Apparatus and method of producing inorganic powder

US2024001319A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2024001319-A1
Application numberUS-202318469241-A
CountryUS
Kind codeA1
Filing dateSep 18, 2023
Priority dateNov 10, 2021
Publication dateJan 4, 2024
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

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Provided are an apparatus for producing inorganic powder, and a method of producing inorganic powder by using such. The apparatus includes a vaporization part where a condensed-phase precursor is vaporized to obtain a gas-phase precursor, a partial precipitation part where the gas-phase precursor obtained in the vaporization part is partially precipitated to a condensed phase, and a reaction part where the gas-phase precursor remaining after being partially precipitated to a condensed phase in the partial precipitation part reacts with a reaction gas to obtain inorganic powder. An equilibrium vapor pressure of the gas-phase precursor in the partial precipitation part is lower than a vapor pressure of the gas-phase precursor obtained in the vaporization part, and an equilibrium vapor pressure of the precursor in the reaction part is equal to or higher than a vapor pressure of the gas-phase precursor partially precipitated to a condensed phase in the partial precipitation part.

First claim

Opening claim text (preview).

What is claimed is: 1 . An apparatus for producing inorganic powder, the apparatus comprising: a precursor supplier comprising a channel; and a reaction part where a gas-phase precursor supplied from the precursor supplier reacts with a reaction gas to obtain the inorganic powder, wherein the precursor supplier comprises a vaporization part where a condensed-phase precursor is vaporized to obtain the gas-phase precursor, and a partial precipitation part where the gas-phase precursor obtained in the vaporization part is partially precipitated to a condensed phase, wherein the channel of the precursor supplier is configured in such a manner that a fluid passes sequentially through the vaporization part and the partial precipitation part and then is discharged to the reaction part, wherein the gas-phase precursor remaining after being partially precipitated to the condensed phase in the partial precipitation part is injected into the reaction part, wherein an equilibrium vapor pressure of the precursor in the partial precipitation part is lower than a vapor pressure of the gas-phase precursor obtained in the vaporization part, and wherein an equilibrium vapor pressure of the precursor in the reaction part is equal to or higher than a vapor pressure of the gas-phase precursor partially precipitated to the condensed phase in the partial precipitation part, wherein the channel of the precursor supplier includes a first downward channel, a second downward channel, and an upward channel, wherein the vaporization part comprises a precursor vaporizer provided in a region through which the fluid moving downward along the first downward channel passes, the first downward channel being heated by a heat source, and wherein the partial precipitation part is provided between the upward channel extending from the first downward channel and the second downward channel extending to the reaction part, the first downward channel comprising the precursor vaporizer. 2 . The apparatus of claim 1 , wherein the downward and upward channels are provided adjacent to each other in parallel. 3 . The apparatus of claim 1 , wherein a temperature of the vaporization part is maintained higher than a temperature of the partial precipitation part. 4 . The apparatus of claim 1 , wherein a temperature of the reaction part is maintained equal to or higher than the temperature of the partial precipitation part. 5 . The apparatus of claim 1 , further comprising a quenching gas inlet for injecting a quenching gas into the partial precipitation part. 6 . The apparatus of claim 1 , wherein the partial precipitation part comprises a precipitation induction member for inducing precipitation of the gas-phase precursor. 7 . The apparatus of claim 1 , wherein the inorganic powder comprises metal powder. 8 . The apparatus of claim 1 , wherein the inorganic powder comprises ceramic powder. 9 . The apparatus of claim 1 , wherein the precursor comprises one or more of metal acetate, metal bromide, metal carbonate, metal chloride, metal fluoride, metal hydroxide, metal iodide, metal nitrate, metal oxide, metal phosphate, metal silicate, metal sulfate, and metal sulfide. 10 . The apparatus of claim 1 , wherein the inorganic powder comprises nickel (Ni), copper (Cu), silver (Ag), iron (Fe), aluminum (Al), cobalt (Co), platinum (Pt), gold (Au), tin (Sn), or an alloy thereof. 11 . The apparatus of claim 1 , wherein the inorganic powder comprises an oxide, nitride, or carbide of Ni, Cu, Ag, Fe, Al, Co, Pt, Au, or Sn. 12 . An apparatus for producing inorganic powder, the apparatus comprising: a precursor supplier comprising a channel; and a reaction part where a gas-phase precursor supplied from the precursor supplier reacts with a reaction gas to obtain the inorganic powder, wherein the precursor supplier comprises a vaporization part where a condensed-phase precursor is vaporized to obtain the gas-phase precursor, and a partial precipitation part where the gas-phase precursor obtained in the vaporization part is partially precipitated to a condensed phase, wherein the channel of the precursor supplier is configured in such a manner that a fluid passes sequentially through the vaporization part and the partial precipitation part and then is discharged to the reaction part, wherein the gas-phase precursor remaining after being partially precipitated to the condensed phase in the partial precipitation part is injected into the reaction part, wherein a temperature of the vaporization part is maintained higher than a temperature of the partial precipitation part, and wherein a temperature of the reaction part is maintained equal to or higher than the temperature of the partial precipitation part, wherein the channel of the precursor supplier includes a first downward channel, a second downward channel, and an upward channel, wherein the vaporization part comprises a precursor vaporizer provided in a region through which the fluid moving downward along the first downward channel passes, the first downward channel being heated by a heat source, and wherein the partial precipitation part is provided between the upward channel extending from the first downward channel and the second downward channel extending to the reaction part, the first downward channel comprising the precursor vaporizer.

Assignees

Inventors

Classifications

  • B01J12/02Primary

    for obtaining at least one reaction product which, at normal temperature, is in the solid state · CPC title

  • using chemical processes · CPC title

  • Stationary reactors without moving elements inside (B01J19/08, B01J19/26 take precedence; with stationary particles B01J8/02) · CPC title

  • carried out at high temperatures, e.g. by pyrolysis · CPC title

  • B22F9/28Primary

    starting from gaseous metal compounds · CPC title

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What does patent US2024001319A1 cover?
Provided are an apparatus for producing inorganic powder, and a method of producing inorganic powder by using such. The apparatus includes a vaporization part where a condensed-phase precursor is vaporized to obtain a gas-phase precursor, a partial precipitation part where the gas-phase precursor obtained in the vaporization part is partially precipitated to a condensed phase, and a reaction pa…
Who is the assignee on this patent?
Korea Inst Ind Tech
What technology area does this patent fall under?
Primary CPC classification B01J12/02. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Jan 04 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).