Light-absorbing composition, light-absorbing film, method for producing light-absorbing film, and optical filter
US-2024377565-A1 · Nov 14, 2024 · US
US2024053521A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2024053521-A1 |
| Application number | US-202217886768-A |
| Country | US |
| Kind code | A1 |
| Filing date | Aug 12, 2022 |
| Priority date | Aug 12, 2022 |
| Publication date | Feb 15, 2024 |
| Grant date | — |
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A multilayer thin film that reflects an omnidirectional structural color having a reflective core layer; an amorphous-phase TiO2 dielectric layer extending across the reflective core layer; a metallic absorbing layer extending across the dielectric layer; and a dielectric outer layer extending across the metallic absorbing layer. The multilayer thin film reflects a single narrow band of visible light when exposed to broadband electromagnetic radiation, and a color shift of the single narrow band of visible light is less than 30° measured in Lab color space when the multilayer thin film is exposed to broadband electromagnetic radiation and viewed from angles between 0° and 45° relative to a direction normal to an outer surface of the multilayer thin film.
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1 . A multilayer thin film that reflects an omnidirectional structural color comprising: a reflective core layer; an amorphous-phase TiO 2 dielectric layer extending across the reflective core layer; a metallic absorbing layer extending across the amorphous-phase TiO 2 dielectric layer; and a dielectric outer layer extending across the metallic absorbing layer, wherein the multilayer thin film reflects a single narrow band of visible light when exposed to broadband electromagnetic radiation, the single narrow band of visible light comprising: a color shift of the single narrow band of visible light is less than 30° measured in Lab color space when the multilayer thin film is exposed to broadband electromagnetic radiation and viewed from angles between 0° and 45° relative to a direction normal to an outer surface of the multilayer thin film. 2 . The multilayer thin film of claim 1 , wherein the reflective core layer is formed from Al, Ag, Pt, Sn, Au, Cu, brass, bronze, TiN, Cr, or combinations thereof. 3 . The multilayer thin film of claim 1 , wherein the reflective core layer has a thickness between 50 nm and 500 nm. 4 . The multilayer thin film of claim 1 , wherein the amorphous-phase TiO 2 dielectric layer has a thickness between 10 nm and 150 nm. 5 . The multilayer thin film of claim 1 , wherein the metallic absorbing layer is formed from W, Cr, Ge, Ni, stainless steel, Pd, Ti, Si, V, TiN, Co, Mo, Nb, ferric oxide, or combinations thereof. 6 . The multilayer thin film of claim 1 , wherein the metallic absorbing layer has a thickness between 5 nm and 20 nm. 7 . The multilayer thin film of claim 1 , wherein the dielectric outer layer is formed from ZnS, TiO 2 , and combinations thereof. 8 . The multilayer thin film of claim 1 , wherein the dielectric outer layer has a thickness greater than 0.1 quarter wave (QW) to less than or equal to 4.0 QW where a control wavelength is determined by a target wavelength at a peak reflectance in a visible wavelength. 9 . The multilayer thin film of claim 1 , wherein the dielectric outer layer has a thickness between 5 nm and 500 nm. 10 . The multilayer thin film of claim 1 , wherein the reflective core layer is formed from Al, the metallic absorbing layer is formed from W, and the dielectric outer layer is formed from ZnS or TiO 2 . 11 . A multilayer thin film that reflects an omnidirectional structural color comprising: a reflective core layer; a protective layer encapsulating the reflective core layer; an amorphous-phase TiO 2 dielectric layer extending across at least a portion of the protective layer; a barrier layer extending across the amorphous-phase TiO 2 dielectric layer; a metallic absorbing layer extending across the barrier layer; and a dielectric outer layer extending across the metallic absorbing layer, wherein the multilayer thin film reflects a single narrow band of visible light when exposed to broadband electromagnetic radiation, the single narrow band of visible light comprising: a color shift of the single narrow band of visible light is less than 30° measured in Lab color space when the multilayer thin film is exposed to broadband electromagnetic radiation and viewed from angles between 0° and 45° relative to a direction normal to an outer surface of the multilayer thin film. 12 . The multilayer thin film of claim 11 , wherein the reflective core layer is formed from Al, Ag, Pt, Sn, Au, Cu, brass, bronze, TiN, Cr, or combinations thereof. 13 . The multilayer thin film of claim 11 , wherein the reflective core layer has a thickness between 50 nm and 500 nm. 14 . The multilayer thin film of claim 11 , wherein the protective layer is formed from SiO 2 , SnO 2 , Al 2 O 3 , or combinations thereof. 15 . The multilayer thin film of claim 11 , wherein the protective layer has a thickness between 2 nm and 70 nm. 16 . The multilayer thin film of claim 11 , wherein the amorphous-phase TiO 2 dielectric layer has a thickness between 10 nm and 150 nm. 17 . The multilayer thin film of claim 11 , wherein the metallic absorbing layer is formed from W, Cr, Ge, Ni, stainless steel, Pd, Ti, Si, V, TiN, Co, Mo, Nb, ferric oxide, amorphous silicon, or combinations thereof. 18 . The multilayer thin film of claim 11 , wherein the metallic absorbing layer has a thickness from 5 nm to 20 nm. 19 . The multilayer thin film of claim 11 , wherein the dielectric outer layer is formed from ZnS, TiO 2 , and combinations thereof. 20 . The multilayer thin film of claim 11 , wherein the dielectric outer layer has a thickness greater than 0.1 quarter wave (QW) to less than or equal to 4.0 QW where a control wavelength is determined by a target wavelength at a peak reflectance in a visible wavelength. 21 . The multilayer thin film of claim 11 , wherein the dielectric outer layer has a thickness between 5 nm and 500 nm. 22 . The multilayer thin film of claim 11 , wherein the barrier layer is formed from Al 2 θ 3 . 23 . The multilayer thin film of claim 11 , wherein the barrier layer has a thickness that is between 1 nm and 15 nm. 24 . The multilayer thin film of claim 11 , wherein the reflective core layer is formed from Al, the protective layer is formed from SiO 2 , the metallic absorbing layer is formed from W, the barrier layer is made formed from Al 2 O 3 , and the dielectric outer layer is formed ZnS or TiO 2 . 25 . A method for forming the multilayer thin film of claim 1 , the method comprising: depositing the amorphous-phase TiO 2 dielectric layer onto the reflective core layer by CVD or ALD; depositing the metallic absorbing layer onto the amorphous-phase TiO 2 dielectric layer by ALD; and depositing the dielectric outer layer onto the metallic absorbing layer by CVD or ALD. 26 . A method for forming the multilayer thin film of claim 11 , the method comprising: depositing the protective layer onto the reflective core layer by wet chemical processes; depositing the amorphous-phase TiO 2 dielectric layer onto the protective layer by CVD, ALD, or wet chemical processes; depositing the barrier layer onto the amorphous-phase TiO 2 dielectric layer by ALD; depositing the metallic absorbing layer onto the barrier layer by ALD; and depositing the dielectric outer layer onto the metallic absorbing layer by CVD or ALD. 27 . A paint system comprising: a binder; and a multilayer thin film of claim 1 . 28 . An automotive vehicle comprising the paint system of claim 27 . 29 . A paint system comprising: a binder; and a multilayer thin film of claim 11 . 30 . An automotive vehicle comprising the paint system of claim 29 .
Optical properties · CPC title
Pearl essence, e.g. coatings containing platelet-like pigments for pearl lustre · CPC title
characterised by shape, e.g. fibres, flakes or microspheres · CPC title
Reflecting filters (G02B5/28 takes precedence) · CPC title
Absorbing filters {(G02B5/201 - G02B5/208 take precedence)} · CPC title
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