Process for the controlled oligomerization of butenes
US-11939289-B2 · Mar 26, 2024 · US
US2023192575A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2023192575-A1 |
| Application number | US-202218003441-A |
| Country | US |
| Kind code | A1 |
| Filing date | May 20, 2022 |
| Priority date | Jun 4, 2021 |
| Publication date | Jun 22, 2023 |
| Grant date | — |
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Provided are a tricyclodecane dimethanol composition which may be usefully applied to the preparation of a high heat resistant polyester by reducing the content of impurities, and a preparation method thereof.
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What is claimed is: 1 . A tricyclodecane dimethanol composition comprising tricyclodecane dimethanol, and an ether compound represented by the following Chemical Formula 1 in an amount of 1% by weight or less: R—CH 2 —O—CH 2 —R [Formula 1] in Formula 1, R's are each independently 2 . The tricyclodecane dimethanol composition of claim 1 , comprising no ether compound. 3 . The tricyclodecane dimethanol composition of claim 1 , wherein a C 11-12 diol compound represented by the following Formula 2-1 or Formula 2-2 is included in an amount of 3% by weight or less: in Formula 2-1, R′ 1 and R′ 2 are each independently hydrogen or methyl, provided that none of R′ 1 and R′ 2 is methyl, in Formula 2-2, n is 3 or 4, when n is 3, R′ 3 is hydrogen or methyl, and when n is 4, R′ 3 is hydrogen. 4 . A method of preparing a tricyclodecane dimethanol composition comprising tricyclodecane dimethanol, and an ether compound represented by the following Chemical Formula 1 in an amount of 1% by weight or less, the method comprising the following steps of ii), iii), iv), and vi), and further comprising one or more of the following steps of i) and v): i) purifying dicyclopentadiene by performing the retro Diels-Alder reaction and the Diels-Alder reaction of dicyclopentadiene; ii) performing a hydroformylation reaction by introducing a catalyst composition including a rhodium-containing catalyst compound and an organophosphorus compound into a reactor, and by adding dropwise dicyclopentadiene under a mixed gas of hydrogen and carbon monoxide; iii) performing a hydrogenation reaction of the reaction mixture obtained after the step ii) in the presence of a hydrogenation catalyst; iv) removing the hydrogenation catalyst and the solvent from the reaction mixture obtained after the step iii); v) performing thin film evaporation of the reaction mixture obtained after the step iv); and vi) performing vacuum fractional distillation of the reaction mixture obtained after the step iv) or the step v): R—CH 2 —O—CH 2 —R [Formula 1] in Formula 1, R's are each independently 5 . The method of claim 4 , wherein the step i) includes the step of performing the retro Diels-Alder reaction by adding dropwise dicyclopentadiene to a reactor which contains an organic solvent and is maintained at 150° C. to 250° C.; and the step of reacting the cyclopentadiene monomer obtained by the retro Diels-Alder reaction at a temperature of 10° C. to 30° C. to obtain purified dicyclopentadiene. 6 . The method of claim 4 , wherein, after the step i), the content of co-dimers of C 4-5 diene of dicyclopentadiene and cyclopentadiene is 2% by weight or less. 7 . The method of claim 4 , wherein, in the step ii), the reaction pressure is 20 bar to 150 bar and the reaction temperature is 50° C. to 100° C. 8 . The method of claim 4 , wherein the organophosphorus compound is included in an amount of 5 moles to 200 moles per 1 mole of rhodium. 9 . The method of claim 4 , wherein, in the step ii), the dropwise addition of dicyclopentadiene is performed such that the number of moles of dicyclopentadiene added per minute with respect to 1 mmol of the rhodium element in the catalyst composition is 10 mmol to 10,000 mmol. 10 . The method of claim 4 , wherein the hydrogenation catalyst of the step iii) is a Ru/C catalyst. 11 . The method of claim 4 , wherein the hydrogenation reaction of the step iii) is performed at a temperature of 80° C. to 250° C. and a pressure of 20 bar to 200 bar. 12 . The method of claim 4 , wherein the thin film evaporation of the step v) is performed at a temperature of 100° C. to 200° C. and a pressure of 1 mtorr to 20 mtorr.
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