Method for reforming carbon dioxide and methane using catalyzed plasma reactor

US2025223159A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025223159-A1
Application numberUS-202419003416-A
CountryUS
Kind codeA1
Filing dateDec 27, 2024
Priority dateJan 8, 2024
Publication dateJul 10, 2025
Grant date

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Abstract

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A method for reforming carbon dioxide and methane by using a catalyzed plasma reactor, the method includes providing a dielectric barrier discharge plasma reactor including a catalyst bed in a plasma discharge zone, injecting a reaction gas into the plasma reactor, generating plasma within the plasma discharge zone of the plasma reactor, generating a reformed gas by interaction between the plasma and the catalyst bed, and separating the reformed gas. The reaction gas includes methane, carbon dioxide, oxygen, and inert gas, the reformed gas includes carbon monoxide and hydrogen, and the oxygen is about 2 volume percent to about 15 volume percent of a total volume of the reaction gas.

First claim

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What is claimed is: 1 . A method for reforming carbon dioxide and methane by using a catalyzed plasma reactor, the method comprising: providing a dielectric barrier discharge plasma reactor including a catalyst bed in a plasma discharge zone; injecting a reaction gas into the plasma reactor; generating a plasma within the plasma discharge zone of the plasma reactor; generating a reformed gas by interaction between the plasma and the catalyst bed; and separating the reformed gas, wherein the reaction gas includes methane, carbon dioxide, oxygen, and inert gas, the reformed gas includes carbon monoxide and hydrogen, and the oxygen is about 2 volume percent to about 15 volume percent of a total volume of the reaction gas. 2 . The method of claim 1 , wherein the methane is about 10 volume percent to about 30 volume percent of the total volume of the reaction gas. 3 . The method of claim 1 , wherein the carbon dioxide is about 15 volume percent to about 45 volume percent of the total volume of the reaction gas. 4 . The method of claim 1 , wherein the plasma reactor comprises: a body providing a plasma discharge zone; an internal electrode within the plasma discharge zone; an external electrode defining the plasma discharge zone and disposed on an outer surface of the body; and a dielectric barrier between the internal electrode and the external electrode. 5 . The method of claim 4 , wherein the body comprises the dielectric barrier. 6 . The method of claim 5 , wherein the body includes quartz. 7 . The method of claim 4 , wherein the external electrode includes a metal mesh. 8 . The method of claim 1 , wherein the catalyst bed includes Ni, Cu, Pd, Pt, Ag, Fe, or a combination thereof. 9 . The method of claim 1 , wherein the catalyst bed includes a metal oxide doped with Ni, Cu, Pd, Pt, Ag, Fe, or a combination thereof. 10 . The method of claim 1 , wherein the catalyst bed includes a metal oxide coated with Ni, Cu, Pd, Pt, Ag, Fe, or a combination thereof. 11 . The method of claim 9 , wherein the metal oxide includes Al 2 O 3 , SiO 2 , MgO, CeO 2 , or a combination thereof. 12 . The method of claim 1 , wherein the catalyst bed includes Ni/Al 2 O 3 , Ni/SiO 2 , Ni/MgO, Cu/Al 2 O 3 , Pd/Al 2 O 3 , Pd/CeO 2 , Pt—Re/Al 2 O 3 , Ag/Al 2 O 3 , Fe/Al 2 O 3 , LaFeO 3 , La 2 O 3 , Ni/MgAl 2 O 4 , NiFe 2 O 4 /SiO 2 , Ni/Al 2 O 3 —MgO, BaFe 0.5 Nb 0.5 O 3 , LaNi 2 O 3 /SiO 2 , Na-ZSM-5, TiO 2 /g-C 3 N 4 , BaTiO 3 , or a combination thereof. 13 . The method of claim 1 , wherein, in the generating of the reformed gas, a coke disposed on a surface of the catalyst bed is removed by reaction with oxygen species generated by the plasma. 14 . The method of claim 1 , wherein, after the generating of the reformed gas, the catalyst bed does not include the coke. 15 . The method of claim 1 , wherein a temperature of the plasma discharge zone is about 15° C. to about 35° C. 16 . The method of claim 1 , wherein a flow rate of the reaction gas per weight of a catalyst is about 0.1 to 10 liters per hour-gram. 17 . The method of claim 1 , wherein the inert gas includes helium, nitrogen, argon, or a combination thereof. 18 . The method of claim 4 , wherein the generating of the plasma comprises applying an alternating current pulse voltage to the internal electrode. 19 . The method of claim 18 , wherein the alternating current pulse voltage has a frequency of about 40 kilohertz to about 90 kilohertz, a peak voltage of about 1 kilovolts to about 3 kilovolts, and a pulse width of about 1 microseconds to about 9 microseconds. 20 . The method of claim 1 , wherein some of the reformed gas passes through a component analyzer.

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What does patent US2025223159A1 cover?
A method for reforming carbon dioxide and methane by using a catalyzed plasma reactor, the method includes providing a dielectric barrier discharge plasma reactor including a catalyst bed in a plasma discharge zone, injecting a reaction gas into the plasma reactor, generating plasma within the plasma discharge zone of the plasma reactor, generating a reformed gas by interaction between the plas…
Who is the assignee on this patent?
Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification C01B3/342. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jul 10 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).