Integrated circuit with electrostatic discharge protection
US-2024395801-A1 · Nov 28, 2024 · US
US2024290773A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2024290773-A1 |
| Application number | US-202418439886-A |
| Country | US |
| Kind code | A1 |
| Filing date | Feb 13, 2024 |
| Priority date | Aug 19, 2021 |
| Publication date | Aug 29, 2024 |
| Grant date | — |
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A transient voltage absorption element is provided that includes a first path and a second path, the first path is a current path in which a surge current flows, and the second path is a current path in a frequency band of a signal that propagates through the signal line. The first path includes a series circuit including a diode including a depletion layer capacitance, a first inductor, and a first resistance component, and the second path includes a series circuit including a capacitance, a second inductor, and a second resistance component. A resistance value of the first resistance component is higher than a resistance value of the second resistance component.
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1 . A transient voltage absorption element configured to be connected in shunt between a signal line and a reference potential, the transient voltage absorption element comprising: a first path connected in shunt between the signal line and the reference potential, the first path being a current path in which a surge current flows and comprising a series circuit including a diode having a depletion layer capacitance, a first inductor component, and a first resistance component; and a second path connected in shunt between the signal line and the reference potential, the second path being a current path in a frequency band of a signal that propagates through the signal line and comprising a series circuit including a capacitance, a second inductor component, and a second resistance component; wherein the capacitance is generated between wirings that are electrically connected to the diode, and wherein the first resistance component has a resistance value that is higher than a resistance value of the second resistance component. 2 . The transient voltage absorption element according to claim 1 , further comprising: a semiconductor substrate; and an epitaxial layer on a surface of the semiconductor substrate and including a p+ region and an n+ region in a direction along a plane of the semiconductor substrate. 3 . The transient voltage absorption element according to claim 2 , wherein the diode is configured by the epitaxial layer, the p+ region, and the n+ region. 4 . The transient voltage absorption element according to claim 3 , further comprising a layer having a same concentration as the epitaxial layer that is between an end portion of the p+ region and an end portion of the n+ region that faces the end portion of the p+ region at a distance between the p+ region and the n+ region in the direction along the plane of the semiconductor substrate. 5 . The transient voltage absorption element according to claim 3 , further comprising an insulation portion configured to cause a current to detour, the current flowing through the epitaxial layer between the p+ region and the n+ region. 6 . The transient voltage absorption element according to claim 3 , further comprising a high resistance portion configured to cause a current to detour, the current flowing through the epitaxial layer between the p+ region and the n+ region. 7 . The transient voltage absorption element according to claim 6 , wherein the high resistance portion is disposed from the epitaxial layer to the semiconductor substrate. 8 . The transient voltage absorption element according to claim 2 , further comprising a wiring layer in an upper portion of the p+ region and that is electrically connected to the p+ region. 9 . The transient voltage absorption element according to claim 8 , wherein: the diode is configured by the epitaxial layer, the p+ region, and the n+ region, and the wiring layer includes a non-covered region that does not cover a portion of the p+ region. 10 . The transient voltage absorption element according to claim 2 , further comprising a wiring layer in an upper portion of the n+ region and is electrically connected to the n+ region. 11 . The transient voltage absorption element according to claim 10 , wherein: the diode is configured by the epitaxial layer, the p+ region, and the n+ region, and the wiring layer includes a non-covered region that does not cover a portion of the n+ region. 12 . The transient voltage absorption element according to claim 2 , further comprising: an insulating layer on a surface of the epitaxial layer; and a trench contacting the insulating layer and provided over the epitaxial layer and a portion of the semiconductor substrate. 13 . A transient voltage absorption element comprising: a first path connected in shunt between a signal line and a reference potential, the first path comprising a series circuit including a diode having a depletion layer capacitance, a first inductor component, and a first resistance component; and a second path connected in shunt between the signal line and the reference potential, the second path comprising a series circuit including a capacitance, a second inductor component, and a second resistance component; wherein the capacitance is generated between wirings that are electrically connected to the diode, and wherein the first resistance component has a resistance value that is higher than a resistance value of the second resistance component. 14 . The transient voltage absorption element according to claim 13 , wherein the first path is a current path in which a surge current flows and the second path is a current path in a frequency band of a signal that propagates through the signal line. 15 . The transient voltage absorption element according to claim 13 , further comprising: a semiconductor substrate; and an epitaxial layer on a surface of the semiconductor substrate and including a p+ region and an n+ region in a direction along a plane of the semiconductor substrate. 16 . The transient voltage absorption element according to claim 15 , wherein the diode is configured by the epitaxial layer, the p+ region, and the n+ region. 17 . The transient voltage absorption element according to claim 16 , further comprising: a layer having a same concentration as the epitaxial layer that is between an end portion of the p+ region and an end portion of the n+ region that faces the end portion of the p+ region at a distance between the p+ region and the n+ region in the direction along the plane of the semiconductor substrate; and an insulation portion configured to cause a current to detour, the current flowing through the epitaxial layer between the p+ region and the n+ region. 18 . The transient voltage absorption element according to claim 15 , further comprising: a wiring layer in an upper portion of the p+ region and that is electrically connected to the p+ region, wherein: the diode is configured by the epitaxial layer, the p+ region, and the n+ region, and the wiring layer includes a non-covered region that does not cover a portion of the p+ region. 19 . The transient voltage absorption element according to claim 15 , further comprising: a wiring layer in an upper portion of the n+ region and is electrically connected to the n+ region, wherein: the diode is configured by the epitaxial layer, the p+ region, and the n+ region, and the wiring layer includes a non-covered region that does not cover a portion of the n+ region. 20 . The transient voltage absorption element according to claim 15 , further comprising: an insulating layer on a surface of the epitaxial layer; and a trench contacting the insulating layer and provided over the epitaxial layer and a portion of the semiconductor substrate.
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