Sensor

US2025297904A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025297904-A1
Application numberUS-202519076097-A
CountryUS
Kind codeA1
Filing dateMar 11, 2025
Priority dateMar 21, 2024
Publication dateSep 25, 2025
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A sensor, including: a metal base having a surface formed with streaks along a first direction in plan view, and a conductive layer pattern provided on an insulation film formed on the surface; wherein, on the surface, the insulation film covers a first area which exists towards a first direction in plan view with respect to a conductive layer pattern forming area formed with the conductive layer pattern, and the surface comprises an exposed area exposed from the insulation film at a position different from the first area in plan view.

First claim

Opening claim text (preview).

What is claimed is: 1 . A sensor, comprising: a metal base having a surface formed with streaks along a first direction in plan view, and a conductive layer pattern provided on an insulation film formed on the surface; wherein, on the surface, the insulation film covers a first area which exists towards a first direction in plan view with respect to a conductive layer pattern forming area formed with the conductive layer pattern, and the surface comprises an exposed area exposed from the insulation film at a position different from the first area in plan view. 2 . The sensor according to claim 1 , wherein the surface comprises at least two exposed areas, and the conductive layer pattern exists between the at least two exposed areas in plan view. 3 . The sensor according to claim 2 , wherein the conductive layer pattern has a patterned portion shaped in a square wave form or a meander form in plan view, and the conductive layer pattern is provided between two exposed areas among the at least two exposed areas in an amplitude direction of the square wave form or the meander form. 4 . The sensor according to claim 1 , wherein a surface roughness Ra of the surface in regards with a second direction which is perpendicular to the first direction in plan view is 0.05 μm or larger and 1 μm or smaller.

Assignees

Inventors

Classifications

  • using change in resistance · CPC title

  • using resistance strain gauges · CPC title

  • Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges · CPC title

  • G01L9/04Primary

    of resistance-strain gauges · CPC title

  • G01L1/2287Primary

    constructional details of the strain gauges (adjustable resistors H01C10/00) · CPC title

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Frequently asked questions

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What does patent US2025297904A1 cover?
A sensor, including: a metal base having a surface formed with streaks along a first direction in plan view, and a conductive layer pattern provided on an insulation film formed on the surface; wherein, on the surface, the insulation film covers a first area which exists towards a first direction in plan view with respect to a conductive layer pattern forming area formed with the conductive lay…
Who is the assignee on this patent?
Tdk Corp
What technology area does this patent fall under?
Primary CPC classification G01L9/04. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Sep 25 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).