Method of forming graphene films

Patent metadata

Field	Value
Publication number	US-2024417263-A1
Application number	US-202218702777-A
Country	US
Kind code	A1
Filing date	Oct 18, 2022
Priority date	Oct 18, 2021
Publication date	Dec 19, 2024
Grant date	—

Abstract

Methods for formation of graphene films, graphene films made thereby, and applications thereof. A method for the formation of a graphene film includes coating a polymeric graphene precursor on a substrate. The method includes irradiating the polymeric graphene precursor coated on the substrate with a pulsed high intensity light source emitting at more than a single wavelength and with a pulse duration of less than one second, to convert the polymeric graphene precursor to the graphene film.

First claim

What is claimed is:

1 . A method for the formation of a graphene film, the method comprising:
coating a polymeric graphene precursor on a substrate; and irradiating the polymeric graphene precursor coated on the substrate with a pulsed high intensity light source emitting at more than a single wavelength and with a pulse duration of less than one second, to convert the polymeric graphene precursor to the graphene film.

2 . The method of claim 1 , wherein a composition of the polymeric graphene precursor is different than a composition of the substrate.

3 . The method of claim 1 , wherein the light source comprises emission wavelengths that are in the range of 100 nm to 2000 nm.

4 . The method of claim 1 , wherein the pulse duration is 200 to 900 milliseconds, the light source has an intensity of 100 V to 2000 V, the light source has a pulse frequency of 0.1 Hz to 10 Hz, the light source has an energy density per pulse of 0.1 J/cm 2 to 100 J/cm 2 , and the light source has a total areal density of 10 J/cm 2 to 1000 J/cm 2 .

5 . The method of claim 1 , wherein coating the polymeric graphene precursor on the substrate comprises printing, offset printing, ink jet printing, transfer printing, aerosol jet printing, microcontact printing, embossing, nanoimprint lithography, optical lithography lithography, electron beam lithography, ion beam lithography, or a combination thereof.

6 . The method of claim 1 , wherein the polymeric graphene precursor on the substrate comprises a patterned polymeric graphene precursor.

7 . The method of claim 1 , wherein the polymeric graphene precursor comprises a polymer that comprises a disubstituted benzene, a benzene substituted with one or more chromophores, polycyclic aromatic rings, aniline, nitroaniline, nitrophenol, biphenyl, nitrobenzene, benzaldehyde, acetophenone, pyrene, pentacene, anthracene, tetracene, or a combination thereof.

8 . The method of claim 1 , wherein the polymeric graphene precursor comprises a polymer chosen from resol, an oligomer of pyrene pitch, cyclized polyacrylonitrile, carbon fiber, polyaniline, a thermosetting resin network formed from blending and crosslinking polybenzoxazines with an epoxy, poly(3-phenyl-2,4-dihydro-1,3-benzoxazine), poly(phenyl benzoxazine), poly(3-furanyl-2,4-dihydro-1,3-benzoxazine), poly(furanyl benzoxazine), poly(phenol-co-formaldehyde), resol, oligomers of pyrene pitch, a thermosetting resin network formed from blending and crosslinking polybenzoxazines with bis-phenol-A furfuryl diglycidyl ether, and combinations thereof.

9 . The method of claim 1 , wherein an absorption band of the polymeric graphene precursor overlaps with an emission band of the pulsed light source, wherein the polymeric graphene precursor has an absorption band in the range of 400 nm to 600 nm.

10 . The method of claim 1 , wherein the substrate comprises plastic, metal, fabric, textile fabric, or a combination thereof.

11 . The method of claim 1 , wherein the substrate comprises a carbon fiber, carbon mesh, carbon fabric, carbon composite, graphene composite, graphene, a carbon film, or a combination thereof.

12 . The method of claim 1 , wherein the light source comprises a xenon flash lamp.

13 . The method of claim 1 , wherein the irradiating comprises irradiating the polymeric graphene precursor coated on the substrate in air and at room temperature.

14 . The method of claim 1 , wherein the irradiating comprises irradiating and/or maintaining the polymeric graphene precursor at a temperature that is less than 100° C.

15 . The method of claim 1 , wherein the polymeric graphene precursor comprises polyaniline.

16 . The method of claim 1 , wherein the graphene film has a conductivity of at least 150 S/m.

17 . The method of claim 1 , wherein the graphene film has:
a ratio of less than 1.0 between a characteristic disorder band (D-band) with a peak near 1350 cm −1 and a characteristic graphitic band (G band) with a peak near 1582 cm −1 , as determined by Raman spectroscopy, a ratio of less than 1 between a characteristic 2Dband with a peak near 2700 cm −1 and a characteristic graphitic band (G band) with a peak near 1582 cm −1 that is fittable with a single Lorentzian function, as determined by Raman spectroscopy, or a combination thereof.

18 . A method for the formation of a graphene film, the method comprising:
coating a polymeric graphene precursor on a substrate that comprises a carbon fiber, carbon mesh, carbon fabric, carbon composite, graphene composite, graphene, a carbon film, or a combination thereof, wherein the polymeric graphene precursor and the substrate have different chemical compositions; and irradiating the polymeric precursor coated on the substrate with a pulsed high intensity light source emitting at more than a single wavelength and with a pulse duration of less than one second, to convert the polymeric graphene precursor to the graphene film.

19 . A graphene film formed by the method of claim 1 .

20 . An electrochemical energy storage device, an electromagnetic shielding material, a chemical or biological sensor, a post-CMOS nanoelectronic device, a heat shielding material, a structural composite, a filter, or a combination thereof, comprising a graphene film formed by the method of claim 1 .

Assignees

• Univ Massachusetts

Inventors

• Watkins James J
• Okoroanyanwu Uzodinma
• Bhardwaj Ayush

Classifications

• H05K9/0088

  comprising a plurality of shielding layers; combining different shielding material structure · CPC title

• H01G11/32

  Carbon-based · CPC title

• C01P2006/40

  Electric properties · CPC title

• C01P2002/82

  by IR- or Raman-data · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title