Polymer, resist composition including the same, and method of forming pattern using the resist composition

US2024124635A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2024124635-A1
Application numberUS-202318164841-A
CountryUS
Kind codeA1
Filing dateFeb 6, 2023
Priority dateSep 23, 2022
Publication dateApr 18, 2024
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are a polymer, a resist composition including the same, and a method of forming a pattern using the resist composition, the polymer including one or more of a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2, and free of a repeating unit of which a structure changes by an acid:In Formulae 1 and 2, R11 to R16, b12, X−, R21 to R24, b22, and Y are as described in the specification.

First claim

Opening claim text (preview).

What is claimed is: 1 . A polymer comprising: at least one of a first repeating unit represented by Formula 1 or a second repeating unit represented by Formula 2, and being free of a repeating unit of which a structure changes by an acid: wherein, in Formulae 1 and 2, R 11 and R 21 are each independently hydrogen, deuterium, halogen, a C 1 -C 6 linear or branched alkyl group, or a halogenated C 1 -C 6 linear or branched alkyl group; R 12 to R 14 and R 22 to R 24 are each independently hydrogen, deuterium, halogen, or a linear, branched, or cyclic monovalent C 1 -C 20 hydrocarbon group optionally containing a heteroatom; b12 and b22 are each independently integers of 1 to 4; R 15 and R 16 are each independently a linear, branched, or cyclic monovalent C 1 -C 20 hydrocarbon group optionally containing a heteroatom, and R 15 and R 16 optionally bond together to form a ring; X − is a counter ion; Y is at least one of a halogen, R 18 SO 3 , R 18 CO 2 , R 18 PO 4 , or NO 3 ; R 18 is a linear, branched, or cyclic monovalent C 1 -C 20 hydrocarbon group optionally containing a heteroatom; and * and *′ are each a bonding site with a neighboring atom. 2 . The polymer of claim 1 , wherein R 12 to R 14 and R 22 to R 24 are each independently hydrogen, deuterium, halogen, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, a C 3 -C 6 cycloalkoxy group, or a C 6 -C 20 aryl group. 3 . The polymer of claim 1 , wherein R 13 is one of hydrogen or deuterium; and Rio is hydrogen, deuterium, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, a C 3 -C 6 cycloalkoxy group, or a C 6 -C 20 aryl group, and R 23 is one of hydrogen or deuterium; and R 24 is one of hydrogen, deuterium, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, a C 3 -C 6 cycloalkoxy group, or a C 6 -C 20 aryl group. 4 . The polymer of claim 1 , wherein R 15 and R 16 are each independently a substituted or unsubstituted C 1 -C 20 alkyl group or a substituted or unsubstituted C 3 -C 20 carbocyclic group, and R 15 and R 16 optionally bond together to form a ring. 5 . The polymer of claim 1 , wherein R 15 and R 16 are each independently a C 1 -C 10 alkyl group unsubstituted or substituted with at least one of halogen, a hydroxy group, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, a C 3 -C 6 cycloalkoxy group, or a C 6 -C 10 aryl group; or a C 6 -C 20 aryl group unsubstituted or substituted with at least one of halogen, a hydroxy group, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, and a C 3 -C 6 cycloalkoxy group, and R 15 and R 16 optionally bond together to form a ring. 6 . The polymer of claim 1 , wherein is represented by at least one of Formulae 3-1 to 3-3 below: wherein, in Formulae 3-1 to 3-3, L31 and L32 are each independently a single bond, 0, S, CO, SO, SO 2 , CRR′, or NR; R and R′ are each independently hydrogen, deuterium, halogen, a hydroxyl group, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, or a C 3 -C 6 cycloalkoxy group; X 31 and X 32 are each independently hydrogen, halogen, a C 1 -C 6 alkyl group, or a halogenated C 1 -C 6 alkyl group; b31 is an integer of 1 to 8, b32 is an integer of 1 to 5, and b33 is an integer of 1 to 4. 7 . The polymer of claim 1 , wherein X − is a halogen ion, R 17 SO 3 − , R 17 CO 2 − , R 17 PO 4 − , PF 6 − , or BF 4 − , and R 17 is a C 1 -C 10 alkyl group unsubstituted or substituted with at least one of halogen, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, a C 3 -C 6 cycloalkoxy group, and a C 6 -C 10 aryl group; or a C 6 -C 20 aryl group unsubstituted or substituted with at least one of halogen, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, or a C 3 -C 6 cycloalkoxy group. 8 . The polymer of claim 1 , wherein Rib is a C 1 -C 10 alkyl group unsubstituted or substituted with at least one of halogen, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, a C 3 -C 6 cycloalkoxy group, and a C 6 -C 10 aryl group; or a C 6 -C 20 aryl group unsubstituted or substituted with at least one of halogen, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, or a C 3 -C 6 cycloalkoxy group. 9 . The polymer of claim 1 , wherein the first repeating unit is represented by Formula 1-1; and the second repeating unit is represented by Formula 2-1: 10 . The polymer of claim 1 , further comprising: a third repeating unit represented by Formula 4: wherein, in Formula 4, R 41 is hydrogen, deuterium, halogen, a linear or branched C 1 -C 6 alkyl group, or a linear or branched halogenated C 1 -C 6 alkyl group, L 41 is a single bond, a substituted or unsubstituted C 1 -C 10 alkylene group, a substituted or unsubstituted C 3 -C 10 cycloalkylene group, a substituted or unsubstituted C 3 -C 10 heterocycloalkylene group, a substituted or unsubstituted phenylene group, a substituted or unsubstituted naphthylene group, *—O—*′, *—C(═O)O—*′, —OC(═O)—*′, *—C(═O)NH—*′, −NHC(═O)—*′, or any combination thereof, a41 is an integer of 1 to 6, and X 41 is a non-acid labile group. 11 . The polymer of claim 10 , wherein X 41 is hydrogen or a linear, branched, or cyclic monovalent C 1 -C 20 hydrocarbon group containing at least one polar moiety selected from among a hydroxy group, halogen, a cyano group, a carbonyl group, a carboxyl group, *—O—*′, *—C(═O)O—*′, —OC(═O)—*′, *—S(═O)O—*′, —OS(═O)—*′, a lactone ring, a sultone ring, and a carboxylic anhydride moiety. 12 . The polymer of claim 10 , wherein X 41 is represented by any one of Formulae 5-1 to 5-5: wherein, in Formulae 5-1 to 5-5, a51 is 1 or 2; R 51 to R 59 are each independently a bonding site with a neighboring atom, hydrogen, a hydroxy group, halogen, a cyano group, a C 1 -C 6 alkyl group, a halogenated C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a C 3 -C 6 cycloalkyl group, a C 3 -C 6 cycloalkoxy group, or a C 6 -C 10 aryl group, one of R 51 to R 53 , one of R 54 , one of R 55 , one of R 56 and R 57 , and one of R 58 and R 59 are each a bonding site with a neighboring atom, b51 is an integer of 1 to 4, b52 is wan integer of 1 to 10, b53 and b54 are each independently integers of 1 to 8, and b55 is a

Assignees

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Classifications

  • Liquid compositions therefor, e.g. developers · CPC title

  • G03F7/2004Primary

    characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title

  • with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

  • Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title

  • with acrylic or methacrylic acids · CPC title

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What does patent US2024124635A1 cover?
Provided are a polymer, a resist composition including the same, and a method of forming a pattern using the resist composition, the polymer including one or more of a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2, and free of a repeating unit of which a structure changes by an acid:In Formulae 1 and 2, R11 to R16, b12, X−, R21 to R24, b22, a…
Who is the assignee on this patent?
Samsung Electronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification G03F7/2004. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Apr 18 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).