Configuring optical layers in imprint lithography processes

US2024329540A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2024329540-A1
Application numberUS-202418734904-A
CountryUS
Kind codeA1
Filing dateJun 5, 2024
Priority dateOct 20, 2017
Publication dateOct 3, 2024
Grant date

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Abstract

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An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

First claim

Opening claim text (preview).

1 . (canceled) 2 . A method of producing an optical layer, the method comprising: providing a substrate having a first side and a second side opposite the first side; disposing a first layer on the first side of the substrate, wherein disposing the first layer on the first side of the substrate comprises imprinting a nanolayer on the first side of the substrate, the nanolayer being structured to be an anti-reflection layer and having an effective refractive index different from a refractive index of the substrate; disposing a second layer on the second side of the substrate, wherein disposing the second layer on the second side of the substrate comprises imprinting a functional pattern on the second side of the substrate, a structure of the functional pattern being different from the nanolayer; and refraining from disposing any anti-reflective nanolayers on the second side of the substrate. 3 . The method of claim 2 , wherein imprinting the nanolayer on the first side of the substrate comprises imprinting the nanolayer directly on the first side of the substrate. 4 . The method of claim 2 , further comprising: refraining from disposing a film coating on the first side of the substrate. 5 . The method of claim 2 , wherein imprinting the nanolayer on the first side of the substrate comprises forming a plurality of nanoimprint gratings on the first side of the substrate, and wherein imprinting the functional pattern on the second side of the substrate comprises forming a plurality of diffraction gratings on the second side of the substrate. 6 . The method of claim 5 , wherein the plurality of nanoimprint gratings are formed such that the plurality of nanoimprint gratings extend in a first direction along the first side of the substrate, and wherein the plurality of diffraction gratings are formed such that the plurality of diffraction gratings extend in the first direction along the second side of the substrate. 7 . The method of claim 5 , wherein the plurality of nanoimprint gratings are formed such that the plurality of nanoimprint gratings extend in a first direction along the first side of the substrate, wherein the plurality of diffraction gratings are formed such that the plurality of diffraction gratings extend in a second direction along the second side of the substrate, and wherein the first direction is orthogonal to the second direction. 8 . A method of producing an optical system, the method comprising: producing a plurality of optical layers, wherein producing each of the optical layers comprises: providing a substrate having a first side and a second side opposite the first side, disposing a first layer on the first side of the substrate, wherein disposing the first layer on the first side of the substrate comprises imprinting a nanolayer on the first side of the substrate, the nanolayer being structured to be an anti-reflection layer and having an effective refractive index different from a refractive index of the substrate, disposing a second layer on the second side of the substrate, wherein disposing the second layer on the second side of the substrate comprises imprinting a functional pattern on the second side of the substrate, a structure of the functional pattern being different from the nanolayer, and refraining from disposing any anti-reflective nanolayers on the second side of the substrate; and arranging the plurality of optical layers in a stack. 9 . The method of claim 8 , further comprising: configuring each of the optical layers to receive light from a light source and project at least a portion of the received light to an eye of a user of the optical system. 10 . The method of claim 8 , further comprising: configuring each of the optical layers to receive ambient light and transmit at least a portion of the received ambient light to the eye of the user. 11 . The method of claim 8 , wherein producing the plurality of optical layers comprises producing at least six of the optical layers. 12 . The method of claim 11 , wherein producing the plurality of optical layers comprises producing a first optical layer and a second optical layer corresponding to a first color, producing a third optical layer and a fourth optical layer corresponding to a second color different from the first color, and producing a fifth optical layer and a sixth optical layer corresponding to a third color different from the first color and the second color. 13 . The method of claim 12 , wherein arranging the plurality of optical layers in the stack comprises arranging the first, second, third, fourth, fifth, and sixth optical layers sequentially in the stack. 14 . The method of claim 13 , wherein each of the first color, the second color, and the third color is selected from a group consisting of red, green, and blue.

Assignees

Inventors

Classifications

  • G02B1/118Primary

    having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures · CPC title

  • G03F7/0002Primary

    Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

  • G03F7/7015Primary

    Details of optical elements · CPC title

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What does patent US2024329540A1 cover?
An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed b…
Who is the assignee on this patent?
Magic Leap Inc
What technology area does this patent fall under?
Primary CPC classification G02B1/118. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Oct 03 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).