Defect Inspection Apparatus and Defect Inspection Method

Patent metadata

Field	Value
Publication number	US-2023085940-A1
Application number	US-202017793649-A
Country	US
Kind code	A1
Filing date	Oct 9, 2020
Priority date	Jan 23, 2020
Publication date	Mar 23, 2023
Grant date	—

Abstract

A defect inspection apparatus (100) is configured to approximate a difference value or an absolute value (Ia) of the difference value between a pixel value in at least three captured images (A) captured by an imager in at least three different phases of an elastic wave and a pixel value in a reference image (Aave) separate from the captured images (A) so as to acquire an approximate value for defect inspection corresponding to an amount of change in the pixel value in the captured images (A).

First claim

1 . A defect inspection apparatus comprising:
an exciter configured to excite an elastic wave in a measurement region of an inspection target; an irradiator configured to emit laser light to the measurement region; an interference unit configured to cause interference of the laser light reflected at the measurement region by laser interferometry; an imager configured to image the interfered laser light; and a controller configured or programmed to control the exciter and control imaging of the interfered laser light by the imager; wherein the controller is configured or programmed to approximate a difference value or an absolute value of the difference value between a pixel value in at least three captured images captured by the imager in at least three different phases of the elastic wave and a pixel value in a reference image separate from the captured images so as to acquire an approximate value for defect inspection corresponding to an amount of change in the pixel value in the captured images.

2 . The defect inspection apparatus according to claim 1 , wherein
the interference unit is configured to cause interference of the laser light reflected at different positions in the measurement region by the laser interferometry; and the controller is configured or programmed to approximate the difference value or the absolute value of the difference value between the pixel value in the at least three captured images and the pixel value in the reference image separate from the captured images without changing a phase difference between two rays of the interfered laser light so as to acquire the approximate value for defect inspection corresponding to the amount of change in the pixel value in the captured images.

3 . The defect inspection apparatus according to claim 2 , wherein the controller is configured or programmed to approximate the difference value or the absolute value of the difference value between the pixel value in the at least three captured images and the pixel value in the reference image separate from the captured images such that the difference value or the absolute value of the difference value corresponds to an approximation function that is a function representing a waveform so as to acquire the approximate value for defect inspection corresponding to the amount of change in the pixel value in the captured images.

4 . The defect inspection apparatus according to claim 3 , wherein
the approximation function is a function that represents a waveform having half a period of the elastic wave; and the controller is configured or programmed to approximate the absolute value of the difference value between the pixel value in the at least three captured images and the pixel value in the reference image separate from the captured images such that the absolute value of the difference value corresponds to the function that represents the waveform having half the period of the elastic wave so as to acquire the approximate value for defect inspection corresponding to the amount of change in the pixel value in the captured images.

5 . The defect inspection apparatus according to claim 3 , wherein
the approximation function is a function that represents a sine wave; and the controller is configured or programmed to approximate the difference value or the absolute value of the difference value between the pixel value in the at least three captured images and the pixel value in the reference image separate from the captured images such that the difference value or the absolute value of the difference value corresponds to the function that represents the sine wave so as to acquire the approximate value for defect inspection corresponding to the amount of change in the pixel value in the captured images.

6 . The defect inspection apparatus according to claim 2 , wherein
the reference image is an average image of the at least three captured images; and the controller is configured or programmed to acquire, based on a difference value or an absolute value of the difference value between the pixel value in the at least three captured images and a pixel value in the average image of the at least three captured images, the approximate value for defect inspection corresponding to the amount of change in the pixel value in the captured images.

7 . The defect inspection apparatus according to claim 1 , wherein the controller is configured or programmed to generate an approximate value image that represents the approximate value for defect inspection corresponding to the amount of change in the pixel value in the captured images.

8 . The defect inspection apparatus according to claim 1 , wherein
the interference unit includes an optical member configured to change a phase of the laser light; and the controller is configured or programmed to perform a control to switch between two controls including a first detection control to acquire, based on the pixel value in the at least three captured images captured by the imager in the at least three different phases of the elastic wave, the approximate value for defect inspection corresponding to the amount of change in the pixel value in the captured images without changing a phase difference between two rays of the interfered laser light and a second detection control to measure a displacement of the measurement region based on an intensity pattern of the interfered laser light imaged by the imager while changing the phase difference between the two rays of the interfered laser light by the optical member.

9 . The defect inspection apparatus according to claim 8 , further comprising:
an operation unit configured to receive an input operation for switching between the first detection control and the second detection control; wherein the controller is configured or programmed to start the second detection control based on the input operation on the operation unit when an approximate value image representing the approximate value for defect inspection corresponding to the amount of change in the pixel value in the captured images is being displayed by the first detection control.

10 . The defect inspection apparatus according to claim 1 , wherein
the interference unit includes an optical member configured to change a phase of the laser light; and the controller is configured or programmed to perform in parallel two controls including a first detection control to acquire, based on the pixel value in the at least three captured images captured by the imager in the at least three different phases of the elastic wave, the approximate value for defect inspection corresponding to the amount of change in the pixel value in the captured images without changing a phase difference between two rays of the interfered laser light and a second detection control to measure a displacement of the measurement region based on an intensity pattern of the interfered laser light imaged by the imager while changing the phase difference between the two rays of the interfered laser light by the optical member.

11 . A defect inspection method comprising:
exciting an elastic wave in a measurement region of an inspection target; emitting laser light to the measurement region; causing interference of the laser light reflected at the measurement region by laser interferometry; imaging the interfered laser light; and approximating a difference value or an absolute value of the difference value between a pixel value in at least three captured images captured in at least three different phases of the elastic wave and a pixel value in a reference image separate from the captured images to acquire an approximate value for defect inspection corresponding to an amount of cha

Assignees

• Shimadzu Corp

Inventors

• Hatahori Takahide
• Takubo Kenji
• Yoshida Koki

Classifications

• G06T2207/30136

  Metal · CPC title

• G06T2207/10152

  Varying illumination · CPC title

• G06T7/001 Primary

  using an image reference approach · CPC title

• G01N21/45

  using interferometric methods; using Schlieren methods · CPC title

• G01B11/30

  for measuring roughness or irregularity of surfaces · CPC title