Semiconductor device packaging warpage control

US2023066652A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2023066652-A1
Application numberUS-202117412327-A
CountryUS
Kind codeA1
Filing dateAug 26, 2021
Priority dateAug 26, 2021
Publication dateMar 2, 2023
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of manufacturing a carrier for semiconductor device packaging is provided. The method includes forming a carrier having a plurality of plateau regions separated by a plurality of channels. The carrier is configured and arranged to support a plurality of semiconductor die during a packaging operation. The plurality of channels is filled with a material configured to control warpage of the carrier.

First claim

Opening claim text (preview).

What is claimed is: 1 . A method comprising: forming a carrier having a plurality of plateau regions separated by a plurality of channels, the carrier configured and arranged to support a plurality of semiconductor die during a packaging operation; and filling the plurality of channels with a structural material, the structural material configured to control warpage of the carrier. 2 . The method of claim 1 , wherein a top surface of the structural material is substantially coplanar with a top surface of the plurality of plateau regions. 3 . The method of claim 1 , wherein forming the carrier further comprises removing carrier material to form the plurality of channels. 4 . The method of claim 3 , wherein the carrier material is removed by way of etching, sawing, laser ablation, or a combination thereof. 5 . The method of claim 1 , wherein forming the carrier further comprises adding material to a base portion of the carrier, the added material configured to form the plurality of plateau regions. 6 . The method of claim 5 , wherein the added material comprises a material different from the base portion of the carrier. 7 . The method of claim 1 , wherein the structural material has a coefficient of thermal expansion sufficient to maintain a substantially planar condition of the carrier during the packaging operation. 8 . The method of claim 1 , wherein the carrier comprises a metal, glass, quartz, or ceramic material. 9 . The method of claim 1 , wherein the carrier is further configured for attaching, by way of a releasable adhesive, the plurality of semiconductor die to the plurality of plateau regions during the packaging operation. 10 . An apparatus for manufacturing a packaged semiconductor device, the apparatus comprising: a carrier having a plurality of plateau regions separated by a plurality of channels, the carrier configured and arranged to support a plurality of semiconductor die during a packaging operation; and a structural material disposed in the plurality of channels, the structural material configured to control warpage of the carrier. 11 . The apparatus of claim 10 , wherein a top surface of the structural material is substantially coplanar with a top surface of the plurality of plateau regions. 12 . The apparatus of claim 10 , wherein the plurality of channels are formed in the carrier by way of etching, sawing, laser ablation, or a combination thereof. 13 . The apparatus of claim 10 , wherein the structural material has a coefficient of thermal expansion sufficient to maintain a substantially planar condition of the carrier during the packaging operation. 14 . The apparatus of claim 10 , wherein the plurality of plateau regions comprises a material different from a base portion of the carrier. 15 . The apparatus of claim 10 , wherein the carrier comprises a metal, glass, quartz, or ceramic material. 16 . A method comprising: forming a carrier having a plurality of vertical channels and a plurality of horizontal channels, the plurality of vertical channels and the plurality of horizontal channels configured and arranged to separate a plurality of plateau regions of the carrier; and filling the plurality of vertical channels and the plurality of horizontal channels with a structural material, the structural material configured to control warpage of the carrier during a packaging operation. 17 . The method of claim 16 , wherein the carrier is configured and arranged to support a plurality of semiconductor die during the packaging operation. 18 . The method of claim 16 , wherein forming the carrier further comprises removing carrier material by way of etching, sawing, laser ablation, or a combination thereof to form the plurality of vertical channels and the plurality of horizontal channels. 19 . The method of claim 16 , wherein a top surface of the structural material is substantially coplanar with a top surface of the plurality of plateau regions. 20 . The method of claim 16 , wherein the plurality of plateau regions comprises a material different from a base portion of the carrier.

Assignees

Inventors

Classifications

  • Subject matter not provided for in other groups of this subclass · CPC title

  • using batch processing · CPC title

  • H10W70/68Primary

    Shapes or dispositions thereof · CPC title

  • Mechanical treatments, e.g. deforming, punching or cutting · CPC title

  • H10W42/121Primary

    protecting against mechanical damage (H10W76/00, H10W74/00 take precedence) · CPC title

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What does patent US2023066652A1 cover?
A method of manufacturing a carrier for semiconductor device packaging is provided. The method includes forming a carrier having a plurality of plateau regions separated by a plurality of channels. The carrier is configured and arranged to support a plurality of semiconductor die during a packaging operation. The plurality of channels is filled with a material configured to control warpage of t…
Who is the assignee on this patent?
Nxp Usa Inc
What technology area does this patent fall under?
Primary CPC classification H10W70/68. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Mar 02 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).