Furnace and manufacturing apparatus for glass particle deposit including the same

US2025050302A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025050302-A1
Application numberUS-202218721982-A
CountryUS
Kind codeA1
Filing dateDec 21, 2022
Priority dateDec 22, 2021
Publication dateFeb 13, 2025
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present disclosure relates to a furnace for manufacturing a glass particle deposit by depositing glass particles generated from a glass raw material. The furnace includes two or more portions that are not fixed to each other in an upper-lower direction which is an axial direction of the glass particle deposit. The two or more portions include a first portion and a second portion which are independently formed, and the two or more portions have a structure in which the first portion and the second portion do not interfere with each other when the first portion is deformed by thermal expansion.

First claim

Opening claim text (preview).

What is claimed is: 1 . A furnace for manufacturing a glass particle deposit by depositing glass particles generated from a glass raw material, the furnace comprising: two or more portions that are not fixed to each other in an upper-lower direction which is an axial direction of the glass particle deposit, wherein the two or more portions comprise a first portion and a second portion which are independently formed, and the the two or more portions have a structure in which the first portion and the second portion do not interfere with each other when the first portion is deformed by thermal expansion. 2 . The furnace according to claim 1 , wherein the two or more portions comprise a furnace upper portion, a furnace middle portion located below the furnace upper portion, and a furnace lower portion located below the furnace middle portion, wherein the furnace middle portion is the first portion and has an upper end opening and a lower end opening in the upper-lower direction, wherein the furnace upper portion is the second portion and covers the upper end opening of the furnace middle portion so as to have a gap with an upper end of the furnace middle portion in the upper-lower direction, and wherein the furnace lower portion covers the lower end opening of the furnace middle portion and supports the furnace middle portion. 3 . The furnace according to claim 2 , wherein the gap is 3 mm or more. 4 . The furnace according to claim 2 , wherein a distance between portions of the furnace upper portion and the furnace middle portion facing each other in a left-right direction perpendicular to the upper-lower direction is 1 mm or less. 5 . The furnace according to claim 1 , wherein the glass raw material is silicon tetrachloride. 6 . A manufacturing apparatus for a glass particle deposit, the manufacturing apparatus comprising: the furnace according to claim 1 .

Assignees

Inventors

Classifications

  • Deposition reactors therefor · CPC title

  • Controlling the temperature of the process · CPC title

  • by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane · CPC title

  • B01J19/24Primary

    Stationary reactors without moving elements inside (B01J19/08, B01J19/26 take precedence; with stationary particles B01J8/02) · CPC title

  • by means of a burner · CPC title

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What does patent US2025050302A1 cover?
The present disclosure relates to a furnace for manufacturing a glass particle deposit by depositing glass particles generated from a glass raw material. The furnace includes two or more portions that are not fixed to each other in an upper-lower direction which is an axial direction of the glass particle deposit. The two or more portions include a first portion and a second portion which are i…
Who is the assignee on this patent?
Sumitomo Electric Industries
What technology area does this patent fall under?
Primary CPC classification B01J19/24. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Feb 13 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).