Semiconductor die, semiconductor package and substrate dicing method
US-2024421000-A1 · Dec 19, 2024 · US
US2025038131A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2025038131-A1 |
| Application number | US-202418915005-A |
| Country | US |
| Kind code | A1 |
| Filing date | Oct 14, 2024 |
| Priority date | Sep 13, 2021 |
| Publication date | Jan 30, 2025 |
| Grant date | — |
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In certain aspects, a three-dimensional (3D) memory device includes a stack structure including a core region and a staircase region, a channel structure extending through the stack structure in the core region, and a first support structure extending through the stack structure in the staircase region. The first support structure includes a first portion extending along a first direction and a second portion protruding from the first portion along a second direction perpendicular to the first direction. The first support structure is located between two blocks of the 3D memory device.
Opening claim text (preview).
What is claimed is: 1 . A three-dimensional (3D) memory device, comprising: a stack structure comprising a core region and a staircase region; a channel structure extending through the stack structure in the core region; and a first support structure extending through the stack structure in the staircase region, wherein the first support structure comprises a first portion extending along a first direction and a second portion protruding from the first portion along a second direction perpendicular to the first direction; and the first support structure is located between two blocks of the 3D memory device. 2 . The 3D memory device of claim 1 , further comprising a second support structure, wherein the second support structure comprises a set of block shape support structures arranged in a two-dimensional array. 3 . The 3D memory device of claim 2 , wherein the second support structure is located within a same memory block. 4 . The 3D memory device of claim 2 , wherein a cross-section of at least one of the block shape support structures in a plane parallel to the first and second directions includes one of a square shape, a rectangular shape, a pentagon shape, a hexagon shape, a diamond shape and an L-shape. 5 . The 3D memory device of claim 1 , wherein the second portion of the first support structure comprises a plurality of curved portions protruding from two opposite sides of the first portion of the first support structure. 6 . The 3D memory device of claim 5 , wherein the plurality of curved portions are aligned along the two opposite sides of the first portion of the first support structure pair-by-pair. 7 . The 3D memory device of claim 5 , wherein adjacent two curved portions have a same distance therebetween along the first direction. 8 . The 3D memory device of claim 5 , wherein a radius of a curved portion is between ¼ of a width of the first portion in the second direction and two times of the width of the first portion in the second direction. 9 . The 3D memory device of claim 5 , wherein a distance between edges of adjacent two curved portions is between ⅙ of a width of the first portion in the second direction and three times of the width of the first portion in the second direction. 10 . The 3D memory device of claim 5 , wherein each of the curved portions has a same shape. 11 . The 3D memory device of claim 5 , wherein each of the curved portions has a shape of a partial of a circle. 12 . The 3D memory device of claim 5 , wherein each of the curved portions has a shape of a partial of an ellipse. 13 . The 3D memory device of claim 1 , further comprises a plurality of gate line slits intermittently extending along the first direction, wherein the plurality of gate line slits are located in a same memory block of the 3D memory device. 14 . A three-dimensional (3D) memory device, comprising: a stack structure comprising a core region and a staircase region; a channel structure extending through the stack structure in the core region; and a first support structure extending through the stack structure in the staircase region, wherein the first support structure comprises a first portion extending along a first direction and a second portion protruding from the first portion along a second direction perpendicular to the first direction; and a plurality of seams are disposed inside or on a surface of the first support structure along the first direction. 15 . The 3D memory device of claim 14 , wherein the first support structure is located between two blocks of the 3D memory device. 16 . A method for forming a three-dimensional (3D) memory device, comprising: forming a stack structure, the stack structure comprising a core region and a staircase region; forming a channel structure extending through the stack structure in the core region; and forming a first support structure extending through the stack structure in the staircase region, wherein the first support structure comprises a first portion extending along a first direction and a second portion protruding from the first portion along a second direction perpendicular to the first direction, and a plurality of seams are disposed inside or on a surface of the first support structure along the first direction. 17 . The method of claim 16 , wherein forming the first support structure further comprises: forming a trench through the stack structure in the staircase region, wherein the trench comprises a plurality of curved portions protruding from two opposite sides of a slit; and filling in the trench with an insulation material to form the first support structure. 18 . The method of claim 17 , wherein each of the curved portions has a shape of a partial of a circle, or each of the curved portions has a shape of a partial of an ellipse. 19 . The method of claim 17 , wherein the trench is etched in places of the stack structure between adjacent two blocks of the 3D memory device. 20 . The method of claim 16 , further comprising: forming a second support structure, wherein the second support structure comprises a set of block shape support structures arranged in a two-dimensional array.
Cross-sectional shapes or dispositions of interconnections · CPC title
Vias, e.g. via plugs · CPC title
protecting against mechanical damage (H10W76/00, H10W74/00 take precedence) · CPC title
the channels comprising vertical portions, e.g. U-shaped channels · CPC title
the channels comprising vertical portions, e.g. U-shaped channels · CPC title
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