Wafer container and wafer support

Patent metadata

Field	Value
Publication number	US-2025183076-A1
Application number	US-202318843925-A
Country	US
Kind code	A1
Filing date	Feb 8, 2023
Priority date	Mar 8, 2022
Publication date	Jun 5, 2025
Grant date	—

Abstract

In a wafer container, cell rings of a container body each include an outer frame, a support protruding inward from the outer frame, a first guide and a second guide inside the outer frame and facing each other in a first direction, and a pair of third guides inside the outer frame and facing each other in a second direction. The container body includes a first flow path to guide inert gas upward, a horizontal flow path to guide the inert gas in a horizontal direction, and a second flow path to guide the inert gas downward. In the container body, the pair of third guides prevents the inert gas in the horizontal flow path from deviating in the second direction.

First claim

1 - 7 . (canceled)

8 : A wafer container comprising:
a container body including a plurality of wafer supports stacked in a vertical direction to store a wafer; a top plate on an upper side of the container body; and a bottom plate on a lower side of the container body and including an inflow hole for inert gas; wherein the wafer supports each includes:
an outer frame defining a side surface of the container body;
a support protruding inward from the outer frame to support the wafer;
a first guide and a second guide inside the outer frame and facing each other in a first direction perpendicular or substantially perpendicular to the vertical direction; and
a pair of third guides inside the outer frame and facing each other in a second direction perpendicular or substantially perpendicular to both the vertical direction and the first direction;
the container body includes:
a first flow path defined by the first guide to guide the inert gas from the inflow hole upward;
a horizontal flow path to guide the inert gas from the first flow path in a horizontal direction; and
a second flow path defined by the second guide to guide the inert gas from the horizontal flow path downward; and
the pair of third guides prevents the inert gas in the horizontal flow path from deviating in the second direction in the container body.

9 : The wafer container according to claim 8 , wherein, in two of the wafer supports stacked in the vertical direction, a first gap is located between the lower first guide and the upper first guide, and a second gap is located between the lower second guide and the upper second guide.

10 : The wafer container according to claim 9 , wherein
in two of the wafer supports stacked in the vertical direction, a third gap is located between the lower third guide and the upper third guide; and the third gap is smaller than the first gap and smaller than the second gap.

11 : The wafer container according to claim 8 , wherein the pair of third guides includes a pair of inner peripheries extending along an outer periphery of the wafer supported by the support when viewed from above.

12 : The wafer container according to claim 8 , wherein
the pair of third guides includes a pair of inner peripheries extending along an outer periphery of the wafer supported by the support when viewed from above; and in the container body including the wafer supports stacked one another, an assembly of the pairs of inner peripheries defines a restriction wall to prevent the inert gas in the horizontal flow path from deviating in the second direction.

13 : A wafer support configured to support a wafer, the wafer support comprising:
an outer frame structured to surround the wafer; a plurality of supports protruding inward from the outer frame to support the wafer; a first guide and a second guide inside the outer frame and facing each other in a first direction perpendicular or substantially perpendicular to a vertical direction; and a pair of third guides inside the outer frame and facing each other in a second direction perpendicular or substantially perpendicular to both the vertical direction and the first direction; wherein when the wafer support is stacked, a first flow path is formed by a first frame portion of the outer frame and the first guide, and a second flow path is defined by a second frame portion of the outer frame and the second guide; and the supports are between the first guide and the pair of third guides, and between the second guide and the pair of third guides.

14 : The wafer support according to claim 13 , wherein the first guide, the second guide, and the pair of third guides each have a circular or substantially circular shape surrounding an outer periphery of the wafer supported by the supports when viewed from above.

Assignees

• Murata Machinery Ltd

Inventors

• UENOYAMA Taito
• Kato Yumiko
• Miyashita Naoto

Classifications

• H10P72/1926 Primary

  characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier · CPC title

• H10P72/1922

  characterised by the construction of the closed carrier · CPC title

• H10P72/1921

  characterised by substrate supports · CPC title

• H10P72/18 Primary

  characterised by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports · CPC title

• H01L21/67393

  Electricity · mapped topic