Carbon dioxide reusing system and method

Patent metadata

Field	Value
Publication number	US-2025369687-A1
Application number	US-202519297538-A
Country	US
Kind code	A1
Filing date	Aug 12, 2025
Priority date	Jul 9, 2021
Publication date	Dec 4, 2025
Grant date	—

Abstract

A system and a method for reusing carbon dioxide are provided. The method includes: producing reused carbon dioxide by purifying exhaust gas discharged from a semiconductor manufacturing apparatus; storing the produced reused carbon dioxide in a recovery tank; supplying the reused carbon dioxide from the recovery tank to a first supply tank; supplying the reused carbon dioxide from the first supply tank to a second supply tank; supplying the reused carbon dioxide from the second supply tank to the semiconductor manufacturing apparatus; determining whether a purity of the reused carbon dioxide flowing from the recovery tank to the first supply tank meets a predefined reference; and blocking flow of the reused carbon dioxide from the recovery tank to the first supply tank, based on determining that the purity of the reused carbon dioxide flowing from the recovery tank to the first supply tank does not meet the predefined reference.

First claim

What is claimed is:

1 . A method for manufacturing semiconductor devices, the method comprising:
producing reused carbon dioxide by purifying exhaust gas discharged from a semiconductor manufacturing apparatus; storing the produced reused carbon dioxide in a recovery tank; supplying the reused carbon dioxide from the recovery tank to a first supply tank; supplying the reused carbon dioxide from the first supply tank to a second supply tank; supplying the reused carbon dioxide from the second supply tank to the semiconductor manufacturing apparatus; determining whether a purity of the reused carbon dioxide flowing from the recovery tank to the first supply tank meets a predefined reference; and blocking flow of the reused carbon dioxide from the recovery tank to the first supply tank, based on determining that the purity of the reused carbon dioxide flowing from the recovery tank to the first supply tank does not meet the predefined reference.

2 . The method of claim 1 , wherein the method further comprises supplying the reused carbon dioxide previously stored in the first supply tank to the second supply tank while the flow of the reused carbon dioxide from the recovery tank to the first supply tank is blocked.

3 . The method of claim 1 , wherein whether the flow of the reused carbon dioxide from the recovery tank to the first supply tank is blocked is based on a control signal, and
wherein the method further comprises:
sampling the reused carbon dioxide in a first pipe that connects the recovery tank to the first supply tank;
analyzing the sampled reused carbon dioxide to generate an analyzing result; and
generating the control signal based on the analyzing result.

4 . The method of claim 1 , wherein the purifying the exhaust gas discharged from the semiconductor manufacturing apparatus comprises:
collecting the exhaust gas; removing moisture from the collected exhaust gas; removing organic impurities from the collected exhaust gas to produce the reused carbon dioxide; and storing the produced reused carbon dioxide in the recovery tank.

5 . The method of claim 4 , wherein the method further comprises determining whether the reused carbon dioxide stored in the recovery tank satisfies the predefined reference.

6 . The method of claim 5 , wherein the predefined reference related to the purity of the reused carbon dioxide flowing from the recovery tank to the first supply tank and the predefined reference related to the purity of the reused carbon dioxide stored in the recovery tank are equal to each other.

7 . The method of claim 1 , wherein the method further comprises:
receiving the reused carbon dioxide from the second supply tank; removing residual impurities from the reused carbon dioxide that is received from the second supply tank; and supplying the reused carbon dioxide, from which the residual impurities are removed, to the semiconductor manufacturing apparatus.

8 . The method of claim 7 , wherein the method further comprises determining whether a purity of the reused carbon dioxide, from which the residual impurities have been removed, satisfies the predefined reference.

9 . The method of claim 1 , wherein the method further comprises:
combusting liquefied natural gas (LNG) as a fuel to discharge additional exhaust gas containing carbon dioxide; and purifying the discharged additional exhaust gas, and producing additional reused carbon dioxide therefrom, and storing the additional reused carbon dioxide.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Kim Jin Soo
• Park Myung Beom
• Kang Dong-Min
• Choi Sam Jong

Classifications

• G01N1/2247

  Sampling from a flowing stream of gas · CPC title

• G01N1/2226

  Sampling from a closed space, e.g. food package, head space · CPC title

• G01N33/004 Primary

  CO or CO2 · CPC title

• C01B32/50

  Carbon dioxide · CPC title

• Y02C20/40

  of CO2 · CPC title