Method for implementing structural color and electronic device comprising structural color

US2025051952A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025051952-A1
Application numberUS-202418925542-A
CountryUS
Kind codeA1
Filing dateOct 24, 2024
Priority dateApr 25, 2022
Publication dateFeb 13, 2025
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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According to various embodiments of the present disclosure, a method for implementing a structural color comprises: forming an oxide layer on at least a part of the surface of a metal substrate; coloring the oxide layer with a specified color, and sealing same; and etching at least a part of the surface of the oxide layer, wherein the etching operation may comprise dipping the metal substrate in a mixture solution of phosphoric acid and sulfuric acid.

First claim

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What is claimed is: 1 . A method for implementing a structural color, the method comprising: forming an oxide layer on at least a portion of a surface of a metal substrate; coloring the oxide layer in a specified color and sealing the oxide layer; and etching at least a portion of a surface of the oxide layer, wherein the etching comprises immersing the metal substrate in a mixed solution of phosphoric acid and sulfuric acid. 2 . The method of claim 1 , wherein the mixed solution of phosphoric acid and sulfuric acid comprises 80 to 95% by weight of phosphoric acid and 5 to 20% by weight of sulfuric acid. 3 . The method of claim 1 , wherein the etching is performed for 10 to 120 seconds at a temperature of 50 to 70 degrees Celsius. 4 . The method of claim 1 , wherein the etching generates irregularities on the surface of the colored and sealed oxide layer configured to reflect, refract, scatter, and/or diffract incident light. 5 . The method of claim 1 , wherein the etching forms grooves on the surface of the colored and sealed oxide layer, the grooves having a depth of 0.5 μm or less and being spaced at intervals of 1.6 μm or less. 6 . The method of claim 1 , further comprising: polishing the surface of the metal substrate prior to forming the oxide layer. 7 . The method of claim 1 , wherein the forming of the oxide layer comprises applying electricity to the metal substrate immersed in an electrolyte solution containing at least one of sulfuric acid, sodium hydroxide, oxalic acid, or chromic acid. 8 . The method of claim 7 , wherein the forming of the oxide layer comprises applying electricity at a voltage of 5 to 50 V for 10 to 180 minutes. 9 . The method of claim 8 , wherein the forming of the oxide layer is performed at a temperature of 5 to 30 degrees Celsius. 10 . The method of claim 1 , wherein the coloring of the oxide layer comprises immersing the metal substrate in a coloring solution containing an organic dye at a concentration of 1 to 10 g/l for 1 to 10 minutes. 11 . The method of claim 10 , wherein the coloring of the oxide layer is performed in an environment of 30 to 60 degrees Celsius. 12 . The method of claim 1 , wherein the etching comprises immersing the metal substrate in a mixed solution of 80 to 95% by weight of phosphoric acid and 5 to 20% by weight of sulfuric acid to form, on the surface of the oxide layer, grooves having a depth of 0.5 μm or less and spaced at intervals of 1.6 μm or less. 13 . The method of claim 12 , wherein the etching is performed for 10 to 120 seconds at a temperature of 50 to 70 degrees Celsius. 14 . The method of claim 12 , wherein the grooves are configured to implement a structural color by reflecting, refracting, scattering, and/or diffracting incident light on the surface of the oxide layer. 15 . An electronic device comprising: a housing comprising a first surface, a second surface facing away from the first surface, and a side surface structure including a side wall at least partially surrounding a space between the first surface and the second surface; a display disposed on the first surface; and a rear surface plate disposed on the second surface, wherein at least one of the side surface structure or the rear surface plate comprises a metal substrate on which a structural color is implemented according to the method of claim 1 .

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What does patent US2025051952A1 cover?
According to various embodiments of the present disclosure, a method for implementing a structural color comprises: forming an oxide layer on at least a part of the surface of a metal substrate; coloring the oxide layer with a specified color, and sealing same; and etching at least a part of the surface of the oxide layer, wherein the etching operation may comprise dipping the metal substrate i…
Who is the assignee on this patent?
Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification C25D11/30. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Feb 13 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).