Impurity recovery device and impurity recovery method

Patent metadata

Field	Value
Publication number	US-2024307929-A1
Application number	US-202318465490-A
Country	US
Kind code	A1
Filing date	Sep 12, 2023
Priority date	Mar 13, 2023
Publication date	Sep 19, 2024
Grant date	—

Abstract

An impurity recovery device according to the present embodiment may recover impurities present on a surface of a substrate. The substrate may be placed on a stage. A sprayer may spray a recovery liquid toward the substrate along a direction from a side of a central part of the substrate to a side of the end part of the substrate. A recovery portion may recover the recovery liquid from the end part of the substrate.

First claim

1 . An impurity recovery device for recovering impurities present on a surface of a substrate, comprising:
a stage on which the substrate is placed; a sprayer configured to spray a recovery liquid toward the substrate along a direction from a side of a central part of the substrate to a side of the end part of the substrate; and a recovery portion configured to recover the recovery liquid from the end part of the substrate.

2 . The device of claim 1 , wherein the sprayer sprays the recovery liquid and dry gas mixed together to the substrate.

3 . The device of claim 2 , wherein an outlet of the sprayer sprays the recovery liquid and the dry gas in a direction of inclination that is substantially the same as a direction of inclination of the end part of the substrate.

4 . The device of claim 1 , wherein the recovery liquid is any of hydrochloric acid (HCl), hydrofluoric acid (HF), nitric acid (HNO 3 ), and hydrogen peroxide solution (H 2 O 2 ).

5 . The device of claim 1 , wherein the recovery portion is formed by a porous material or a fiber material.

6 . The device of claim 1 , wherein the recovery portion is apart from the substrate when recovering the recovery liquid.

7 . The device of claim 6 , wherein the recovery portion is arranged at a fixed position with respect to the sprayer and does not rotate even when the substrate rotates in a circumferential direction.

8 . The device of claim 1 , wherein the recovery portion rotates to follow rotation in the circumferential direction of the substrate while being in contact with the end part of the substrate, when recovering the recovery liquid.

9 . The device of claim 8 , wherein the recovery portion moves along a direction of a rotation axis of the recovery portion while rotating to follow the rotation in the circumferential direction of the substrate.

10 . The device of claim 1 , further comprising:
an extractor configured to accommodate the recovery liquid and extract the impurities contained in the recovery portion into the recovery liquid by allowing the recovery portion to be inserted thereinto; a cleaning portion configured to accommodate a cleaning solution and clean the recovery portion by allowing the recovery portion to be inserted thereinto; a dryer configured to blow gas to the recovery portion inserted thereinto to dry the recovery portion; and a driving mechanism configured to move and insert the recovery portion into the extractor, the cleaning portion, and the dryer in that order.

11 . An impurity recovery method for recovering impurities present on a surface of a substrate by using an impurity recovering device including a stage on which the substrate is placed, a sprayer that sprays a recovery liquid to the substrate, and a recovery portion that recovers the recovery liquid from the substrate, the method comprising:
spraying the recovery liquid toward the substrate along a direction from a side of a central part of the substrate to a side of the end part of the substrate; and recovering the recovery liquid from the end part of the substrate.

12 . The method of claim 11 , wherein, in the spraying of the recovery liquid, the recovery liquid and dry gas mixed together are blown to the substrate.

13 . The method of claim 12 , wherein, in the spraying of the recovery liquid, the recovery liquid and the dry gas are blown toward an angle that is substantially the same as inclination of the end part of the substrate.

14 . The method of claim 11 , wherein the recovery liquid is any of hydrochloric acid (HCl), hydrofluoric acid (HF), nitric acid (HNO 3 ), and hydrogen peroxide solution (H 2 O 2 ).

15 . The method of claim 11 , wherein the recovery portion is apart from the substrate when recovering the recovery liquid.

16 . The method of claim 11 , wherein the recovery portion rotates to follow rotation in the circumferential direction of the substrate while being in contact with the end part of the substrate, when recovering the recovery liquid.

17 . The method of claim 16 , wherein the recovery portion moves along a direction of a rotation axis of the recovery portion while rotating to follow the rotation in the circumferential direction of the substrate.

18 . The method of claim 11 , wherein the impurity recovery device further includes a recovery-portion moving mechanism configured to move the recovery portion, and wherein the method further comprises:
extracting the impurities contained in the recovery portion into the recovery liquid by inserting the recovery portion into an extractor that accommodates the recovery liquid; cleaning the recovery portion by inserting the recovery portion into a cleaning portion that accommodates a cleaning solution; and drying the recovery portion by blowing gas to the recovery portion inserted into a dryer.

Assignees

• Kioxia Corp

Inventors

• Wu Jiahong

Classifications

• B08B1/50

  involving cleaning of the cleaning members · CPC title

• B08B1/32

  using rotary cleaning members · CPC title

• B08B3/14 Primary

  Removing waste, e.g. labels, from cleaning liquid · CPC title

• B08B3/02 Primary

  Cleaning by the force of jets or sprays · CPC title