Compound and Molded Body Comprising Same

US2025122144A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025122144-A1
Application numberUS-202318728572-A
CountryUS
Kind codeA1
Filing dateOct 13, 2023
Priority dateOct 13, 2022
Publication dateApr 17, 2025
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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  7. Citations and related patents

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Abstract

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A compound represented by Chemical Formula 1 is dissolved in at least two of ether, toluene or ethyl acetate at room temperature, and a molded article is formed including the same.

First claim

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1 . A compound represented by the following Chemical Formula 1 configured to dissolve in at least two of ether, toluene and ethyl acetate at room temperature: wherein, L1 is an alkylene group, R1 to R3 are the same as or different from each other, and are each independently an alkyl group, and at least one of R1 to R3 is an alkyl group having a range of 5 to 30 carbon atoms, R4 is hydrogen or an alkyl group, and R − is a salicylate-based anion, a sulfate-based anion, a bisulfate-based anion, a benzoate-based anion, a sorbate-based anion, or a lactate-based anion. 2 . The compound of claim 1 , wherein R − is any one of the following structures: wherein R10 to R12 are the same as or different from each other, and are each independently hydrogen, an alkyl group, or an aryl group, r10 is an integer ranging from 1 to 4, and when r10 is 2 or higher, two or more R10 groups are the same as or different from each other, and r11 is an integer ranging from 1 to 5, and when r11 is 2 or higher, two or more R11 groups are the same as or different from each other. 3 . The compound of claim 1 , wherein any one of R1 to R3 is an alkyl group having a range of 5 to 30 carbon atoms, and the remaining R1 to R3 groups are the same as or different from each other, and are each independently an alkyl group having a range of 1 to 30 carbon atoms. 4 . The compound of claim 1 , wherein the compound is any one of the following structures: 5 . The compound of claim 1 , wherein the compound has a bacteriostatic reduction rate of 90% or more against at least one strain selected from the group consisting of Gram-positive bacteria, Gram-negative bacteria, and molds, as measured by the following Method 1: [Method 1] inoculating 20 mL of a broth type medium with 3000 CFU/mL of bacteria; adding 0.005 g, 0.01 g, 0.015 g, or 0.020 g of a compound to a 50-ml conical tube; vortexing the mixture; culturing the mixture in a shaking water bath maintained at a temperature of 35° C. for 16 hours; diluting the mixture to 1/5 using a 1×PBS buffer solution; measuring absorbance at a wavelength of 600 nm using a UV/Vis spectrophotometer; comparing the absorbance to that of a solution cultured without the bacteria; and calculating the bacteriostatic reduction rate using Equation 1: Bacterial proliferation reduction ratio (%)=(1 −A Sample /A Reference )×100 wherein A Sample is an absorbance of bacteriostatic material-containing medium solution, and A Reference is an absorbance of solution cultured using only medium and microorganisms. 6 . The compound of claim 5 , wherein the Gram-positive bacteria are selected from Enterococcus faecalis, Staphylococcus aureus, Streptococcus pneumoniae, Enterococcus faecium and Lactobacillus lactis. 7 . The compound of claim 5 , wherein the Gram-negative bacteria are selected from Proteus mirabilis, Escherichia coli, Salmonella typhi, Pseudomonas aeruginosa and Vibrio cholerae. 8 . An antibacterial composition comprising the compound according to claim 1 . 9 . The antibacterial composition of claim 8 , further comprising a solvent, wherein the solvent is at least one of ether, toluene, ethyl acetate, acetone, water, acetonitrile, ethanol, dichloromethane, chloroform, or hexane. 10 . A molded article comprising the compound according to claim 1 or prepared therefrom. 11 . A composition comprising: a compound represented by the following Chemical Formula 1, and at least two of ether, toluene or ethyl acetate added at a temperature ranging between 10° C. to 30° C., wherein Chemical Formula 1 includes: wherein, L1 is an alkylene group, R1 to R3 are the same as or different from each other and are each independently an alkyl group, and at least one of R1 to R3 is an alkyl group having a range of 5 to 30 carbon atoms, R4 is hydrogen or an alkyl group, and R − is a salicylate-based anion, a sulfate-based anion, a bisulfate-based anion, a benzoate-based anion, a sorbate-based anion, or a lactate-based anion. 12 . The compound of claim 1 , wherein R− is not a halogen. 13 . The composition of claim 11 , wherein R− is not a halogen.

Assignees

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Classifications

  • Aromatic or araliphatic carboxylic acids, or thio analogues thereof; Derivatives thereof · CPC title

  • having at least one carboxylic group or a thio analogue, or a derivative thereof, and one oxygen or sulfur atom attached to the same aromatic ring system · CPC title

  • containing at least one carboxylic group or a thio analogue, or a derivative thereof, and a singly bound oxygen or sulfur atom attached to the same carbon skeleton, this oxygen or sulfur atom not being a member of a carboxylic group or of a thio analogue, or of a derivative thereof, e.g. hydroxy-carboxylic acids · CPC title

  • Unsaturated carboxylic acids or thio analogues thereof; Derivatives thereof · CPC title

  • Disinfectants; Antimicrobial compounds or mixtures thereof · CPC title

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What does patent US2025122144A1 cover?
A compound represented by Chemical Formula 1 is dissolved in at least two of ether, toluene or ethyl acetate at room temperature, and a molded article is formed including the same.
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C07C219/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Apr 17 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).