Cleaning liquid

US2024263026A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2024263026-A1
Application numberUS-202218563168-A
CountryUS
Kind codeA1
Filing dateMar 18, 2022
Priority dateMay 31, 2021
Publication dateAug 8, 2024
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides a cleaning liquid that can remove even white ink after being fixed and solve ejection failure of inkjet printers. Provided is a cleaning liquid containing: a first surfactant, a second surfactant, and a basic compound, the first surfactant including an amphoteric surfactant, the second surfactant including at least one of an anionic surfactant that is a sulfonate or a nonionic surfactant that has a branched structure and has an HLB of 7 to 14.

First claim

Opening claim text (preview).

1 . A cleaning liquid comprising: a first surfactant; a second surfactant; and a basic compound, the first surfactant including an amphoteric surfactant, the second surfactant including at least one of an anionic surfactant that is a sulfonate or a nonionic surfactant that has a branched structure and has an HLB of 7 to 14. 2 . The cleaning liquid according to claim 1 , wherein the first surfactant includes at least one selected from the group consisting of lauryldimethylamine oxide, lauryl dimethylaminoacetic acid betaine, and 2-alkyl-N-carboxymethyl-N-hydroxyethylimidazolinium betaine. 3 . The cleaning liquid according to claim 1 , wherein the first surfactant is contained in an amount of 0.1% to 3% by mass based on a total amount of the cleaning liquid. 4 . The cleaning liquid according to claim 1 , wherein the second surfactant includes at least one of sodium alkyl sulfate sulfonate or polyoxyethylene isotridecyl ether (5EO). 5 . The cleaning liquid according to claim 1 , wherein the second surfactant is contained in an amount of 0.1% to 3% by mass based on a total amount of the cleaning liquid. 6 . The cleaning liquid according to claim 1 , wherein the basic compound includes at least one of sodium hydroxide or potassium hydroxide. 7 . The cleaning liquid according to claim 1 , having a pH of 9 to 12. 8 . The cleaning liquid according to claim 1 , further comprising a preservative and water. 9 . The cleaning liquid according to claim 1 , wherein the cleaning liquid is for use in removing an aqueous inkjet printing ink composition, and the aqueous inkjet printing ink composition contains a pigment and an alkali soluble resin having an acid group in a molecule. 10 . The cleaning liquid according to claim 1 , wherein the pigment is contained in an amount of 3% to 12% by mass based on a total amount of the aqueous inkjet printing ink composition, and the alkali soluble resin having an acid group in a molecule has an acid value of 100 to 200 mgKOH/g.

Assignees

Inventors

Classifications

  • Sulfonic acid esters · CPC title

  • Industrial or commercial equipment, e.g. reactors, tubes or engines · CPC title

  • Ethers of polyoxyalkylene glycols having mixed oxyalkylene groups; {Polyalkoxylated fatty alcohols or polyalkoxylated alkylaryl alcohols with mixed oxyalkylele groups (C11D1/721 takes precedence)} · CPC title

  • Hydroxides or bases · CPC title

  • Mixtures of compounds all of which are non-ionic · CPC title

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Frequently asked questions

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What does patent US2024263026A1 cover?
The present invention provides a cleaning liquid that can remove even white ink after being fixed and solve ejection failure of inkjet printers. Provided is a cleaning liquid containing: a first surfactant, a second surfactant, and a basic compound, the first surfactant including an amphoteric surfactant, the second surfactant including at least one of an anionic surfactant that is a sulfonate …
Who is the assignee on this patent?
Sakata Inx Corp
What technology area does this patent fall under?
Primary CPC classification C09D9/04. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Aug 08 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).