Current sensor device

US2023086851A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2023086851-A1
Application numberUS-202218071304-A
CountryUS
Kind codeA1
Filing dateNov 29, 2022
Priority dateSep 25, 2020
Publication dateMar 23, 2023
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A sensor device includes a silicon substrate having an active surface; a first sensing area disposed near a first edge of the active surface of the silicon substrate such that the first sensing area has at least one first magnetic sensing element is made of a first compound semiconductor material and contact pads; and a second sensing area disposed near a second edge of the active surface of the silicon substrate, such that the second edge is substantially opposite to the first edge, such that the second sensing area has at least one second magnetic sensing element made of a second compound semiconductor material and contact pads. A processing circuit is disposed of in the silicon substrate and is electrically connected via wire bonds and/or a redistribution layer with the contact pads of the first and second sensing areas.

First claim

Opening claim text (preview).

1 . A sensor device comprising: a silicon substrate having an active surface, a first sensing area disposed near a first edge of said active surface of said silicon substrate, said first sensing area comprising at least one first magnetic sensing element, a second sensing area disposed near a second edge of said active surface of said silicon substrate, said second edge being substantially opposite to said first edge, said second sensing area comprising at least one second magnetic sensing element, a processing circuit disposed in said silicon substrate and electrically connected with said first and said second sensing area and arranged to derive a first signal from said at least one first magnetic sensing element of said first sensing area, to derive a second signal from said at least one second magnetic sensing element of said second sensing area and to compute a difference between said first and said second signal. 2 . The sensor device as in claim 1 , wherein said first sensing area comprises at least two first magnetic sensing elements and said second sensing area comprises at least two second magnetic sensing elements. 3 . The sensor device as in claim 1 , wherein said at least one first magnetic sensing element and/or said at least one second magnetic sensing elements is/are so positioned that there is no overlap with a lead frame of said sensor device. 4 . The sensor device as in claim 1 , wherein said sensor device is coreless. 5 . The sensor device as in claim 1 , wherein said first and/or second magnetic sensing elements are Hall effect elements. 6 . The sensor device as in claim 1 , wherein said processing circuit disposed in said silicon substrate comprises a temperature and/or a stress sensor and is arranged to determine a temperature signal and/or stress signal from said temperature and/or stress sensor. 7 . The sensor device as in claim 6 , wherein said processing circuit is arranged to adjust said first signal and/or said second signal based on said temperature signal and/or stress signal prior to computing said difference between said first and said second signal. 8 . The sensor device as in claim 1 , wherein said at least one first magnetic sensing element is made of a first semiconductor material and/or said at least one second magnetic sensing element is made of a second semiconductor material. 9 . The sensor device as in claim 8 , wherein said first semiconductor material is a first compound semiconductor material and/or said second semiconductor material is a second compound semiconductor material. 10 . The sensor device as in claim 9 , wherein said first compound semiconductor material and/or said second compound semiconductor material is a III-V semiconductor material. 11 . The sensor device as in claim 9 , wherein said first compound semiconductor material and said second compound semiconductor material are the same. 12 . The sensor device as in claim 2 , wherein said at least two first magnetic sensing elements are orthogonally biased with respect to each other and/or said at least two second magnetic sensing elements are orthogonally biased with respect to each other. 13 . The sensor device as in claim 1 , wherein an adhesive layer is provided between said silicon substrate and said first sensing area and between said silicon substrate and said second sensing area. 14 . The sensor device as in claim 1 , wherein the distance between said first edge and a most nearby edge of a first magnetic sensing element of said first sensing area is less than 15% of the distance between said first edge and said second edge substantially opposite to said first edge. 15 . The sensor device as in claim 1 , wherein said first sensing area and said second sensing area each comprise corresponding contact pads for the at least four contacts. 16 . The sensor device as in claim 1 , wherein said processing circuit is connected with said first and second sensing area via wire bonds and/or a redistribution layer. 17 . The sensor device as in claim 1 , wherein the sensor device is a current sensor device. 18 . A sensor system, comprising a sensor device as in claim 1 , comprised in a package and a conductor for conducting electrical current, said conductor being outside said package comprising said current sensor device. 19 . The sensor system as in claim 18 , wherein at least two first magnetic sensing elements of said sensor device and at least two second magnetic sensing elements of said sensor device are arranged in a direction perpendicular to the direction of said electrical current. 20 . The sensor system as in claim 18 , wherein at least two first magnetic sensing elements of said sensor device and at least two second magnetic sensing elements of said sensor device are arranged in a direction parallel to said current direction.

Assignees

Inventors

Classifications

  • G01R15/202Primary

    using Hall-effect devices (Hall elements in arrangements for measuring electrical power G01R21/08) · CPC title

  • G01R15/207Primary

    Constructional details independent of the type of device used · CPC title

  • Means for compensating offset magnetic fields or the magnetic flux to be measured; Means for generating calibration magnetic fields · CPC title

  • Constructional adaptation of the sensor to specific applications · CPC title

  • Constructional adaptation of the sensor to specific applications · CPC title

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Frequently asked questions

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What does patent US2023086851A1 cover?
A sensor device includes a silicon substrate having an active surface; a first sensing area disposed near a first edge of the active surface of the silicon substrate such that the first sensing area has at least one first magnetic sensing element is made of a first compound semiconductor material and contact pads; and a second sensing area disposed near a second edge of the active surface of th…
Who is the assignee on this patent?
Melexis Tech Sa
What technology area does this patent fall under?
Primary CPC classification G01R15/202. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Mar 23 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).