Novel additive nanomanufacturing system and method

Patent metadata

Field	Value
Publication number	US-2024247361-A1
Application number	US-202418443968-A
Country	US
Kind code	A1
Filing date	Feb 16, 2024
Priority date	Jun 12, 2019
Publication date	Jul 25, 2024
Grant date	—

Abstract

A device including a chamber and a nozzle detachably connected to the chamber, the nozzle defining an aperture, a target carousel disposed within the chamber, a first laser configured to generate a first beam directed toward the target carousel to perform in-situ ablation to form a laser plume, a gas flow system configured to supply gas into the chamber, such that the gas interacts with the laser plume and causes condensation and formation of nanoparticles, and a second laser configured to generate a second beam directed through the interior of the chamber, through the aperture of the nozzle, and toward a substrate disposed outside the device, the second laser beam configured to sinter and crystalize on the substrate the nanoparticles exiting the nozzle.

First claim

1 - 20 . (canceled)

21 . A device comprising:
a chamber defined by a housing including at least one aperture; one or more targets disposed within the chamber; at least one first laser configured to generate a first beam directed through the housing and into the chamber toward the one or more targets to perform in-situ ablation to form a plume; a gas flow system configured to supply at least one gas into the chamber and flow through the chamber such that the at least one gas interacts with the plume and causes the formation of nanoparticles that flow out of the chamber through at least one aperture; and at least one second laser configured to generate a second beam toward a substrate disposed in an environment outside the housing maintained at atmospheric pressure, the second laser beam being configured to sinter the nanoparticles passing through the aperture on the substrate.

22 . The device of claim 21 , wherein the housing further includes a top plate and a nozzle arranged opposite the top plate, the nozzle including the at least one aperture.

23 . The device of claim 22 , wherein the first beam is directed through the housing opposite of the one or more targets.

24 . The device of claim 23 , wherein the at least one first laser is an ablation laser, and wherein the at least one second laser is a sintering laser.

25 . The device of claim 24 , wherein the at least one second laser is arranged above the top plate of the housing, and wherein the second beam is directed through the top plate and into the chamber, through the at least one aperture of the nozzle, and toward the substrate disposed in the environment outside the housing.

26 . The device of claim 21 , wherein a target carousel comprises a plate including a plurality of targets including the one or more targets about a first side of the plate and a shaft about a second side of the plate opposite the first side, and wherein the first beam performs the in-situ ablation to form the laser plume by focusing on at least one of the targets.

27 . The device of claim 21 , wherein the housing includes an outer wall, the top end plate arranged on a top end of the outer wall, wherein the nozzle is detachably coupled to a bottom end of the outer circumferential wall opposite the top end, and wherein the first beam extends through the outer wall.

28 . The device of claim 27 , wherein the one or more targets are arranged opposite a location at which the first beam extends through the outer wall such that the first beam extends traversely across the housing to the one or more targets, and wherein the second beam extends through the top plate and opposite the nozzle.

29 . The device of claim 28 , wherein the top end plate further includes one or more gas inlets through which the at least one gas is supplied into the chamber, and wherein the at least one gas is configured to flow from the gas inlets, through the chamber, and to the at least one aperture of the nozzle.

30 . A device comprising:
a chamber defined by a housing including at least one aperture; one or more targets disposed within the chamber; at least one first laser configured to generate a first beam directed through the housing and into the chamber toward the one or more targets to perform in-situ ablation to form a plume; a gas flow system configured to supply at least one gas into the chamber and flow through the chamber such that the at least one gas interacts with the plume and causes the formation of nanoparticles that flow out of the chamber through at least one aperture, wherein the gas increases pressure in the chamber to a first pressure greater than atmospheric pressure; and at least one second laser configured to generate a second beam toward a substrate disposed in an environment outside the housing maintained at atmospheric pressure, the at least one second laser beam configured to sinter the nanoparticles passing through the aperture on the substrate.

31 . The device of claim 21 , wherein the housing further includes a top plate and a nozzle arranged opposite the top plate, the nozzle including the at least one aperture.

32 . The device of claim 22 , wherein the first beam is directed through the housing opposite of the one or more targets.

33 . The device of claim 23 , wherein the at least one first laser is an ablation laser, and wherein the at least one second laser is a sintering laser.

34 . The device of claim 24 , wherein the at least one second laser is arranged above the top plate of the housing, and wherein the second beam is directed through the top plate and into the chamber, through the at least one aperture of the nozzle, and toward the substrate disposed in the environment outside the housing.

35 . The device of claim 21 , wherein a target carousel comprises a plate including a plurality of targets including the one or more targets about a first side of the plate and a shaft about a second side of the plate opposite the first side, and wherein the first beam performs the in-situ ablation to form the laser plume by focusing on at least one of the targets.

36 . A method comprising:
directing at least one first laser beam toward a target disposed within a chamber to perform in-situ ablation to form a laser plume; supplying at least one gas into the chamber such that the at least one gas interacts with the laser plume, causing the formation of nanoparticles, and directs a flow of the nanoparticles toward and through an opening of the chamber, wherein the at least one gas increases pressure in the chamber to a first pressure; and directing at least one second laser beam toward a substrate disposed adjacent to the opening of the chamber, the at least one second laser beam being configured to sinter on the substrate the nanoparticles exiting the opening in the chamber, wherein the substrate is arranged in an environment outside of the chamber that is maintained at a second pressure, and wherein the first pressure is greater than the second pressure.

37 . The method of claim 36 , wherein a nozzle including an aperture is detachably coupled to the chamber such that the opening of the chamber opens into the nozzle, wherein the at least one gas directs the flow of the nanoparticles toward and through the aperture of the nozzle, and wherein the nanoparticles are jetted through the aperture of the nozzle.

38 . The method of claim 37 , wherein a pipe extends away from the opening of the chamber, and wherein the nozzle is removably coupled to a terminal end of the pipe opposite the chamber.

39 . The device of claim 38 , wherein the chamber includes a housing having a top plate, and wherein the nozzle is arranged opposite the top plate.

40 . The device of claim 36 , wherein the at least one first laser is an ablation laser, and wherein the at least one second laser is a sintering laser.

Assignees

• Univ Auburn

Inventors

• Mahjouri-Samani Masoud
• Shamsaei Nima

Classifications

• B22F10/34

  of powder characteristics, e.g. density, oxidation or flowability · CPC title

• B22F12/90

  Means for process control, e.g. cameras or sensors · CPC title

• B22F12/70

  Gas flow means · CPC title

• B22F12/53

  Nozzles · CPC title

• B22F12/44

  characterised by the configuration of the radiation means · CPC title