposite to the substrate, the protective layer is connected to the substrate through the adhesive layer, and the grating, the support layer, and the adhesive layer are all located between the substrate and the protective layer, the second region is disposed at a periphery of the first region, and the third region is disposed at a periphery of the second region.

12 . The method according to claim 7 , wherein the thickness of the support layer is less than or equal to a thickness of the adhesive layer.

13 . The method according to claim 7 , wherein the thickness of the grating is the same as a thickness of the adhesive layer, and two ends of the support layer in an extending direction are respectively connected to the grating and the adhesive layer, the extending direction intersects with a thickness direction of the support layer.

14 . The method according to claim 7 , wherein the adhesive layer is continuous without interruption in the third region.

15 . The method according to claim 7 , wherein a transmittance of the support layer to visible light is not less than 80%; and
a material for forming the support layer is an inorganic material, the inorganic material comprises at least one of the group consisting of SiNx, ITO, and SiO 2 .

16 . The method according to claim 7 , wherein the thickness of the support layer is in a range from 1 to 500 μm.

17 . The augmented reality display apparatus according to claim 11 , wherein a thickness of the support layer is less than or equal to a thickness of the adhesive layer.

18 . The augmented reality display apparatus according to claim 11 , wherein a thickness of the grating is the same as the thickness of the adhesive layer, and two ends of the support layer in an extending direction are respectively connected to the grating and the adhesive layer, the extending direction intersects with a thickness direction of the support layer.

19 . The augmented reality display apparatus according to claim 11 , wherein the adhesive layer is continuous without interruption in the third region.

20 . The augmented reality display apparatus according to claim 11 , wherein a transmittance of the support layer to visible light is not less than 80%; and
a material for forming the support layer is an inorganic material, the inorganic material comprises at least one of the group consisting

Assignees

• Beijing Zitiao Network Technology Co Ltd

Inventors

• Tan Wei
• Tang Hao
• Li Xiaokai

Classifications

• G02B2006/12107

  Grating · CPC title

• G02B2006/12038

  Glass (SiO2 based materials) · CPC title

• G02B27/0101 Primary

  characterised by optical features (G02B27/0172 takes precedence) · CPC title

• G02B6/132

  by deposition of thin films · CPC title

• G02B6/12004 Primary

  Combinations of two or more optical elements · CPC title