Pattern forming apparatus for base material, pattern forming method, base material, and container

Patent metadata

Field	Value
Publication number	US-2023219162-A1
Application number	US-202318115781-A
Country	US
Kind code	A1
Filing date	Mar 1, 2023
Priority date	Sep 30, 2020
Publication date	Jul 13, 2023
Grant date	—

Abstract

A pattern forming apparatus for a base material includes a holding unit and a pattern forming unit. The holding unit is configured to hold a base material on which one of a protrusion shape portion and a recess shape portion is formed. The pattern forming unit is configured to form a pattern on the base material. The pattern is formed on at least one of the protrusion shape portion, the recess shape portion, a periphery of the recess shape portion, a periphery of the protrusion shape portion, a portion along the protrusion shape portion, and a portion along the recess shape portion.

First claim

What is claimed is:

1 . A pattern forming apparatus for a base material, comprising:
a holding unit configured to hold a base material on which one of a protrusion shape portion and a recess shape portion is formed; and a pattern forming unit configured to form a pattern on the base material, wherein the pattern is formed on at least one of the protrusion shape portion, the recess shape portion, a periphery of the recess shape portion, a periphery of the protrusion shape portion, a portion along the protrusion shape portion, and a portion along the recess shape portion.

2 . The pattern forming apparatus according to claim 1 , wherein the pattern forming unit is configured to form the pattern across two or more of a top portion of the protrusion shape portion, a side portion of the protrusion shape portion, a bottom portion of the recess shape portion, a side portion of the recess shape portion, the periphery of the protrusion shape portion, and the periphery of the recess shape portion.

3 . The pattern forming apparatus according to claim 1 , wherein the pattern forming unit is configured to form the pattern by laser irradiation.

4 . The pattern forming apparatus according to claim 2 , wherein the pattern comprises an aggregation of dots, and the pattern forming unit is configured to form the dots by laser irradiation.

5 . The pattern forming apparatus according to claim 3 , wherein the pattern forming unit is configured to change a focal position of laser.

6 . The pattern forming apparatus according to claim 5 , wherein the pattern forming unit is configured to change intensity of laser.

7 . The pattern forming apparatus according to claim 3 , wherein the pattern forming unit is configured to change a laser irradiation direction.

8 . The pattern forming apparatus according to claim 3 , further comprising a position detection unit configured to detect a position of the one of the protrusion shape portion and the recess shape portion.

9 . The pattern forming apparatus according to claim 8 , further comprising a distance detection unit configured to detect a distance to the one of the protrusion shape portion and the recess shape portion.

10 . A pattern forming method for a base material, comprising:
preparing a base material on which one of a protrusion shape portion and a recess shape portion is formed; and forming a pattern on one of the protrusion shape portion, the recess shape portion, a periphery of the protrusion shape portion, a periphery of the recess shape portion, a portion along the protrusion shape portion, and a portion along the recess shape portion.

11 . A base material on which one of a protrusion shape portion and a recess shape portion is formed, wherein
a pattern is formed on at least one of the protrusion shape portion, the recess shape portion, a periphery of the protrusion shape portion, a periphery of the recess shape portion, a portion along the protrusion shape portion, and a portion along the recess shape portion.

12 . The base material according to claim 11 , wherein the pattern is formed on one of a top portion of the protrusion shape portion, a side portion of the protrusion shape portion, a bottom portion of the recess shape portion, a side portion of the recess shape portion, the periphery of the protrusion shape portion, and the periphery of the recess shape portion.

13 . The base material according to claim 12 , wherein the pattern is formed across two or more of the top portion of the protrusion shape portion, the side portion of the protrusion shape portion, the bottom portion of the recess shape portion, the side portion of the recess shape portion, the periphery of the protrusion shape portion, and the periphery of the recess shape portion.

14 . The base material according to claim 11 , wherein the protrusion shape portion and the recess shape portion are formed by embossing.

15 . A container comprising the base material according to claim 11 .

Assignees

• Akatsu Kazuhiro
• Hirayama Rie
• Fujita Kazuhiro
• Sakai Shoichiro

Inventors

• Akatsu Kazuhiro
• Hirayama Rie
• Fujita Kazuhiro
• Sakai Shoichiro

Classifications

• B41J2/442

  using lasers · CPC title

• B41J2/475

  for heating selectively {by radiation or ultrasonic waves} · CPC title

• B23K26/032 Primary

  using optical means · CPC title

• B23K26/0006 Primary

  taking account of the properties of the material involved (B23K26/32, B23K26/40 take precedence) · CPC title

• B65B61/02

  for perforating, scoring {, slitting,} or applying code or date marks on material prior to packaging {(scoring ampoules B65B3/006)} · CPC title