Tyk2 degraders and uses thereof

US2025051338A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025051338-A1
Application numberUS-202218704633-A
CountryUS
Kind codeA1
Filing dateOct 24, 2022
Priority dateOct 25, 2021
Publication dateFeb 13, 2025
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides compounds, compositions thereof, and methods of using the same. Compounds and compositions thereof that are useful, for example, for targeting, inhibiting, and/or degrading TYK2. In certain embodiments, provided are TYK2 inhibitors and/or degraders and methods of making same. More specifically, TYK2 degraders, compositions which comprise TYK2 degraders, and methods of treating TYK2-associated conditions are provided.

First claim

Opening claim text (preview).

What is claimed is: 1 . A compound of Formula (II): or a pharmaceutically acceptable salt thereof, wherein TBM is a TYK binding moiety capable of binding to TYK2 protein; L is a bivalent moiety that connects TBM to ring A and wherein: Ring AAA is selected from: R 100 is C 1 -C 6 alkyl or H; X 1 is a bivalent moiety selected from a covalent bond, —CH 2 —, —CHCF 3 —, —SO 2 —, —S(O)—, —P(O)R—, — P(O)OR—, —P(O)NR 2 —, —C(O)—, —C(S)—, or X 2 is a carbon atom, a nitrogen atom, or silicon atom; X 3 is a bivalent moiety selected from a covalent bond, —CR 2 —, —NR—, —O—, —S—, or —Si(R) 2 —; R 1 is absent, hydrogen, deuterium, halogen, —CN, —OR, —SR, —S(O)R, —S(O) 2 R, —N(R) 2 , —P(O)(OR) 2 , —P(O)(NR 2 )OR, —P(O)(NR 2 ) 2 , —Si(OH) 2 R, —Si(OH)(R) 2 , —Si(R) 3 , or an optionally substituted C 1-4 aliphatic; each R 2 is independently hydrogen, deuterium, —R 6 , halogen, —CN, —NO 2 , —OR, —SR, —N(R) 2 , —Si(R) 3 , —S(O) 2 R, —S(O) 2 N(R) 2 , —S(O)R, —C(O)R, —C(O)OR, —C(O)N(R) 2 , —C(O)N(R)OR, —C(R) 2 N(R)C(O)R, —C(R) 2 N(R)C(O)N(R) 2 , —OC(O)R, —OC(O)N(R) 2 , —OP(O)R 2 , —OP(O)(OR) 2 , —OP(O)(OR)(NR 2 ), —OP(O)(NR 2 ) 2 —, —N(R)C(O)OR, —N(R)C(O)R, —N(R)C(O)N(R) 2 , —N(R)S(O) 2 R, —NP(O)R 2 , —N(R)P(O)(OR) 2 , —N(R)P(O)(OR)(NR 2 ), —N(R)P(O)(NR 2 ) 2 , or —N(R)S(O) 2 R, Ring A is selected from the group consisting of 6-membered aryl optionally substituted with one or more occurrences of halogen, and null, Ring B is a fused ring selected from 6-membered aryl, 6-membered heteroaryl containing 1-4 heteroatoms independently selected from nitrogen, oxygen, and sulfur, 5 to 7-membered saturated or partially unsaturated carbocyclyl, 5 to 7-membered saturated or partially unsaturated heterocyclyl ring with 1-3 heteroatoms independently selected from boron, nitrogen, oxygen, silicon, and sulfur, or 5-membered heteroaryl with 1-4 heteroatoms independently selected from nitrogen, oxygen and sulfur; R 3 is selected from hydrogen, halogen, —OR, —N(R) 2 , or —SR; each R 4 is independently hydrogen, —R 6 , halogen, —CN, —NO 2 , —OR, —SR, —NR 2 , —S(O) 2 R, —S(O) 2NR2, —S(O)R, —C(O)R, —C(O)OR, —C(O)NR 2 , —C(O)N(R)OR, —OC(O)R, —OC(O)NR 2 , —N(R)C(O)OR, —N(R)C(O)R, —N(R)C(O)NR 2 , or —N(R)S(O) 2 R; R 5 is hydrogen, C 1 -C 4 aliphatic, or —CN; each R 6 is independently an optionally substituted group selected from C1-6 aliphatic, phenyl, a 4-7 membered saturated or partially unsaturated heterocyclic ring having 1-2 heteroatoms independently selected from nitrogen, oxygen, and sulfur, and a 5-6 membered heteroaryl ring having 1-4 heteroatoms independently selected from nitrogen, oxygen, and sulfur; L 1 is a covalent bond or a C 1 -C 3 bivalent straight or branched saturated or unsaturated hydrocarbon chain wherein 1-2 methylene units of the chain are independently and optionally replaced with —O—, —C(O)—, —C(S)—, —C(R) 2 —, —CH(R)—, —C(F) 2 —, —N(R)—, —S—, —S(O) 2 — or —(C)═CH—; m is 0, 1, 2, 3 or 4; and each R is independently hydrogen, or an optionally substituted group selected from C1-6 aliphatic, phenyl, a 4-7 membered saturated or partially unsaturated heterocyclic having 1-2 heteroatoms independently selected from nitrogen, oxygen, and sulfur, and a 5-6 membered heteroaryl ring having 1-4 heteroatoms independently selected from nitrogen, oxygen, and sulfur, or: two R groups on the same nitrogen are optionally taken together with their intervening atoms to form a 4-7 membered saturated, partially unsaturated, or heteroaryl ring having 0-3 heteroatoms, in addition to the nitrogen, independently selected from nitrogen, oxygen, and sulfur. 2 . The compound of claim 1 , wherein ring AAA is: 3 . The compound of claim 1 or 2 , wherein ring A is: 4 . The compound of any one of claims 1-3 , wherein ring A is: 5 . The compound of claim 1 or 2 , wherein ring A is: wherein R 200 is halogen. 6 . The compound of claim 1 , wherein TBM has a structure of Formula (IIAA′): or a pharmaceutically acceptable salt thereof, wherein Q is independently at each occurrence selected from —CH— and —N— when Q is attached to only single bonds, or Q is —C═ when Q is attached to a double bond; R 1 is selected from a hydrogen, a C 1 -C 6 aliphatic, Ring 1, —C 1 -C 6 alkylene-Ring 1, and -Ring 1′-C 1 -C 6 aliphatic; wherein each of the C 1 -C 6 aliphatic, the Ring 1, the C 1 -C 6 alkylene-Ring 1, and the -Ring 1′-C 1 -C 6 aliphatic is independently optionally substituted with one or more of —F, —Cl, —Br, —I, and —OR C ; R 2A is selected from a covalent bond, a C 1 -C 12 alkylene, which C 1 -C 12 alkylene optionally comprises 1-8 heteroatoms independently selected from O, N, and S, and Ring 2A, or R 2A is —C 1 -C 12 alkylene-Ring 2A-, -Ring 2A-Z 5 -, or -(Ring 2A)-Z 5 -(Ring 2A)-, wherein when R 2A is -(Ring 2A)-Z 5 -(Ring 2A)- two Ring 2A may be the same or different; wherein each of the C 1 -C 12 alkylene and the Ring 2A is independently optionally substituted with one or more of R K ; R 3 is selected from a hydrogen and a C 1 -C 6 aliphatic, which C 1 -C 6 aliphatic optionally comprises 1-8 heteroatoms independently selected from O, N, and S, wherein the C 1 -C 6 aliphatic is optionally substituted with one or more of R K ; Z 1 is selected from a covalent bond, —O—, —NR C —, —S—, —C(O)—, —C(S)—, —CR C 2 —, —OC(O)—, —C(O)O—, —S(O)—, —S(O) 2 —, —N(R C )S(O) 2 —, —S(O) 2 N(R C )—, —N(R C )C(O)—, —C(O)N(R C )—, —OC(O)N(R C )—, and —N(R C )C(O)O—; Z 2 is selected from a covalent bond, —O—, —NR C —, —S—, —C(O)—, —C(S)—, —CR C 2 —, —OC(O)—, —C(O)O—, —S(O)—, —S(O) 2 —, —N(R C )S(O) 2 —, —S(O) 2 N(R C )—, —N(R C )C(O)—, —C(O)N(R C )—, —OC(O)N(R C )—, and —N(R C )C(O)O—; Z 3 is selected from a covalent bond, —O—, —NR C —, —S—, —C(O)—, —C(S)—, —CR C 2 —, —OC(O)—, —C(O)O—, —S(O)—, —S(O) 2 —, —N(R C )S(O) 2 —, —S(O) 2 N(R C )—, —N(R C )C(O)—, —C(O)N(R C )—, —OC(O)N(R C )—, and —N(R C )C(O)O—; Z 4 is selected from a covalent bond, —O—, —NR C —, —S—, —C(O)—, —C(S)—, —CR C 2 —, —OC(O)—, —C(O)O—, —S(O)—, —S(O) 2 —, —N(R C )S(O) 2 —, —S(O) 2 N(R C )—, —N(R C )C(O)—, —C(O)N(R C )—, —OC(O)N(R C )—, and —N(R C )C(O)O—; Z 5 is selected from a covalent bond, —O—, —NR C —, —S—, —C(O)—, —C(S)—, —CR C 2 —, —OC(O)—, —C(O)O—, —S(O)—, —S(O) 2 —, —N(R C )S(O) 2 —, —S(O) 2 N(R C )—, —N(R C )C(O)—, —C(O)N(R C )—, —OC(O)N(R C )—, and —N(R C )C(O)O—; Ring 1 is an optionally substituted ring selected from phenyl, a 3

Assignees

Inventors

Classifications

  • containing three or more hetero rings · CPC title

  • not condensed and containing further heterocyclic rings · CPC title

  • ortho- or peri-condensed with heterocyclic ring systems · CPC title

  • Spiro-condensed systems · CPC title

  • Immunosuppressants, e.g. drugs for graft rejection · CPC title

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What does patent US2025051338A1 cover?
The present invention provides compounds, compositions thereof, and methods of using the same. Compounds and compositions thereof that are useful, for example, for targeting, inhibiting, and/or degrading TYK2. In certain embodiments, provided are TYK2 inhibitors and/or degraders and methods of making same. More specifically, TYK2 degraders, compositions which comprise TYK2 degraders, and method…
Who is the assignee on this patent?
Kymera Therapeutics Inc
What technology area does this patent fall under?
Primary CPC classification C07D487/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Feb 13 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).