Powder, article, and method of manufacturing article

US2024293865A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2024293865-A1
Application numberUS-202418582863-A
CountryUS
Kind codeA1
Filing dateFeb 21, 2024
Priority dateMar 3, 2023
Publication dateSep 5, 2024
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Provided is a powder for shaping through irradiation with an energy beam, the powder including: a sublimable substance; and a sublimation suppression material, wherein the sublimation suppression material is an inorganic compound, and wherein particles of the sublimation suppression material adhere to part of surfaces of particles of the sublimable substance.

First claim

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What is claimed is: 1 . A powder for shaping through irradiation with an energy beam, the powder comprising: a sublimable substance; and a sublimation suppression material, wherein the sublimation suppression material is an inorganic compound, and wherein particles of the sublimation suppression material adhere to part of surfaces of particles of the sublimable substance. 2 . The powder according to claim 1 , wherein the particles of the sublimation suppression material adhere to 5% or more and 95% or less of the surfaces of the particles of the sublimable substance. 3 . The powder according to claim 1 , wherein a particle diameter of each of the particles of the sublimation suppression material is 1/10 or less of a particle diameter of each of the particles of the sublimable substance. 4 . The powder according to claim 1 , wherein an average particle diameter of the particles of the sublimation suppression material is 10 nm or more and 300 nm or less. 5 . The powder according to claim 1 , wherein an average particle diameter of the particles of the sublimable substance is 5 μm or more and 50 μm or less. 6 . The powder according to claim 1 , wherein, when a sublimation point of the sublimable substance is represented by Ts, one of a boiling point or a sublimation point of the sublimation suppression material is Ts/2 or more. 7 . The powder according to claim 1 , wherein the sublimation suppression material is one of an inorganic oxide, an inorganic nitride, or an inorganic carbide. 8 . The powder according to claim 1 , wherein the sublimation suppression material is at least one kind selected from SiO 2 , Al 2 O 3 , ZrO 2 , Y 2 O 3 , and MgO. 9 . The powder according to claim 1 , wherein a ratio of the sublimable substance is 98.5 mol % or more and 99.9 mol % or less, and a ratio of the sublimation suppression material is 0.1 mol % or more and 1.5 mol % or less, with respect to a total of the sublimable substance and the sublimation suppression material. 10 . The powder according to claim 1 , wherein the powder has a particle diameter distribution in which a plurality of peaks each having a frequency of 3% or more are present in a range of a particle diameter of from 0.5 μm to 200.0 μm. 11 . The powder according to claim 10 , wherein, when a first particle diameter of particles with a first peak of the plurality of peaks is represented by D(A) μm and a second particle diameter of particles with a second peak of the plurality of peaks is represented by D(B) μm, the powder satisfying the following formula (1): 0 . 1 ≤ D ⁡ ( B ) / D ⁡ ( A ) ≤ 0.8 ( 1 ) 12 . The powder according to claim 10 , wherein, when a first particle diameter of particles with a first peak of the plurality of peaks is represented by D(A) μm, a second particle diameter of particles with a second peak of the plurality of peaks is represented by D(B) μm, and D(A) is larger than D(B), and wherein, when an integrated frequency ratio of the particles having a larger particle diameter than a particle diameter V between D(A) and D(B) is represented by F(A) and an integrated frequency ratio of the particles having a smaller particle diameter than the particle diameter V is represented by F(B), F(A) is larger than F(B). 13 . The powder according to claim 12 , wherein the integrated frequency ratio F(A) is 60% or more and 95% or less. 14 . The powder according to claim 1 , further comprising a eutectic formation material for forming a eutectic with the sublimable substance. 15 . The powder according to claim 14 , wherein a ratio “x” [mol %] of the eutectic formation material with respect to a total of the eutectic formation material and the sublimable substance satisfies one of the following formula (2) or (3): Xe / 4 ≤ x < 3 ⁢ Xe / 4 ( 2 ) ( 3 ⁢ Xe + 100 ) / 4 < x ≤ ( Xe + 300 ) / 4 ( 3 ) in each of the formulae (2) and (3), Xe [mol %] represents a ratio of the eutectic formation material in a eutectic composition of the sublimable substance and the eutectic formation material. 16 . The powder according to claim 14 , wherein the sublimable substance is silicon carbide. 17 . The powder according to claim 14 , wherein the eutectic formation material is a metal boride. 18 . The powder according to claim 14 , wherein the eutectic formation material is at least one kind selected from HfB 2 , ZrB 2 , TiB 2 , TaB 2 , NbB 2 , CrB 2 , CrB, VB 2 , LaB 6 , B 4 C, W 2 B 5 , and WB 2 . 19 . The powder according to claim 14 , wherein particles of the eutectic formation material are different from the particles of the sublimable substance. 20 . The powder according to claim 14 , wherein a particle diameter of each of particles of the eutectic formation material is smaller than a particle diameter of eac

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What does patent US2024293865A1 cover?
Provided is a powder for shaping through irradiation with an energy beam, the powder including: a sublimable substance; and a sublimation suppression material, wherein the sublimation suppression material is an inorganic compound, and wherein particles of the sublimation suppression material adhere to part of surfaces of particles of the sublimable substance.
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification B22F10/25. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Sep 05 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).