Method for Producing Titanium-containing Electrodeposit and Metal Titanium Electrodeposit

US2024191385A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2024191385-A1
Application numberUS-202218569131-A
CountryUS
Kind codeA1
Filing dateApr 27, 2022
Priority dateJun 30, 2021
Publication dateJun 13, 2024
Grant date

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  1. Title

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  5. First independent claim

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Abstract

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Provided is a method for producing a titanium-containing electrodeposit, which can achieve good refinement by an electrodeposition without using the Kroll method. A method for producing a titanium-containing electrodeposit, including an electrodeposition step of electrodepositing a titanium-containing electrodeposit in a chloride bath, the chloride bath being a molten salt, using an anode including a TiAlO conductive material containing titanium, aluminum, and oxygen, and a cathode, wherein, in the electrodeposition step, a current density of the cathode is in a range of 0.3 A/cm 2 or more and 2.0 A/cm 2 or less, and wherein the chloride bath contains 1 mol % or more of a titanium subchloride.

First claim

Opening claim text (preview).

1 . A method for producing a titanium-containing electrodeposit, comprising an electrodeposition step of electrodepositing a titanium-containing electrodeposit in a chloride bath, the chloride bath being a molten salt, using an anode comprising a TiAlO conductive material containing titanium, aluminum, and oxygen, and a cathode, wherein, in the electrodeposition step, a current density of the cathode is in a range of 0.3 A/cm 2 or more and 2.0 A/cm 2 or less, and wherein the chloride bath contains 1 mol % or more of a titanium subchloride. 2 . The method for producing a titanium-containing electrodeposit according to claim 1 , wherein a temperature of the chloride bath is 730° C. or more. 3 . The method for producing a titanium-containing electrodeposit according to claim 1 , wherein the chloride bath contains 6 mol % or more of the titanium subchloride. 4 . The method for producing a titanium-containing electrodeposit according to claim 1 , wherein the method comprises a generation step of generating the titanium subchloride by bringing metal titanium and titanium tetrachloride into contact with each other in a chloride bath, before the electrodeposition step. 5 . The method for producing a titanium-containing electrodeposit according to claim 1 wherein the method comprises a generation step of generating the titanium subchloride by bringing sponge titanium and titanium tetrachloride into contact with each other in a chloride bath, before the electrodeposition step. 6 . The method for producing a titanium-containing electrodeposit according to claim 1 , further comprising an extracting step of heating a chemical blend comprising a titanium ore containing titanium oxide, aluminum, and a separating agent to obtain the TiAlO conductive material, before the electrodeposition step. 7 . The method for producing a titanium-containing electrodeposit according to claim 6 , wherein the separating agent comprises one or more selected from calcium fluoride, calcium oxide, and sodium fluoride. 8 . The method for producing a titanium-containing electrodeposit according to claim 1 , wherein a refined titanium-containing electrodeposit is obtained by performing multiple electrodepositions in the electrodeposition step. 9 . The method for producing a titanium-containing electrodeposit according to claim 8 , wherein the refined titanium-containing electrodeposit has an aluminum content of 1000 ppm by mass or less, an oxygen content of 500 ppm by mass or less, and a chlorine content of 500 ppm by mass or less. 10 . The method for producing a titanium-containing electrodeposit according to claim 9 , wherein the refined titanium-containing electrodeposit has: a nitrogen content of 0.03% by mass or less; a carbon content of 0.01% by mass or less; an iron content of 0.010% by mass or less; a magnesium content of 0.05% by mass or less; a nickel content of 0.01% by mass or less; a chromium content of 0.005% by mass or less; a silicon content of 0.001% by mass or less; a manganese content of 0.05% by mass or less; and a tin content of 0.01% by mass or less. 11 . A metal titanium electrodeposit, wherein the metal titanium electrodeposit has an aluminum content of 5 ppm by mass or more and 1000 ppm by mass or less, an oxygen content of 100 ppm by mass or more and 500 ppm by mass or less, and a chlorine content of 500 ppm by mass or less. 12 . The metal titanium electrodeposit according to claim 11 , wherein the metal titanium electrodeposit has: a nitrogen content of 0.001% by mass or more and 0.03% by mass or less; a carbon content of 0.0004% by mass or more and 0.01% by mass or less; an iron content of 0.010% by mass or less; a magnesium content of 0.05% by mass or less; a nickel content of 0.01% by mass or less; a chromium content of 0.005% by mass or less; a silicon content of 0.001% by mass or less; a manganese content of 0.05% by mass or less; and a tin content of 0.01% by mass or less.

Assignees

Inventors

Classifications

  • from melts · CPC title

  • Alloys based on titanium · CPC title

  • obtaining metallic titanium from titanium compounds by dissociation, e.g. thermic dissociation of titanium tetraiodide, or by electrolysis or with the use of an electric arc · CPC title

  • Obtaining titanium {or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08} · CPC title

  • C25D3/56Primary

    of alloys · CPC title

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What does patent US2024191385A1 cover?
Provided is a method for producing a titanium-containing electrodeposit, which can achieve good refinement by an electrodeposition without using the Kroll method. A method for producing a titanium-containing electrodeposit, including an electrodeposition step of electrodepositing a titanium-containing electrodeposit in a chloride bath, the chloride bath being a molten salt, using an anode inclu…
Who is the assignee on this patent?
Toho Titanium Co Ltd
What technology area does this patent fall under?
Primary CPC classification C25D3/56. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jun 13 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).