Method for manufacturing member of capacitor, capacitor, electrical circuit, circuit board, apparatus, and power storage device

US2025069817A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025069817-A1
Application numberUS-202418945152-A
CountryUS
Kind codeA1
Filing dateNov 12, 2024
Priority dateMay 13, 2022
Publication dateFeb 27, 2025
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for manufacturing a member of a capacitor according to the present disclosure includes forming a modified layer on a valve metal by a cathodic reaction, the modified layer including a metal other than the valve metal. In the manufacturing method, a requirement ε H /K H [V/nm]>ε L /K L [V/nm] is satisfied, where ε H is a dielectric constant of an oxide of the metal, K H [nm/V] is a thickness of a first oxide film of the metal, in formation of the first oxide film by anodic oxidation of the metal, per 1 V of anode potential, EL is a dielectric constant of an oxide of the valve metal, and K L [nm/V] is a 10 thickness of a second oxide film including the oxide of the valve metal, in formation of the second oxide film by anodic oxidation, per 1 V of anode potential.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method for manufacturing a member of a capacitor, the method comprising forming a modified layer on a valve metal by a cathodic reaction, the modified layer including a metal other than the valve metal, wherein a requirement ε H /K H [V/nm]>ε L /K L [V/nm] is satisfied, where ε H is a dielectric constant of an oxide of the metal, K H [nm/V] is a thickness of a first oxide film of the metal, in formation of the first oxide film by anodic oxidation of the metal, per 1 V of anode potential, ε L is a dielectric constant of an oxide of the valve metal, and K L [nm/V] is a thickness of a second oxide film including the oxide of the valve metal, in formation of the second oxide film by anodic oxidation, per 1 V of anode potential. 2 . The method according to claim 1 , further comprising forming a first layer and a second layer by anodic oxidation of the valve metal and the modified layer, the first layer including the metal, the second layer including the oxide of the valve metal. 3 . The method according to claim 1 , wherein the metal is cerium. 4 . A method for manufacturing a member of a capacitor, the method comprising: forming a cerium-containing layer including cerium on a valve metal by a cathodic reaction of the valve metal in a cerium-containing solution; and forming a first layer and a second layer by anodic oxidation of the valve metal and the cerium-containing layer, the first layer including cerium, the second layer including a valve metal oxide, wherein in a thickness direction of the first layer, the second layer is disposed between the first layer and the valve metal and is in contact with the valve metal. 5 . The method according to claim 4 , wherein the cerium-containing solution includes hydrogen peroxide. 6 . The method according to claim 5 , wherein an electrolyte solution including an organic solvent is used for the anodic oxidation. 7 . A capacitor comprising: a first electrode; a second electrode including a valve metal and having a cerium content of less than 0.1% in terms of number of atoms; and a dielectric disposed between the first electrode and the second electrode, wherein the dielectric includes: a first layer including cerium; and a second layer including a valve metal oxide and being, in a thickness direction of the first layer, disposed between the first layer and the second electrode and in contact with the second electrode. 8 . The capacitor according to claim 7 , wherein the first layer further includes a valve metal oxide. 9 . The capacitor according to claim 7 , wherein the valve metal included in the second electrode is aluminum. 10 . The capacitor according to claim 7 , wherein the valve metal oxide included in the second layer is an aluminum oxide. 11 . The capacitor according to claim 7 , wherein the first layer has a lower cerium concentration at a second position thereof than at a first position thereof, the second position being closer to the second layer than the first position is in the thickness direction of the first layer. 12 . The capacitor according to claim 7 , wherein the first electrode forms at least a portion of a cathode, and the second electrode forms an anode. 13 . An electrical circuit comprising the capacitor according to claim 7 . 14 . A circuit board comprising the capacitor according to claim 7 . 15 . An apparatus comprising the capacitor according to claim 7 . 16 . A power storage device comprising the capacitor according to claim 7 .

Assignees

Inventors

Classifications

  • Etched foil electrodes · CPC title

  • for surface mounting, e.g. chip capacitors · CPC title

  • Formation of the solid electrolyte layer · CPC title

  • Dielectric layers · CPC title

  • H01G9/0032Primary

    formation of the dielectric layer · CPC title

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What does patent US2025069817A1 cover?
A method for manufacturing a member of a capacitor according to the present disclosure includes forming a modified layer on a valve metal by a cathodic reaction, the modified layer including a metal other than the valve metal. In the manufacturing method, a requirement ε H /K H [V/nm]>ε L /K L [V/nm] is satisfied, where ε H is a dielectric constant of an oxide of the metal, K H [nm/V] is a …
Who is the assignee on this patent?
Panasonic Ip Man Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01G9/0032. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Feb 27 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).