Semiconductor devices and methods of manufacturing
US-12166025-B2 · Dec 10, 2024 · US
US2024186220A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2024186220-A1 |
| Application number | US-202418442671-A |
| Country | US |
| Kind code | A1 |
| Filing date | Feb 15, 2024 |
| Priority date | Nov 23, 2020 |
| Publication date | Jun 6, 2024 |
| Grant date | — |
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Official abstract text for this publication.
An electrostatic discharge protection circuit includes: a first electrostatic discharge protection device structure; a first contact pad above the first electrostatic discharge protection device structure in a cross-sectional view; and below the first electrostatic discharge protection device structure in the cross-sectional view, a metal connection coupling the first electrostatic discharge protection device structure to a second contact pad remote from the first contact pad, wherein the metal connection in the cross-sectional view only partially overlaps the first electrostatic discharge protection device structure.
Opening claim text (preview).
What is claimed is: 1 . An electrostatic discharge protection circuit, comprising: a first electrostatic discharge protection device structure; a first contact pad above the first electrostatic discharge protection device structure in a cross-sectional view; and below the first electrostatic discharge protection device structure in the cross-sectional view, a metal connection coupling the first electrostatic discharge protection device structure to a second contact pad remote from the first contact pad, wherein the metal connection in the cross-sectional view only partially overlaps the first electrostatic discharge protection device structure. 2 . The circuit of claim 1 , further comprising a molded carrier. 3 . The circuit of claim 1 , wherein the first electrostatic discharge protection device structure comprises one or more doped layers adjacent to the first contact pad. 4 . The circuit of claim 1 , wherein the first electrostatic discharge protection device structure is formed in a first area on a front side of a semiconductor substrate, wherein a second contact pad is formed in a second area on the front side of the semiconductor substrate, and wherein the metal connection connects the first electrostatic discharge protection device structure to the second area. 5 . The circuit of claim 4 , further comprising a carrier at a back side of the semiconductor substrate. 6 . The circuit of claim 5 , wherein the carrier is molded on the back side of the semiconductor substrate. 7 . The circuit of claim 4 , wherein a space between the first area and the second area is filled by a dielectric material. 8 . The circuit of claim 4 , wherein the metal connection is partly covered by the dielectric material. 9 . The circuit of claim 4 , further comprising a second electrostatic discharge protection device structure between the metal connection and the second contact pad. 10 . The circuit of claim 9 , wherein the first electrostatic discharge protection device structure comprises a Zener diode structure, and wherein the second electrostatic discharge protection device structure comprises a pin diode or contact structure. 11 . The circuit of claim 9 , further comprising: a third electrostatic discharge protection device structure in the second area; and a further metal connection between the third electrostatic discharge protection device structure and the first area. 12 . The circuit of claim 11 , wherein the third electrostatic discharge protection device structure is a same type of device structure as the first electrostatic discharge protection device structure. 13 . The circuit of claim 12 , further comprising a fourth electrostatic discharge protection device structure between the further metal connection and a fourth contact pad. 14 . The circuit of claim 11 , wherein the fourth electrostatic discharge protection device structure is a same type of device structure as the second electrostatic discharge protection device structure. 15 . The circuit of claim 11 , wherein the first, second, third, and fourth electrostatic discharge protection device structures are arranged in an antiparallel configuration. 16 . The circuit of claim 1 , wherein the first electrostatic discharge protection device structure comprises a Zener diode structure.
Manufacture or treatment · CPC title
Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes · CPC title
using diodes as protective elements · CPC title
characterised by the configuration of the interconnections connecting the protective arrangements, e.g. ESD buses · CPC title
using silicon technology, e.g. SiGe · CPC title
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