Precursor For Positive Electrode Active Material And Method Of Preparing The Same

US2024083767A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2024083767-A1
Application numberUS-202218275751-A
CountryUS
Kind codeA1
Filing dateFeb 18, 2022
Priority dateFeb 18, 2021
Publication dateMar 14, 2024
Grant date

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Abstract

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A precursor for a positive electrode active material and a method of making the same are disclosed herein. In some embodiments a method includes forming precursor seeds for a positive electrode active material by a co-precipitation reaction while supplying a transition metal aqueous solution, an ammonium cationic complexing agent, and a basic compound to a reaction solution, and growing precursor particles for a positive electrode active material by a co-precipitation reaction while supplying a transition metal aqueous solution, an ammonium cationic complexing agent, and a basic compound to the reaction solution containing the precursor seeds, wherein the co-precipitation reaction to grow the precursor particles proceeds while continuously increasing feed rates of the transition metal aqueous solution and the ammonium cationic complexing agent.

First claim

Opening claim text (preview).

1 . A method of preparing a precursor for a positive electrode active material, the method comprising: forming precursor seeds for a positive electrode active material by a co-precipitation reaction while supplying a transition metal aqueous solution, an ammonium cationic complexing agent, and a basic compound to a reaction solution; and growing precursor particles for a positive electrode active material from the precursor seeds by a co-precipitation reaction while supplying a transition metal aqueous solution, an ammonium cationic complexing agent, and a basic compound to the reaction solution containing the precursor seeds, wherein the co-precipitation reaction to grow the precursor particles proceeds while continuously increasing feed rates of the transition metal aqueous solution and the ammonium cationic complexing agent. 2 . The method of claim 1 , wherein the feed rates for the transition metal aqueous solution and the ammonium cationic complexing agent to grow the precursor particles are continuously increased until the feed rates for the transition metal aqueous solution and the ammonium cationic complexing agent to grow the precursor particles are 2 times to 10 times feed rates of the transition metal aqueous solution and the ammonium cationic complexing agent to grow the precursor seeds. 3 . The method of claim 1 , wherein the feed rates of the transition metal aqueous solution and the ammonium cationic complexing agent to grow the precursor particles are continuously increased until the feed rates of the transition metal aqueous solution and the ammonium cationic complexing agent to grow the precursor particles are 2 times to 5 times feed rates of the transition metal aqueous solution and the ammonium cationic complexing agent to grow the precursor seeds. 4 . The method of claim 1 , wherein, to grow the precursor particles, a feed rate increase rate of the transition metal aqueous solution and a feed rate increase rate of the ammonium cationic complexing agent are equal. 5 . The method of claim 1 , wherein the co-precipitation reaction to grow the precursor seed is performed for 1 hour to 8 hours. 6 . The method of claim 1 , wherein the transition metal aqueous solution comprises nickel, cobalt, and manganese elements, and comprises nickel among total transition metal elements in an amount of 30 mol % or more. 7 . The method of claim 6 , wherein the transition metal aqueous solution comprises the nickel among the total transition metal elements in an amount of 70 mol % or more. 8 . The method of claim 1 , wherein, to grow the precursor seed, the basic compound is added in an amount such that a pH of the reaction solution is maintained at 11.0 to 12.5. 9 . The method of claim 1 , wherein, to grow the precursor particles, the basic compound is added in an amount such that a pH of the reaction solution is maintained at 10.5 to 11.7. 10 . The method of claim 1 , wherein a temperature of the reaction solution is in a range of 40° C. to 65° C. to grow the precursor seeds and to grow the precursor particles. 11 . A precursor for a positive electrode active material, the precursor prepared by the method of claim 1 . 12 . The precursor for a positive electrode active material of claim 11 , wherein the precursor has a Brunauer-Emmett-Teller (BET) specific surface area of 10 m 2 /g to 20 m 2 /g. 13 . The precursor for a positive electrode active material of claim 11 , wherein the precursor has a composition represented by Formula 1 or Formula 2, [Ni a Co b Mn c M 1 d ](OH) 2   [Formula 1] [Ni a Co b Mn c M 1 d ]O·OH  [Formula 2] wherein, in Formulae 1 and 2, M 1 is at least one selected from the group consisting of aluminum (Al), tungsten (W), molybdenum (Mo), chromium (Cr), zirconium (Zr), titanium (Ti), magnesium (Mg), tantalum (Ta), and niobium (Nb), and 0.8≤a<1, 0<b<0.2, 0<c<0.2, and 0≤d<0.1.

Assignees

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Classifications

  • C01G53/82Primary

    Compounds containing nickel, with or without oxygen or hydrogen, and containing two or more other elements · CPC title

  • Positive electrodes · CPC title

  • of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy · CPC title

  • C01G53/006Primary

    Chemistry & Metallurgy · mapped topic

  • Surface area · CPC title

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What does patent US2024083767A1 cover?
A precursor for a positive electrode active material and a method of making the same are disclosed herein. In some embodiments a method includes forming precursor seeds for a positive electrode active material by a co-precipitation reaction while supplying a transition metal aqueous solution, an ammonium cationic complexing agent, and a basic compound to a reaction solution, and growing precurs…
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C01G53/82. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Mar 14 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).