Terminal material for connector

US2023299548A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2023299548-A1
Application numberUS-202118017207-A
CountryUS
Kind codeA1
Filing dateFeb 24, 2021
Priority dateJul 22, 2020
Publication dateSep 21, 2023
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A base material at least a surface is made of copper or copper alloy and a silver-nickel-potassium alloy plating layer formed on at least a part of the base material are provided; the silver-nickel-potassium alloy plating layer has a film thickness of 0.5 μm or more and 20.0 μm or less, a nickel content of 0.02% by mass or more and 0.60% by mass or less, and a potassium content of 0.03% by mass or more and 1.00% by mass or less; and an average crystal grain size of the silver-nickel-potassium alloy plating layer is preferably 10 nm or more and 150 nm or less.

First claim

Opening claim text (preview).

1 . A terminal material for a connector comprising a base material at least a surface is made of copper or copper alloy, and a silver-nickel-potassium alloy plating layer formed on at least a part of the base material, wherein the silver-nickel-potassium alloy plating layer has a film thickness of 0.5 μm or more and 20.0 μm or less, a nickel content of 0.02% by mass or more and 0.60% by mass or less, and a potassium content of 0.03% by mass or more and 1.00% by mass or less. 2 . The terminal material for a connector according to claim 1 , wherein an average crystal grain size of the silver-nickel-potassium alloy plating layer is 10 nm or more and 150 nm or less. 3 . The terminal material for a connector according to claim 1 , further comprising a silver-plating layer having a purity of silver 99.0% by mass or more excepting C, H, S, O, and N which are gas components with a film thickness of 0.1 μm or more and 5.0 μm or less on at least a part of the silver-nickel-potassium alloy plating layer. 4 . The terminal material for a connector according to claim 1 , wherein a nickel-plating layer made of nickel or nickel alloy with a film thickness of 0.2 μm or more and 5.0 μm or less is formed between the base material and the silver-nickel-potassium alloy plating layer. 5 . The terminal material for a connector according to claim 2 , further comprising a silver-plating layer having a purity of silver 99.0% by mass or more excepting C, H, S, O, and N which are gas components with a film thickness of 0.1 μm or more and 5.0 μm or less on at least a part of the silver-nickel-potassium alloy plating layer. 6 . The terminal material for a connector according to claim 2 , wherein a nickel-plating layer made of nickel or nickel alloy with a film thickness of 0.2 μm or more and 5.0 μm or less is formed between the base material and the silver-nickel-potassium alloy plating layer. 7 . The terminal material for a connector according to claim 3 , wherein a nickel-plating layer made of nickel or nickel alloy with a film thickness of 0.2 μm or more and 5.0 μm or less is formed between the base material and the silver-nickel-potassium alloy plating layer.

Assignees

Inventors

Classifications

  • Electroplating characterised by the article coated · CPC title

  • H01R43/16Primary

    for manufacturing contact members, e.g. by punching and by bending · CPC title

  • H01R13/03Primary

    characterised by the material, e.g. plating, or coating materials · CPC title

  • C25D5/12Primary

    at least one layer being of nickel or chromium · CPC title

  • containing more than 50% by weight of silver · CPC title

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Frequently asked questions

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What does patent US2023299548A1 cover?
A base material at least a surface is made of copper or copper alloy and a silver-nickel-potassium alloy plating layer formed on at least a part of the base material are provided; the silver-nickel-potassium alloy plating layer has a film thickness of 0.5 μm or more and 20.0 μm or less, a nickel content of 0.02% by mass or more and 0.60% by mass or less, and a potassium content of 0.03% by mass…
Who is the assignee on this patent?
Mitsubishi Materials Corp
What technology area does this patent fall under?
Primary CPC classification H01R43/16. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Sep 21 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).