Transient voltage absorption element

US2024290773A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2024290773-A1
Application numberUS-202418439886-A
CountryUS
Kind codeA1
Filing dateFeb 13, 2024
Priority dateAug 19, 2021
Publication dateAug 29, 2024
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A transient voltage absorption element is provided that includes a first path and a second path, the first path is a current path in which a surge current flows, and the second path is a current path in a frequency band of a signal that propagates through the signal line. The first path includes a series circuit including a diode including a depletion layer capacitance, a first inductor, and a first resistance component, and the second path includes a series circuit including a capacitance, a second inductor, and a second resistance component. A resistance value of the first resistance component is higher than a resistance value of the second resistance component.

First claim

Opening claim text (preview).

1 . A transient voltage absorption element configured to be connected in shunt between a signal line and a reference potential, the transient voltage absorption element comprising: a first path connected in shunt between the signal line and the reference potential, the first path being a current path in which a surge current flows and comprising a series circuit including a diode having a depletion layer capacitance, a first inductor component, and a first resistance component; and a second path connected in shunt between the signal line and the reference potential, the second path being a current path in a frequency band of a signal that propagates through the signal line and comprising a series circuit including a capacitance, a second inductor component, and a second resistance component; wherein the capacitance is generated between wirings that are electrically connected to the diode, and wherein the first resistance component has a resistance value that is higher than a resistance value of the second resistance component. 2 . The transient voltage absorption element according to claim 1 , further comprising: a semiconductor substrate; and an epitaxial layer on a surface of the semiconductor substrate and including a p+ region and an n+ region in a direction along a plane of the semiconductor substrate. 3 . The transient voltage absorption element according to claim 2 , wherein the diode is configured by the epitaxial layer, the p+ region, and the n+ region. 4 . The transient voltage absorption element according to claim 3 , further comprising a layer having a same concentration as the epitaxial layer that is between an end portion of the p+ region and an end portion of the n+ region that faces the end portion of the p+ region at a distance between the p+ region and the n+ region in the direction along the plane of the semiconductor substrate. 5 . The transient voltage absorption element according to claim 3 , further comprising an insulation portion configured to cause a current to detour, the current flowing through the epitaxial layer between the p+ region and the n+ region. 6 . The transient voltage absorption element according to claim 3 , further comprising a high resistance portion configured to cause a current to detour, the current flowing through the epitaxial layer between the p+ region and the n+ region. 7 . The transient voltage absorption element according to claim 6 , wherein the high resistance portion is disposed from the epitaxial layer to the semiconductor substrate. 8 . The transient voltage absorption element according to claim 2 , further comprising a wiring layer in an upper portion of the p+ region and that is electrically connected to the p+ region. 9 . The transient voltage absorption element according to claim 8 , wherein: the diode is configured by the epitaxial layer, the p+ region, and the n+ region, and the wiring layer includes a non-covered region that does not cover a portion of the p+ region. 10 . The transient voltage absorption element according to claim 2 , further comprising a wiring layer in an upper portion of the n+ region and is electrically connected to the n+ region. 11 . The transient voltage absorption element according to claim 10 , wherein: the diode is configured by the epitaxial layer, the p+ region, and the n+ region, and the wiring layer includes a non-covered region that does not cover a portion of the n+ region. 12 . The transient voltage absorption element according to claim 2 , further comprising: an insulating layer on a surface of the epitaxial layer; and a trench contacting the insulating layer and provided over the epitaxial layer and a portion of the semiconductor substrate. 13 . A transient voltage absorption element comprising: a first path connected in shunt between a signal line and a reference potential, the first path comprising a series circuit including a diode having a depletion layer capacitance, a first inductor component, and a first resistance component; and a second path connected in shunt between the signal line and the reference potential, the second path comprising a series circuit including a capacitance, a second inductor component, and a second resistance component; wherein the capacitance is generated between wirings that are electrically connected to the diode, and wherein the first resistance component has a resistance value that is higher than a resistance value of the second resistance component. 14 . The transient voltage absorption element according to claim 13 , wherein the first path is a current path in which a surge current flows and the second path is a current path in a frequency band of a signal that propagates through the signal line. 15 . The transient voltage absorption element according to claim 13 , further comprising: a semiconductor substrate; and an epitaxial layer on a surface of the semiconductor substrate and including a p+ region and an n+ region in a direction along a plane of the semiconductor substrate. 16 . The transient voltage absorption element according to claim 15 , wherein the diode is configured by the epitaxial layer, the p+ region, and the n+ region. 17 . The transient voltage absorption element according to claim 16 , further comprising: a layer having a same concentration as the epitaxial layer that is between an end portion of the p+ region and an end portion of the n+ region that faces the end portion of the p+ region at a distance between the p+ region and the n+ region in the direction along the plane of the semiconductor substrate; and an insulation portion configured to cause a current to detour, the current flowing through the epitaxial layer between the p+ region and the n+ region. 18 . The transient voltage absorption element according to claim 15 , further comprising: a wiring layer in an upper portion of the p+ region and that is electrically connected to the p+ region, wherein: the diode is configured by the epitaxial layer, the p+ region, and the n+ region, and the wiring layer includes a non-covered region that does not cover a portion of the p+ region. 19 . The transient voltage absorption element according to claim 15 , further comprising: a wiring layer in an upper portion of the n+ region and is electrically connected to the n+ region, wherein: the diode is configured by the epitaxial layer, the p+ region, and the n+ region, and the wiring layer includes a non-covered region that does not cover a portion of the n+ region. 20 . The transient voltage absorption element according to claim 15 , further comprising: an insulating layer on a surface of the epitaxial layer; and a trench contacting the insulating layer and provided over the epitaxial layer and a portion of the semiconductor substrate.

Assignees

Inventors

Classifications

  • Capacitors having potential barriers · CPC title

  • PIN diodes · CPC title

  • Zener diodes · CPC title

  • Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers · CPC title

  • using silicon technology, e.g. SiGe · CPC title

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What does patent US2024290773A1 cover?
A transient voltage absorption element is provided that includes a first path and a second path, the first path is a current path in which a surge current flows, and the second path is a current path in a frequency band of a signal that propagates through the signal line. The first path includes a series circuit including a diode including a depletion layer capacitance, a first inductor, and a …
Who is the assignee on this patent?
Murata Manufacturing Co
What technology area does this patent fall under?
Primary CPC classification H10D89/611. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Aug 29 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).