Inorganic oxide articles with thin, durable anti reflective structures
US-11906699-B2 · Feb 20, 2024 · US
US2024142668A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2024142668-A1 |
| Application number | US-202418408883-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jan 10, 2024 |
| Priority date | Aug 17, 2018 |
| Publication date | May 2, 2024 |
| Grant date | — |
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An article that includes: an inorganic oxide substrate having opposing major surfaces; and an optical film structure disposed on a first major surface of the substrate, the optical film structure comprising one or more of a silicon-containing oxide, a silicon-containing nitride and a silicon-containing oxynitride and a physical thickness from about 50 nm to less than 500 nm. The article exhibits a hardness of 8 GPa or greater measured at an indentation depth of about 100 nm or a maximum hardness of 9 GPa or greater measured over an indentation depth range from about 100 nm to about 500 nm, the hardness and the maximum hardness measured by a Berkovich Indenter Hardness Test. Further, the article exhibits a single-side photopic average reflectance that is less than 1%.
Opening claim text (preview).
What is claimed is: 1 . An article comprising: a substrate comprising opposing major surfaces including a first major surface and a second major surface; an anti-reflective coating disposed on the first major surface of the substrate; the anti-reflective coating comprising a physical thickness from about 50 nm to less than 500 nm; the anti-reflective coating comprising a plurality of alternating high refractive index and low refractive index layers with a first low refractive index layer in direct contact with the first major surface of the substrate, wherein each low refractive index layer comprises a silicon-containing oxide and each high refractive index layer comprises a nitride or an oxynitride; and an additional coating disposed on the anti-reflective coating, wherein the additional coating comprises a metal oxide including Nb or Ti. 2 . The article of claim 1 , wherein the article exhibits a hardness of 8 GPa or greater measured at an indentation depth of about 100 nm or a maximum hardness of 9 GPa or greater measured over an indentation depth range from about 100 nm to about 300 nm, the hardness and the maximum hardness measured by a Berkovich Indenter Hardness Test. 3 . The article of claim 1 , wherein the article including the anti-reflective coating exhibits a higher hardness value in comparison to a hardness value of the underlying substrate. 4 . The article of claim 1 , wherein each high refractive index layer comprises a silicon-containing nitride or a silicon-containing oxynitride. 5 . The article of claim 1 , wherein a combined physical thickness of the high refractive index layers is 30% or greater than the physical thickness of the anti-reflective coating. 6 . The article of claim 1 , wherein the low refractive index layers have a refractive index in a range of 1.3-1.7, and the substrate has a refractive index in a range of 1.45-1.55. 7 . The article of claim 1 , wherein the anti-reflective coating comprises a physical thickness from about 50 nm to about 350 nm. 8 . The article of claim 1 , wherein the plurality of alternating high refractive index and low refractive index layers is four (4) layers or less. 9 . The article of claim 1 , wherein the article exhibits a single-side photopic average light reflectance that is less than 2%. 10 . The article of claim 1 , wherein the substrate comprises a glass substrate, a glass-ceramic substrate, or a chemically strengthened glass substrate. 11 . A consumer electronic product, comprising: a housing comprising a front surface, a back surface and side surfaces; electrical components at least partially within the housing, the electrical components comprising a controller, a memory, and a display, the display at or adjacent to the front surface of the housing; and a cover substrate disposed over the display, wherein at least one of a portion of the housing or the cover substrate comprises the article of claim 1 . 12 . An article comprising: a substrate comprising opposing major surfaces including a first major surface and a second major surface; an anti-reflective coating disposed on the first major surface of the substrate; the anti-reflective coating comprising a plurality of alternating high refractive index and low refractive index layers with a first low refractive index layer in direct contact with the first major surface of the substrate, and wherein each low refractive index layer comprises a silicon-containing oxide, and each high refractive index layer comprises a nitride or an oxynitride; the anti-reflective coating comprises a capping layer of silicon-containing oxide; and wherein one of the high refractive index layers in the anti-reflective coating is a thickest layer in the layers of the anti-reflective coating below the capping layer. 13 . The article of claim 12 , wherein each high refractive index layer comprises a silicon-containing nitride or a silicon-containing oxynitride. 14 . The article of claim 12 , wherein the article exhibits a hardness of 8 GPa or greater measured at an indentation depth of about 100 nm or a maximum hardness of 9 GPa or greater measured over an indentation depth range from about 100 nm to about 300 nm, the hardness and the maximum hardness measured by a Berkovich Indenter Hardness Test. 15 . The article of claim 12 , wherein the article including the anti-reflective coating exhibits a higher hardness value in comparison to a hardness value of the underlying substrate. 16 . The article of claim 12 , wherein a combined physical thickness of the high refractive index layers is 30% or greater than the physical thickness of the anti-reflective coating. 17 . The article of claim 12 , wherein the substrate has a refractive index in a range of 1.45-1.55. 18 . The article of claim 12 , wherein the anti-reflective coating comprises a physical thickness from about 50 nm to about 500 nm. 19 . The article of claim 12 , wherein the high refractive index layer adjacent to the capping layer has an optical thickness from about 45 nm to about 450 nm. 20 . The article of claim 12 , wherein the capping layer has a physical thickness of 80 nm or more. 21 . The article of claim 12 , wherein the capping layer has a physical thickness of 100 nm or less. 22 . The article of claim 12 , wherein the plurality of alternating high refractive index and low refractive index layers is four (4) layers or less. 23 . The article of claim 12 , wherein the article exhibits a single-side photopic average light reflectance that is less than 2%. 24 . The article of claim 12 , wherein the substrate comprises a glass substrate, a glass-ceramic substrate, or a chemically strengthened glass substrate. 25 . A consumer electronic product, comprising: a housing comprising a front surface, a back surface and side surfaces; electrical components at least partially within the housing, the electrical components comprising a controller, a memory, and a display, the display at or adjacent to the front surface of the housing; and a cover substrate disposed over the display, wherein at least one of a portion of the housing or the cover substrate comprises the article of claim 12 . 26 . An article comprising: a substrate comprising opposing major surfaces including a first major surface and a second major surface; an anti-reflective coating disposed on the first major surface of the substrate; the anti-reflective coating comprising a plurality of alternating high refractive index and low refractive index layers with a first low refractive index layer in direct contact with the first major surface of the substrate; the anti-reflective coating comprises a capping layer; the anti-reflective coating comprises a physical thickness from about 50 nm to about 500 nm; wherein the high refractive index layer adjacent to the capping layer has an optical thickness from about 45 nm to about 450 nm; and wherein the capping layer has a physical thickness of 80 nm or more. 27 . The article of claim 26 , wherein each low refractive index layer comprises a silicon-containing oxide, and each high refractive index layer comprises a nitride or an oxynitride; 28 . The article of claim 26 , wherein the article exhibits a hardness of 8 GPa or greater measured at an indentation depth of about 100 nm or a maximum hardness of 9 GPa or greater measured
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